Inventor · disambiguated record
Ting-Yeh Chen
Also filed as: CHEN TING-YEH
32 granted patents·9 pending applications·130 citations·filing 2014–2025
96Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD41
Top patents by PatentIndex Score
41 records- 0198US9570556B1Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Feb 14, 2017·27 cites·20 claims
- 0297US9287403B1FinFET and method for manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Mar 15, 2016·44 cites·19 claims
- 0396US9748389B1Method for semiconductor device fabrication with improved source drain epitaxyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Aug 29, 2017·12 cites·20 claims
- 0494US12087837B2Semiconductor device with backside contact and methods of forming suchTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 10, 2024·2 cites·20 claims
- 0594US9129988B1FinFET and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Sep 8, 2015·17 cites·20 claims
- 0693US9812576B2Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Nov 7, 2017·8 cites·20 claims
- 0790US9865504B2Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jan 9, 2018·5 cites·20 claims
- 0884US12369334B2Method of manufacturing a semiconductor device and a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 22, 2025·0 cites·20 claims
- 0983US9343575B1FinFET and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted May 17, 2016·3 cites·19 claims
- 1083US2025318156A1Method of manufacturing a semiconductor device and a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1182US2025366063A1Methods of manufacturing semiconductor devices and semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1282US2025366032A1Semiconductor device with epitaxial bridge feature and methods of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1381US11996467B2Method for epitaxial growth and deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted May 28, 2024·0 cites·20 claims
- 1481US11107734B2Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Aug 31, 2021·2 cites·20 claims
- 1580US12507446B2Semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 23, 2025·0 cites·20 claims
- 1680US10158007B2Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 18, 2018·2 cites·20 claims
- 1779US9741831B2FinFET and method for manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Aug 22, 2017·2 cites·15 claims
- 1879US2024395866A1Methods of forming epitaxial source/drain features in semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1978US2025318215A1Isolation structures in multi-gate field-effect transistorsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2077US11289574B2Methods of forming epitaxial source/drain features in semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Mar 29, 2022·1 cites·20 claims
- 2177US11257928B2Method for epitaxial growth and deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Feb 22, 2022·1 cites·20 claims
- 2276US10872889B2Semiconductor component and fabricating method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 22, 2020·2 cites·20 claims
- 2376US2024379862A1Semiconductor device structure with embedded epitaxial structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2475US11688794B2Method for epitaxial growth and deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 27, 2023·0 cites·20 claims
- 2575US10158017B2Semiconductor structure and method for semiconductor device fabrication with improved source drain epitaxyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 18, 2018·1 cites·20 claims
- 2674US11710792B2Semiconductor structure with improved source drain epitaxyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 25, 2023·0 cites·20 claims
- 2774US2025022931A1Source/Drain Contact with Low-K Contact Etch Stop Layer and Method of Fabricating ThereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2874US2024363715A1Semiconductor device with backside contact and methods of forming suchTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2973US12002845B2Method of manufacturing a semiconductor device and a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 4, 2024·0 cites·20 claims
- 3072US12154947B2Methods of forming epitaxial source/drain features in semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 26, 2024·0 cites·20 claims
- 3172US11031498B2Semiconductor structure with improved source drain epitaxyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jun 8, 2021·0 cites·20 claims
- 3272US11011634B2Elongated source/drain region structure in finFET deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted May 18, 2021·1 cites·20 claims
- 3370US11735660B2Method of forming semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 22, 2023·0 cites·20 claims
- 3469US12464769B2Semiconductor device with epitaxial bridge feature and methods of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 4, 2025·0 cites·20 claims
- 3567US12396220B2Isolation structures in multi-gate field-effect transistorsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 19, 2025·0 cites·20 claims
- 3667US12125889B2Source/drain contact with low-k contact etch stop layer and method of fabricating thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Oct 22, 2024·0 cites·20 claims
- 3764US12382660B2Structure and formation method of semiconductor device with embedded epitaxial structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 5, 2025·0 cites·20 claims
- 3864US10629736B2Semiconductor structure and method for semiconductor device fabrication with improved source drain epitaxyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Apr 21, 2020·0 cites·20 claims
- 3961US2020027793A1Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Application pending·0 cites
- 4056US11855167B2Structure and formation method of semiconductor device with nanosheet structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 26, 2023·0 cites·20 claims
- 4153US11855225B2Semiconductor device with epitaxial bridge feature and methods of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 26, 2023·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →