Electrostatic deflector for electron beam exposure apparatus

Abstract

An electron beam radiation apparatus having an electrostatic deflector capable of deflecting the electron beam with high accuracy and with a reduced displacement of the deflection position, is disclosed. The electrostatic deflector comprises a cylindrical holding member made of an insulating material and a plurality of electrodes separately fixed from each other inside of the holding member with at least a part of the surface thereof covered with a metal film. The holding member has a plurality of wedge-shaped fixing holes corresponding to the portions of the electrodes where they are fixed, respectively, the holes having a larger diameter on the outer peripheral surface than on the inner peripheral surface of the holding member. The electrodes are fixed on the holding member in such a manner that a molten joining metal is injected in the fixing holes with the electrodes arranged on the holding member and the joining metal is hardened in close contact with the metal film of the electrodes. The electrodes fixed on the holding member are so shaped that the inner wall of the holding member is invisible from the cylinder axis of the holding member. The electrodes have a metal thin film formed, by vapor deposition, on the inner wall surface of the electrodes after being fixed on the holding member.

What is claimed is:  
     
         1 . An electrostatic deflector for an electron beam radiation apparatus, comprising a cylindrical holding member made of an insulating material and a plurality of electrodes fixed, separately from each other, inside of said holding member and having at least a part of the surface thereof covered with a metal film; 
 wherein said holding member has a plurality of wedge-shaped fixing holes of a larger diameter on the outer peripheral surface than on the inner peripheral surface of said holding member, which holes are arranged in positions corresponding to the portions of said holding member where said electrodes are fixed respectively, and a molten joining metal is injected into said fixing holes with said electrodes on said holding member and hardened in close contact with the metal film of said electrodes, thereby fixing said holding member;    wherein said electrodes fixed on said holding member have such a shape that the inner wall surface of said holding member is invisible from the cylinder axis of said holding member; and    wherein said plurality of electrodes, after being fixed on said holding member, are covered with a metal thin film, by vapor deposition, on the inner wall surface thereof.    
     
     
         2 . An electrostatic deflector of an electron beam radiation apparatus according to  claim 1 , wherein the material of said metal thin film is platinum.  
     
     
         3 . A method of fabricating an electrostatic deflector of an electron beam radiation apparatus including a cylindrical holding member made of an insulating material and a plurality of electrodes fixed, separately from each other, inside of said holding member and having at least a part of the surface thereof covered with a metal film, comprising the steps of: 
 fixing said plurality of said electrodes on said holding member; holding said holding member in vacuum; and rotating said holding member while heating the material of said metal thin film providing a vapor source and at the same time moving said material in said holding member, thereby forming said metal thin film on the inner wall surface of said electrodes.    
     
     
         4 . A vapor deposition apparatus for fabricating an electrostatic deflector of an electron beam radiation apparatus according to  claim 1 , further comprising: 
 a vacuum chamber;    a rotary table arranged in said vacuum chamber for rotatably holding said holding member about the center axis of said holding member with a plurality of electrodes fixed thereon;    a vapor deposit source holding mechanism for holding a linear vapor deposit source along the center axis of said holding member; and    a heating mechanism for heating said linear vapor deposit source.    
     
     
         5 . A vapor deposition apparatus according to  claim 4 , wherein said vapor deposit source holding mechanism includes a moving mechanism for moving said linear vapor deposit source along the center axis of said holding member.  
     
     
         6 . An electrostatic deflector of an electron beam radiation apparatus, comprising a cylindrical holding member made of a non-conductive material and a plurality of electrodes having at least a partially conductive surface separated fixedly from each other along the inner peripheral direction of said holding member, 
 wherein said holding member has a plurality of openings extending in the direction parallel to the axis of said cylinder in the portions thereof facing the space between adjoining ones of said electrodes.    
     
     
         7 . An electrostatic deflector of an electron beam radiation apparatus according to  claim 6 , 
 wherein a plurality of said electrodes extend in the direction of electron beam emission from said holding member.    
     
     
         8 . An electrostatic deflector of an electron beam radiation apparatus according to  claim 7 , 
 wherein the length of extension of a plurality of said electrodes in the direction of electron beam emission from said holding member is longer than one third of the length of said electrode.    
     
     
         9 . An electrostatic deflector of an electron beam radiation apparatus, comprising a cylindrical holding member made of a non-conductive material and a plurality of electrodes having at a least partially conductive surface separated fixedly from each other along the inner peripheral direction of said holding member, 
 wherein a plurality of said electrodes extend in the direction of electron beam emission from said holding member.    
     
     
         10 . An electrostatic deflector of an electron beam radiation apparatus according to  claim 9 , 
 wherein the length of extension of a plurality of said electrodes in the direction of electron beam emission from said holding member is longer than one third of the length of said electrode.    
     
     
         11 . An electrostatic deflector of an electron beam radiation apparatus, comprising a cylindrical holding member made of a non-conductive material and a plurality of electrodes having at least a partially conductive surface separated fixedly from each other along the inner peripheral direction of said holding member, 
 wherein said holding member has a plurality of independent holding units; and    wherein the total length of said holding units is sufficiently shorter than the length of said electrode.    
     
     
         12 . An electrostatic deflector of an electron beam radiation apparatus according to  claim 11 , 
 wherein the distance from the end of the holding unit nearest to the sample along the direction of electron beam emission to the end of the electrodes along the direction of electron beam emission is longer than one third of the length of said electrodes.    
     
     
         13 . An electrostatic deflector of an electron beam radiation apparatus according to  claim 6 , 
 wherein said holding member includes a plurality of wedge-shaped fixing holes having a larger diameter on the outer peripheral surface of said holding member than on the inner peripheral surface thereof and arranged at positions corresponding to a plurality of said electrodes fixed, respectively, said electrodes being fixed on said holding member by injecting a molten joining metal into said fixing holes with the electrodes appropriately arranged on said holding member and setting said joining metal in close contact with the metal films of said electrodes;    wherein said electrodes, as fixed on said holding member, are so shaped that the inner wall surface of said holding member is invisible from the cylinder axis of said holding member; and    wherein said electrodes have a metal thin film formed by vapor deposition on the inner wall surface thereof after being fixed on said holding member.    
     
     
         14 . An electrostatic deflector of an electron beam radiation apparatus according to  claim 11 , 
 wherein said holding member includes a plurality of wedge-shaped fixing holes having a larger diameter on the outer peripheral surface of said holding member than on the inner peripheral surface thereof and arranged at positions corresponding to a plurality of said electrodes fixed, respectively, said electrodes being fixed on said holding member by injecting a molten joining metal into said fixing holes with the electrodes appropriately arranged on said holding member and setting said joining metal in close contact with the metal films of said electrodes;    wherein said electrodes, as fixed on said holding member, are so shaped that the inner wall surface of said holding member is invisible from the cylinder axis of said holding member; and    wherein said electrodes have a metal thin film formed by vapor deposition on the inner wall surface thereof after being fixed on said holding member.