Inventor · disambiguated record
Timothy J. Miller
Also filed as: MILLER TIMOTHY · MILLER TIMOTHY J · MILLER TIMOTHY JEROME
48 granted patents·21 pending applications·459 citations·filing 2004–2024
98Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT25VARIAN SEMICONDUCTOR EQUIPMENT ASS INC14APPLIED MATERIALS INC10GODET LUDOVIC7MILLER TIMOTHY J2
Top patents by PatentIndex Score
69 records- 0198US7767977B1Ion sourceVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2009·Granted Aug 3, 2010·72 cites·16 claims
- 0297US8926850B2Plasma processing with enhanced charge neutralization and process controlVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2012·Granted Jan 6, 2015·59 cites·20 claims
- 0397US8101510B2Plasma processing apparatusGODET LUDOVIC·Filed 2009·Granted Jan 24, 2012·50 cites·19 claims
- 0495US9123509B2Techniques for plasma processing a substratePAPASOULIOTIS GEORGE D·Filed 2011·Granted Sep 1, 2015·39 cites·19 claims
- 0595US8288741B1Apparatus and method for three dimensional ion processingMILLER TIMOTHY J·Filed 2011·Granted Oct 16, 2012·26 cites·16 claims
- 0694US8664098B2Plasma processing apparatusGODET LUDOVIC·Filed 2012·Granted Mar 4, 2014·7 cites·17 claims
- 0794US8460569B2Method and system for post-etch treatment of patterned substrate featuresGODET LUDOVIC·Filed 2011·Granted Jun 11, 2013·18 cites·7 claims
- 0894US7586100B2Closed loop control and process optimization in plasma doping processes using a time of flight ion detectorVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted Sep 8, 2009·35 cites·25 claims
- 0993US8188445B2Ion sourceGODET LUDOVIC·Filed 2010·Granted May 29, 2012·15 cites·19 claims
- 1092US7397048B2Technique for boron implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2005·Granted Jul 8, 2008·23 cites·16 claims
- 1191US7524743B2Conformal doping apparatus and methodVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2005·Granted Apr 28, 2009·22 cites·21 claims
- 1290US9840772B2Method of improving ion beam quality in a non-mass-analyzed ion implantation systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Dec 12, 2017·2 cites·20 claims
- 1389US8603591B2Enhanced etch and deposition profile control using plasma sheath engineeringGODET LUDOVIC·Filed 2009·Granted Dec 10, 2013·8 cites·13 claims
- 1486US9865430B2Boron implanting using a co-gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Jan 9, 2018·3 cites·12 claims
- 1586US9677171B2Method of improving ion beam quality in a non-mass-analyzed ion implantation systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2014·Granted Jun 13, 2017·2 cites·16 claims
- 1684US8937004B2Apparatus and method for controllably implanting workpiecesVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Jan 20, 2015·5 cites·13 claims
- 1783US9384937B2SiC coating in an ion implanterVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Jul 5, 2016·5 cites·14 claims
- 1883US8858816B2Enhanced etch and deposition profile control using plasma sheath engineeringVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Oct 14, 2014·4 cites·9 claims
- 1982US9524849B2Method of improving ion beam quality in an implant systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2013·Granted Dec 20, 2016·4 cites·11 claims
- 2082US8623171B2Plasma processing apparatusGODET LUDOVIC·Filed 2009·Granted Jan 7, 2014·6 cites·9 claims
- 2182US8461554B1Apparatus and method for charge neutralization during processing of a workpieceKURUNCZI PETER F·Filed 2011·Granted Jun 11, 2013·6 cites·19 claims
- 2278US10290466B2Boron implanting using a co-gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted May 14, 2019·1 cites·19 claims
- 2378US7820533B2Multi-step plasma doping with improved dose controlVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Oct 26, 2010·6 cites·23 claims
- 2477US8669538B1Method of improving ion beam quality in an implant systemVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Mar 11, 2014·3 cites·20 claims
- 2576US7132672B2Faraday dose and uniformity monitor for plasma based ion implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2004·Granted Nov 7, 2006·21 cites·37 claims
- 2675US8835879B1Reduction of deposition by separation of ion beam and neutral flowVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Sep 16, 2014·4 cites·17 claims
- 2774US9034743B2Method for implant productivity enhancementVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted May 19, 2015·3 cites·14 claims
- 2874US8461030B2Apparatus and method for controllably implanting workpiecesRENAU ANTHONY·Filed 2010·Granted Jun 11, 2013·3 cites·19 claims
- 2973US8716682B2Apparatus and method for multiple slot ion implantationRENAU ANTHONY·Filed 2011·Granted May 6, 2014·3 cites·20 claims
- 3072US8778603B2Method and system for modifying substrate relief features using ion implantationGODET LUDOVIC·Filed 2011·Granted Jul 15, 2014·2 cites·10 claims
- 3172US2024404823A1Plasma treatment process to densify oxide layersAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3270US11127601B2Phosphorus fugitive emission controlAPPLIED MATERIALS INC·Filed 2019·Granted Sep 21, 2021·1 cites·10 claims
- 3365US11545368B2Phosphorus fugitive emission controlAPPLIED MATERIALS INC·Filed 2021·Granted Jan 3, 2023·0 cites·8 claims
- 3464US12351900B2Plasma based film modification for semiconductor devicesAPPLIED MATERIALS INC·Filed 2023·Granted Jul 8, 2025·0 cites·11 claims
- 3562US11615945B2Plasma processing apparatus and techniquesAPPLIED MATERIALS INC·Filed 2021·Granted Mar 28, 2023·0 cites·10 claims
- 3661US12094709B2Plasma treatment process to densify oxide layersAPPLIED MATERIALS INC·Filed 2021·Granted Sep 17, 2024·0 cites·20 claims
- 3760US12165852B2Cover ring to mitigate carbon contamination in plasma doping chamberAPPLIED MATERIALS INC·Filed 2022·Granted Dec 10, 2024·0 cites·15 claims
- 3860US9441290B2System and method of improving implant quality in a plasma-based implant systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2013·Granted Sep 13, 2016·0 cites·13 claims
- 3958US10825653B2Method of improving ion beam quality in an implant systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Nov 3, 2020·0 cites·14 claims
- 4058US2018087148A1Method Of Improving Ion Beam Quality In A Non-Mass-Analyzed Ion Implantation SystemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Application pending·0 cites
- 4157US10804075B2Method of improving ion beam quality in an implant systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Oct 13, 2020·0 cites·4 claims
- 4257US9767987B2Method and system for modifying substrate relief features using ion implantationVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2014·Granted Sep 19, 2017·0 cites·20 claims
- 4357US8907307B2Apparatus and method for maskless patterned implantationLEAVITT CHRISTOPHER J·Filed 2011·Granted Dec 9, 2014·1 cites·19 claims
- 4456US11120973B2Plasma processing apparatus and techniquesAPPLIED MATERIALS INC·Filed 2019·Granted Sep 14, 2021·0 cites·6 claims
- 4556US2009000946A1Plasma processing with enhanced charge neutralization and process controlVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Application pending·0 cites
- 4656US2009001890A1Apparatus for Plasma Processing a Substrate and a Method ThereofVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Application pending·0 cites
- 4755US9793086B2SiC coating in an ion implanterVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Oct 17, 2017·0 cites·14 claims
- 4855US2009004836A1Plasma doping with enhanced charge neutralizationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Application pending·0 cites
- 4954US9659677B2Shielding device for substrate edge protection and method of using sameVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2014·Granted May 23, 2017·0 cites·15 claims
- 5052US2024006158A1Co-doping to control wet etch rate of fcvd oxide layersAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
Showing the top 50 of 69 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →