Inventor · disambiguated record
Thomas H. Osterheld
Also filed as: OSTERHELD THOMAS H
70 granted patents·35 pending applications·1,567 citations·filing 1998–2025
99Inventor score
Top patents by PatentIndex Score
105 records- 0199US6520847B2Polishing pad having a grooved pattern for use in chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2001·Granted Feb 18, 2003·90 cites·20 claims
- 0298US10478937B2Acoustic emission monitoring and endpoint for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2015·Granted Nov 19, 2019·21 cites·10 claims
- 0398US6824455B2Polishing pad having a grooved pattern for use in a chemical mechanical polishing apparatusAPPLIED MATERIALS INC·Filed 2003·Granted Nov 30, 2004·67 cites·18 claims
- 0498US6699115B2Polishing pad having a grooved pattern for use in a chemical mechanical polishing apparatusAPPLIED MATERIALS INC·Filed 2002·Granted Mar 2, 2004·63 cites·12 claims
- 0598US6616513B1Grid relief in CMP polishing pad to accurately measure pad wear, pad profile and pad wear profileAPPLIED MATERIALS INC·Filed 2001·Granted Sep 9, 2003·85 cites·14 claims
- 0698US6251215B1Carrier head with a multilayer retaining ring for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 1998·Granted Jun 26, 2001·190 cites·9 claims
- 0797US6241596B1Method and apparatus for chemical mechanical polishing using a patterned padAPPLIED MATERIALS INC·Filed 2000·Granted Jun 5, 2001·101 cites·21 claims
- 0896US9138858B2Thin polishing pad with window and molding processAPPLIED MATERIALS INC·Filed 2013·Granted Sep 22, 2015·12 cites·10 claims
- 0996US8029640B2Multilayer retaining ring for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2009·Granted Oct 4, 2011·16 cites·16 claims
- 1096US5984769APolishing pad having a grooved pattern for use in a chemical mechanical polishing apparatusAPPLIED MATERIALS INC·Filed 1998·Granted Nov 16, 1999·142 cites·15 claims
- 1195US11931853B2Control of processing parameters for substrate polishing with angularly distributed zones using cost functionAPPLIED MATERIALS INC·Filed 2022·Granted Mar 19, 2024·2 cites·19 claims
- 1295US9017138B2Retaining ring monitoring and control of pressureAPPLIED MATERIALS INC·Filed 2013·Granted Apr 28, 2015·14 cites·18 claims
- 1394US10562147B2Polishing system with annular platen or polishing pad for substrate monitoringAPPLIED MATERIALS INC·Filed 2017·Granted Feb 18, 2020·4 cites·11 claims
- 1494US10500694B2Chemical mechanical polishing apparatus and methodsAPPLIED MATERIALS INC·Filed 2017·Granted Dec 10, 2019·7 cites·15 claims
- 1594US9005999B2Temperature control of chemical mechanical polishingXU KUN·Filed 2012·Granted Apr 14, 2015·22 cites·25 claims
- 1694US8562389B2Thin polishing pad with window and molding processBENVEGNU DOMINIC J·Filed 2008·Granted Oct 22, 2013·20 cites·22 claims
- 1793US6572446B1Chemical mechanical polishing pad conditioning element with discrete points and compliant membraneAPPLIED MATERIALS INC·Filed 2000·Granted Jun 3, 2003·46 cites·42 claims
- 1892US8992286B2Weighted regression of thickness maps from spectral dataAPPLIED MATERIALS INC·Filed 2013·Granted Mar 31, 2015·9 cites·20 claims
- 1992US6435942B1Chemical mechanical polishing processes and componentsAPPLIED MATERIALS INC·Filed 2000·Granted Aug 20, 2002·74 cites·19 claims
- 2091US8408965B2Eddy current gain compensationBENNETT DOYLE E·Filed 2009·Granted Apr 2, 2013·21 cites·17 claims
- 2190US11731238B2Monitoring of polishing pad texture in chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2020·Granted Aug 22, 2023·2 cites·16 claims
- 2290US6273806B1Polishing pad having a grooved pattern for use in a chemical mechanical polishing apparatusAPPLIED MATERIALS INC·Filed 1999·Granted Aug 14, 2001·111 cites·16 claims
- 2389US12491603B2Passive acoustic monitoring and acoustic sensors for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2022·Granted Dec 9, 2025·1 cites·19 claims
- 2489US9242337B2Dynamic residue clearing control with in-situ profile control (ISPC)APPLIED MATERIALS INC·Filed 2014·Granted Jan 26, 2016·8 cites·20 claims
- 2589US6645061B1Polishing pad having a grooved pattern for use in chemical mechanical polishingAPPLIED MATERIALS INC·Filed 1999·Granted Nov 11, 2003·56 cites·28 claims
- 2688US10589399B2Textured small pad for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2017·Granted Mar 17, 2020·3 cites·5 claims
- 2788US9227293B2Multi-platen multi-head polishing architectureAPPLIED MATERIALS INC·Filed 2013·Granted Jan 5, 2016·6 cites·19 claims
- 2888US6855043B1Carrier head with a modified flexible membraneAPPLIED MATERIALS INC·Filed 2000·Granted Feb 15, 2005·33 cites·4 claims
- 2987US11577356B2Machine vision as input to a CMP process control algorithmAPPLIED MATERIALS INC·Filed 2019·Granted Feb 14, 2023·3 cites·19 claims
- 3087US6913518B2Profile control platenAPPLIED MATERIALS INC·Filed 2003·Granted Jul 5, 2005·25 cites·15 claims
- 3186US6561381B1Closed loop control over delivery of liquid material to semiconductor processing toolAPPLIED MATERIALS INC·Filed 2000·Granted May 13, 2003·34 cites·8 claims
- 3284US12479062B2Determining substrate orientation with acoustic signalsAPPLIED MATERIALS INC·Filed 2022·Granted Nov 25, 2025·0 cites·20 claims
- 3384US2025319568A1Control of processing parameters for substrate polishing with substrate precessionAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 3483US12403560B2Determining substrate precession with acoustic signalsAPPLIED MATERIALS INC·Filed 2022·Granted Sep 2, 2025·0 cites·12 claims
- 3583US11507824B2Training spectrum generation for machine learning system for spectrographic monitoringAPPLIED MATERIALS INC·Filed 2019·Granted Nov 22, 2022·2 cites·19 claims
- 3683US8292691B2Use of pad conditioning in temperature controlled CMPXU KUN·Filed 2008·Granted Oct 23, 2012·9 cites·20 claims
- 3782US11571786B2Consumable part monitoring in chemical mechanical polisherAPPLIED MATERIALS INC·Filed 2019·Granted Feb 7, 2023·3 cites·10 claims
- 3882US7815495B2Pad conditionerAPPLIED MATERIALS INC·Filed 2007·Granted Oct 19, 2010·10 cites·4 claims
- 3982US7063597B2Polishing processes for shallow trench isolation substratesAPPLIED MATERIALS INC·Filed 2003·Granted Jun 20, 2006·30 cites·14 claims
- 4082US2024017376A1Monitoring thickness in face-up polishing with rollerAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4182US2024017371A1Monitoring thickness in face-up polishingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4281US2023009737A1Acoustic window in pad backing layer for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4381US2023009519A1Acoustic window in pad polishing and backing layer for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4481US2023011626A1Acoustic window with liquid-filled pores for chemical mechanical polishing and methods of forming padsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4579US11780046B2Polishing system with annular platen or polishing padAPPLIED MATERIALS INC·Filed 2022·Granted Oct 10, 2023·0 cites·16 claims
- 4679US8954186B2Selecting reference libraries for monitoring of multiple zones on a substrateQIAN JUN·Filed 2010·Granted Feb 10, 2015·4 cites·19 claims
- 4779US8393933B2Polishing pad and system with window supportQIAN JUN·Filed 2009·Granted Mar 12, 2013·6 cites·21 claims
- 4878US12257665B2Machine vision as input to a CMP process control algorithmAPPLIED MATERIALS INC·Filed 2023·Granted Mar 25, 2025·0 cites·7 claims
- 4978US12020159B2Training spectrum generation for machine learning system for spectrographic monitoringAPPLIED MATERIALS INC·Filed 2023·Granted Jun 25, 2024·0 cites·12 claims
- 5078US10256111B2Chemical mechanical polishing automated recipe generationAPPLIED MATERIALS INC·Filed 2017·Granted Apr 9, 2019·3 cites·18 claims
Showing the top 50 of 105 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →