Inventor · disambiguated record
Yoshihisa Ooae
Also filed as: OOAE YOSHIHISA
19 granted patents·3 pending applications·203 citations·filing 1996–2020
94Inventor score
Top patents by PatentIndex Score
22 records- 0191US8390201B2Multi-column electron beam exposure apparatus and magnetic field generation deviceYASUDA HIROSHI·Filed 2010·Granted Mar 5, 2013·14 cites·4 claims
- 0285US7777202B2Electron beam exposure apparatus involving the position and velocity calculationADVANTEST CORP·Filed 2007·Granted Aug 17, 2010·9 cites·5 claims
- 0384US8530857B2Stage deviceOOAE YOSHIHISA·Filed 2011·Granted Sep 10, 2013·10 cites·11 claims
- 0482US7919750B2Electron gun, electron beam exposure apparatus, and exposure methodADVANTEST CORP·Filed 2008·Granted Apr 5, 2011·6 cites·16 claims
- 0579US6465796B1Charge-particle beam lithography system of blanking aperture array typeADVANTEST CORP·Filed 1999·Granted Oct 15, 2002·33 cites·8 claims
- 0671US6268606B1Electrostatic deflector, for electron beam exposure apparatus, with reduced charge-upADVANTEST CORP·Filed 1999·Granted Jul 31, 2001·22 cites·8 claims
- 0763US5892237ACharged particle beam exposure method and apparatusFUJITSU LTD·Filed 1997·Granted Apr 6, 1999·28 cites·19 claims
- 0861US6727658B2Electron beam generating apparatus and electron beam exposure apparatusADVANTEST CORP·Filed 2003·Granted Apr 27, 2004·4 cites·19 claims
- 0959US6252344B1Electron gun used in an electron beam exposure apparatusADVANTEST CORP·Filed 1999·Granted Jun 26, 2001·13 cites·7 claims
- 1056US7737421B2Electron beam exposure apparatus and method for cleaning the sameADVANTEST CORP·Filed 2008·Granted Jun 15, 2010·0 cites·8 claims
- 1156US5981118AMethod for charged particle beam exposure with fixed barycenter through balancing stage scanFUJITSU LTD·Filed 1998·Granted Nov 9, 1999·10 cites·4 claims
- 1254US6407398B1Electron beam exposure apparatus and exposure methodADVANTEST CORP·Filed 1999·Granted Jun 18, 2002·19 cites·12 claims
- 1353US6509568B1Electrostatic deflector for electron beam exposure apparatusADVANTEST CORP·Filed 1999·Granted Jan 21, 2003·15 cites·8 claims
- 1450US11295925B2Electron gun devicePARAM CORP·Filed 2020·Granted Apr 5, 2022·0 cites·18 claims
- 1549US6046459AMethod and system for charged particle beam exposureFUJITSU LTD·Filed 1999·Granted Apr 4, 2000·7 cites·17 claims
- 1648US2007181829A1Electron-beam exposure systemTANAKA HITOSHI·Filed 2007·Application pending·0 cites
- 1743US6008495AElectron beam exposure deviceFUJITSU LTD·Filed 1997·Granted Dec 28, 1999·5 cites·18 claims
- 1841US6911780B2Electron beam, generating device, and testing deviceADVANTEST CORP·Filed 2003·Granted Jun 28, 2005·0 cites·12 claims
- 1941US5708276AElectron-beam exposure device and a method of detecting a mark position for the deviceFUJITSU LTD·Filed 1996·Granted Jan 13, 1998·6 cites·34 claims
- 2037US2002020354A1Electrostatic deflector for electron beam exposure apparatusFiled 2001·Application pending·0 cites
- 2137US2001045528A1Electrostatic deflector for electron beam exposure apparatusFiled 2001·Application pending·0 cites
- 2232US5945683AElectron beam exposure deviceFUJITSU LTD·Filed 1997·Granted Aug 31, 1999·2 cites·7 claims
Join the waitlist — get patent alerts
Get an alert when Yoshihisa Ooae files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →