Inventor · disambiguated record
Tomohiko Abe
Also filed as: ABE TOMOHIKO · MARUYAMA SHIGERU
35 granted patents·5 pending applications·776 citations·filing 1979–2016
98Inventor score
Top patents by PatentIndex Score
40 records- 0191US6646275B2Charged particle beam exposure system and methodFUJITSU LTD·Filed 2002·Granted Nov 11, 2003·43 cites·7 claims
- 0288US5841145AMethod of and system for exposing pattern on object by charged particle beamFUJITSU LTD·Filed 1996·Granted Nov 24, 1998·60 cites·45 claims
- 0384US6486479B1Charged particle beam exposure system and methodFUJITSU LTD·Filed 2000·Granted Nov 26, 2002·24 cites·8 claims
- 0484US6242751B1Charged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1999·Granted Jun 5, 2001·33 cites·62 claims
- 0584US5430304ABlanking aperture array type charged particle beam exposureFUJITSU LTD·Filed 1994·Granted Jul 4, 1995·45 cites·11 claims
- 0683US5719402AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1996·Granted Feb 17, 1998·32 cites·11 claims
- 0783US5528048ACharged particle beam exposure system and methodFUJITSU LTD·Filed 1995·Granted Jun 18, 1996·47 cites·21 claims
- 0879US6465796B1Charge-particle beam lithography system of blanking aperture array typeADVANTEST CORP·Filed 1999·Granted Oct 15, 2002·33 cites·8 claims
- 0979US5757015ACharged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1996·Granted May 26, 1998·25 cites·22 claims
- 1079US5614725ACharged particle beam exposure system and methodFUJITSU LTD·Filed 1996·Granted Mar 25, 1997·36 cites·12 claims
- 1178US5391886ACharged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure systemFUJITSU LTD·Filed 1993·Granted Feb 21, 1995·36 cites·18 claims
- 1276US6118129AMethod and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elementsFUJITSU LTD·Filed 1999·Granted Sep 12, 2000·30 cites·15 claims
- 1376US5546319AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1995·Granted Aug 13, 1996·21 cites·34 claims
- 1475US5969365ACharged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1997·Granted Oct 19, 1999·20 cites·18 claims
- 1574US5977548ACharged particle beam exposure system and methodFUJITSU LTD·Filed 1996·Granted Nov 2, 1999·28 cites·11 claims
- 1672US4469619AMethod of manufacturing a green phosphorSONY CORP·Filed 1982·Granted Sep 4, 1984·35 cites·6 claims
- 1771US6268606B1Electrostatic deflector, for electron beam exposure apparatus, with reduced charge-upADVANTEST CORP·Filed 1999·Granted Jul 31, 2001·22 cites·8 claims
- 1871US5304811ALithography system using charged-particle beam and method of using the sameFUJITSU LTD·Filed 1992·Granted Apr 19, 1994·23 cites·18 claims
- 1969US5721432AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1996·Granted Feb 24, 1998·16 cites·5 claims
- 2067US5920077ACharged particle beam exposure systemFUJITSU LTD·Filed 1998·Granted Jul 6, 1999·21 cites·17 claims
- 2166US5949078ACharged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1998·Granted Sep 7, 1999·16 cites·13 claims
- 2265US5965895AMethod of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposureFUJITSU LTD·Filed 1997·Granted Oct 12, 1999·13 cites·9 claims
- 2364US5359202AElectron beam exposure apparatus employing blanking aperture arrayFUJITSU LTD·Filed 1993·Granted Oct 25, 1994·23 cites·7 claims
- 2461US6055719AMethod for manufacturing an electrostatic deflectorFUJITSU LTD·Filed 1998·Granted May 2, 2000·22 cites·3 claims
- 2559US5770862ACharged particle exposure apparatus, and a charged particle exposure methodFUJITSU LTD·Filed 1996·Granted Jun 23, 1998·20 cites·5 claims
- 2656US5590048ABlock exposure pattern data extracting system and method for charged particle beam exposureFUJITSU LTD·Filed 1993·Granted Dec 31, 1996·12 cites·42 claims
- 2753US6509568B1Electrostatic deflector for electron beam exposure apparatusADVANTEST CORP·Filed 1999·Granted Jan 21, 2003·15 cites·8 claims
- 2852US4839760ARead/write apparatus for disk cartridgeSEIKO EPSON CORP·Filed 1987·Granted Jun 13, 1989·8 cites·8 claims
- 2950US10049854B2Charged particle beam lens apparatus, charged particle beam column, and charged particle beam exposure apparatusINTEL CORP·Filed 2016·Granted Aug 14, 2018·0 cites·16 claims
- 3049US10107640B2Vehicular travel condition monitoring apparatusBRIDGESTONE CORP·Filed 2014·Granted Oct 23, 2018·0 cites·6 claims
- 3148US7544951B2Electron gun assemblyNUFLARE TECHNOLOGY INC·Filed 2006·Granted Jun 9, 2009·0 cites·29 claims
- 3248US2013252096A1Nonaqueous Electrolyte Rechargeable Battery Having Electrode Containing Conductive PolymerDENSO CORP·Filed 2013·Application pending·0 cites
- 3347US5104573AGreen light emitting phosphorSONY CORP·Filed 1989·Granted Apr 14, 1992·9 cites·5 claims
- 3446US2013252102A1Nonaqueous Electrolyte Rechargeable Battery Having Electrode Containing Conductive PolymerDENSO CORP·Filed 2013·Application pending·0 cites
- 3545US2016076974A1Tire measuring tool and tire measuring methodBRIDGESTONE CORP·Filed 2014·Application pending·0 cites
- 3644US5872366ACharged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1997·Granted Feb 16, 1999·5 cites·21 claims
- 3737US2002020354A1Electrostatic deflector for electron beam exposure apparatusFiled 2001·Application pending·0 cites
- 3837US2001045528A1Electrostatic deflector for electron beam exposure apparatusFiled 2001·Application pending·0 cites
- 3936US6858977B2Cathode-ray tube and cathode-ray tube manufacturing methodSONY CORP·Filed 2002·Granted Feb 22, 2005·0 cites·2 claims
- 4032US4252669ALuminescent material and method of making the sameSONY CORP·Filed 1979·Granted Feb 24, 1981·3 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →