Inventor · disambiguated record
Thomas Schicketanz
Also filed as: SCHICKETANZ THOMAS
26 granted patents·5 pending applications·40 citations·filing 2009–2025
93Inventor score
Top patents by PatentIndex Score
31 records- 0195US10120176B2Catadioptric projection objective comprising deflection mirrors and projection exposure methodZEISS CARL SMT GMBH·Filed 2017·Granted Nov 6, 2018·4 cites·17 claims
- 0293US10545323B2Projection optical unit for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2018·Granted Jan 28, 2020·13 cites·21 claims
- 0382US9274327B2Catadioptric projection objective comprising deflection mirrors and projection exposure methodZEISS CARL SMT GMBH·Filed 2014·Granted Mar 1, 2016·3 cites·23 claims
- 0481US9459435B2Catadioptric projection objective comprising deflection mirrors and projection exposure methodZEISS CARL SMT GMBH·Filed 2016·Granted Oct 4, 2016·2 cites·21 claims
- 0581US8896814B2Catadioptric projection objective comprising deflection mirrors and projection exposure methodSCHICKETANZ THOMAS·Filed 2012·Granted Nov 25, 2014·5 cites·17 claims
- 0679US10001631B2Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film elementZEISS CARL SMT GMBH·Filed 2014·Granted Jun 19, 2018·6 cites·40 claims
- 0776US2025354253A1Method for producing a mirror assembly, and coating systemZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 0875US8446665B2Catadioptric projection objectiveEPPLE ALEXANDER·Filed 2009·Granted May 21, 2013·2 cites·26 claims
- 0971US10474036B2Optical element and optical arrangement therewithZEISS CARL SMT GMBH·Filed 2016·Granted Nov 12, 2019·1 cites·24 claims
- 1067US2019056576A1Catadioptric projection objective comprising deflection mirrors and projection exposure methodZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 1166US2018373006A1Catadioptric projection objectiveZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 1264US11927500B2Method and device for characterizing the surface shape of an optical elementZEISS CARL SMT GMBH·Filed 2022·Granted Mar 12, 2024·0 cites·24 claims
- 1362US9817220B2Catadioptric projection objective comprising deflection mirrors and projection exposure methodZEISS CARL SMT GMBH·Filed 2016·Granted Nov 14, 2017·0 cites·25 claims
- 1461US10203435B2EUV mirror and optical system comprising EUV mirrorZEISS CARL SMT GMBH·Filed 2016·Granted Feb 12, 2019·1 cites·16 claims
- 1561US9726870B2Catadioptric projection objectiveZEISS CARL SMT GMBH·Filed 2016·Granted Aug 8, 2017·0 cites·17 claims
- 1661US8873137B2Catadioptric projection objectiveZEISS CARL SMT GMBH·Filed 2013·Granted Oct 28, 2014·0 cites·32 claims
- 1759US10042146B2Catadioptric projection objectiveZEISS CARL SMT GMBH·Filed 2017·Granted Aug 7, 2018·0 cites·20 claims
- 1859US9341756B2Method for correcting the surface form of a mirrorZEISS CARL SMT GMBH·Filed 2013·Granted May 17, 2016·0 cites·11 claims
- 1959US9279969B2Catadioptric projection objectiveZEISS CARL SMT GMBH·Filed 2014·Granted Mar 8, 2016·0 cites·19 claims
- 2058US8693098B2Projection objective for a microlithographic EUV projection exposure apparatusRENNON SIEGFRIED·Filed 2010·Granted Apr 8, 2014·1 cites·14 claims
- 2158US2023417961A1Process for producing a reflective optical element for the extreme ultraviolet wavelength range and reflective optical elementZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 2255US11326872B2Method and device for characterizing the surface shape of an optical elementZEISS CARL SMT GMBH·Filed 2021·Granted May 10, 2022·0 cites·19 claims
- 2353US8902406B2Projection objectiveWALSER REINHOLD·Filed 2010·Granted Dec 2, 2014·2 cites·28 claims
- 2452US9639005B2Imaging catoptric EUV projection optical unitZEISS CARL SMT GMBH·Filed 2014·Granted May 2, 2017·0 cites·20 claims
- 2551US9291751B2Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unitZEISS CARL SMT GMBH·Filed 2013·Granted Mar 22, 2016·0 cites·20 claims
- 2648US8345222B2High transmission, high aperture catadioptric projection objective and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2009·Granted Jan 1, 2013·0 cites·22 claims
- 2747US2016299268A1Method for correcting the surface form of a mirrorZEISS CARL SMT GMBH·Filed 2016·Application pending·0 cites
- 2845US10520827B2Optical system, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2019·Granted Dec 31, 2019·0 cites·21 claims
- 2943US9581910B2Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 28, 2017·0 cites·21 claims
- 3039US9915876B2EUV mirror and optical system comprising EUV mirrorZEISS CARL SMT GMBH·Filed 2015·Granted Mar 13, 2018·0 cites·22 claims
- 3134US9915873B2Reflective optical element, and optical system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Mar 13, 2018·0 cites·24 claims
Join the waitlist — get patent alerts
Get an alert when Thomas Schicketanz files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →