Inventor · disambiguated record
Thorsten Hofmann
Also filed as: HOFMANN THORSTEN
17 granted patents·5 pending applications·82 citations·filing 2004–2023
92Inventor score
Top patents by PatentIndex Score
22 records- 0188US7232997B2Apparatus and method for investigating or modifying a surface with a beam of charged particlesNAWOTEC GMBH·Filed 2005·Granted Jun 19, 2007·16 cites·36 claims
- 0286US8632687B2Method for electron beam induced etching of layers contaminated with galliumAUTH NICOLE·Filed 2009·Granted Jan 21, 2014·14 cites·24 claims
- 0385US9721754B2Method and apparatus for processing a substrate with a focused particle beamBRET TRISTAN·Filed 2011·Granted Aug 1, 2017·10 cites·33 claims
- 0485US8247782B2Apparatus and method for investigating and/or modifying a sampleEDINGER KLAUS·Filed 2010·Granted Aug 21, 2012·9 cites·20 claims
- 0581US8674329B2Method and apparatus for analyzing and/or repairing of an EUV mask defectBUDACH MICHAEL·Filed 2011·Granted Mar 18, 2014·4 cites·10 claims
- 0679US10060947B2Method and apparatus for analyzing and for removing a defect of an EUV photomaskZEISS CARL SMT GMBH·Filed 2013·Granted Aug 28, 2018·3 cites·25 claims
- 0779US8769709B2Apparatus and method for analyzing and modifying a specimen surfaceZEISS CARL SMS GMBH·Filed 2013·Granted Jul 1, 2014·4 cites·20 claims
- 0877US10372032B2Method and device for permanently repairing defects of absent material of a photolithographic maskZEISS CARL SMT GMBH·Filed 2017·Granted Aug 6, 2019·2 cites·19 claims
- 0975US10983075B2Device and method for analysing a defect of a photolithographic mask or of a waferZEISS CARL SMT GMBH·Filed 2017·Granted Apr 20, 2021·1 cites·11 claims
- 1074US9023666B2Method for electron beam induced etchingAUTH NICOLE·Filed 2009·Granted May 5, 2015·5 cites·26 claims
- 1173US9910065B2Apparatus and method for examining a surface of a maskZEISS CARL SMT GMBH·Filed 2016·Granted Mar 6, 2018·2 cites·39 claims
- 1272US9115981B2Apparatus and method for investigating an objectZEISS CARL SMS GMBH·Filed 2013·Granted Aug 25, 2015·3 cites·25 claims
- 1370US11733186B2Device and method for analyzing a defect of a photolithographic mask or of a waferZEISS CARL SMT GMBH·Filed 2021·Granted Aug 22, 2023·0 cites·32 claims
- 1470US8623230B2Methods and systems for removing a material from a sampleAUTH NICOLE·Filed 2008·Granted Jan 7, 2014·3 cites·37 claims
- 1556US2023081844A1Method for particle beam-induced processing of a defect of a microlithographic photomaskZEISS CARL SMT GMBH·Filed 2022·Application pending·0 cites
- 1655US2018106831A1Method and apparatus for analyzing and for removing a defect of an euv photomaskZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 1755US2023238209A1Apparatus for analyzing and/or processing a sample with a particle beam and methodZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 1853US7786403B2Method for high-resolution processing of thin layers using electron beamsNAWO TEC GMBH·Filed 2004·Granted Aug 31, 2010·6 cites·14 claims
- 1952US10732501B2Method and device for permanently repairing defects of absent material of a photolithographic maskZEISS CARL SMT GMBH·Filed 2019·Granted Aug 4, 2020·0 cites·24 claims
- 2048US8318593B2Method for electron beam induced deposition of conductive materialAUTH NICOLE·Filed 2009·Granted Nov 27, 2012·0 cites·21 claims
- 2140US2014255831A1Method and apparatus for protecting a substrate during processing by a particle beamZEISS CARL SMS GMBH·Filed 2014·Application pending·0 cites
- 2238US2010297362A1Method for processing an object with miniaturized structuresZEISS CARL SMS GMBH·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →