Inventor · disambiguated record
Toru Kitada
Also filed as: KITADA TORU
10 granted patents·10 pending applications·18 citations·filing 2005–2023
82Inventor score
Top patents by PatentIndex Score
20 records- 0190US9790590B2Vacuum-processing apparatus, vacuum-processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted Oct 17, 2017·6 cites·8 claims
- 0285US10309005B2Deposition device and deposition methodTOKYO ELECTRON LTD·Filed 2014·Granted Jun 4, 2019·3 cites·19 claims
- 0381US8906208B2Sputtering apparatus, sputtering method, and electronic device manufacturing methodKITADA TORU·Filed 2011·Granted Dec 9, 2014·3 cites·15 claims
- 0473US8968538B2Sputtering device and sputtering methodKITADA TORU·Filed 2009·Granted Mar 3, 2015·4 cites·4 claims
- 0568US12488970B2Film forming apparatus and method of controlling film forming apparatusTOKYO ELECTRON LTD·Filed 2023·Granted Dec 2, 2025·0 cites·4 claims
- 0667US7731825B2Manufacturing apparatus of magnetoresistance elementsCANON ANELVA CORP·Filed 2005·Granted Jun 8, 2010·2 cites·4 claims
- 0761US12486565B2Sputtering apparatus and control methodTOKYO ELECTRON LTD·Filed 2022·Granted Dec 2, 2025·0 cites·2 claims
- 0859US12018928B2Film thickness measurement method, film thickness measurement device, and film formation systemTOKYO ELECTRON LTD·Filed 2022·Granted Jun 25, 2024·0 cites·20 claims
- 0959US2022403503A1Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1059US2023175112A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1158US11894222B2Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2021·Granted Feb 6, 2024·0 cites·14 claims
- 1255US2009139855A1Manufacturing method and manufacturing apparatus of magnetoresistance elementsCANON ANELVA CORP·Filed 2008·Application pending·0 cites
- 1354US2025174465A1Hard mask, substrate processing method, and removal method for hard maskTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1452US2023005989A1Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1551US12387922B2Film forming apparatus, processing condition determination method, and film forming methodTOKYO ELECTRON LTD·Filed 2022·Granted Aug 12, 2025·0 cites·9 claims
- 1651US2024274436A1Film forming method and substrate processing deviceTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1749US2017317273A1Method for Forming Perpendicular Magnetization Type Magnetic Tunnel Junction Element and Apparatus for Producing Perpendicular Magnetization Type Magnetic Tunnel Junction ElementTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1842US2015136596A1Magnetron sputtering device, magnetron sputtering method, and non-transitory computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1942US2015187549A1Magnetron sputtering apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 2037US2022098717A1Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
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