Inventor · disambiguated record
Tom Choi
Also filed as: CHOI TOM · CHOI TOM S
11 granted patents·3 pending applications·73 citations·filing 2000–2024
87Inventor score
Top patents by PatentIndex Score
14 records- 0185US6514378B1Method for improving uniformity and reducing etch rate variation of etching polysiliconLAM RES CORP·Filed 2000·Granted Feb 4, 2003·36 cites·20 claims
- 0284US8906810B2Pulsed dielectric etch process for in-situ metal hard mask shape control to enable void-free metallizationLAM RES CORP·Filed 2013·Granted Dec 9, 2014·7 cites·17 claims
- 0381US7782591B2Methods of and apparatus for reducing amounts of particles on a wafer during wafer de-chuckingLAM RES CORP·Filed 2007·Granted Aug 24, 2010·9 cites·18 claims
- 0481US6531029B1Vacuum plasma processor apparatus and methodLAM RES CORP·Filed 2000·Granted Mar 11, 2003·15 cites·33 claims
- 0571US8283255B2In-situ photoresist strip during plasma etching of active hard maskCHO SANGJUN·Filed 2007·Granted Oct 9, 2012·4 cites·18 claims
- 0663US12315735B2Methods for removing etch stop layersAPPLIED MATERIALS INC·Filed 2022·Granted May 27, 2025·0 cites·20 claims
- 0760US7479457B2Gas mixture for removing photoresist and post etch residue from low-k dielectric material and method of use thereofLAM RES CORP·Filed 2005·Granted Jan 20, 2009·1 cites·14 claims
- 0858US2025357117A1Doped tungsten carbide low-k etch hard maskAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0956US10490406B2Systems and methods for material breakthroughAPPLIED MATERIALS INC·Filed 2018·Granted Nov 26, 2019·0 cites·20 claims
- 1056US2025379052A1Amorphous multi-metal-doped film for hardmask applicationAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1150US6897156B2Vacuum plasma processor methodLAM RES CORP·Filed 2003·Granted May 24, 2005·1 cites·24 claims
- 1245US8912633B2In-situ photoresist strip during plasma etching of active hard maskCHO SANGJUN·Filed 2012·Granted Dec 16, 2014·0 cites·20 claims
- 1341US2008064214A1Semiconductor processing including etched layer passivation using self-assembled monolayerLAM RES CORP·Filed 2006·Application pending·0 cites
- 1437US8124516B2Trilayer resist organic layer etchKANG SEAN S·Filed 2006·Granted Feb 28, 2012·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →