Inventor · disambiguated record
Toshiya Shimada
Also filed as: SHIMADA TOSHIYA
10 granted patents·1 pending application·33 citations·filing 1995–2024
86Inventor score
Files withKAO CORP3KOKUSAI ELECTRIC CORP3HITACHI INT ELECTRIC INC2ABURATANI YUKINORI1SHIMADA TOSHIYA1
Top patents by PatentIndex Score
11 records- 0194US11101111B2Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2020·Granted Aug 24, 2021·3 cites·12 claims
- 0289US10763084B2Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2018·Granted Sep 1, 2020·4 cites·10 claims
- 0386US12505989B2Substrate processing apparatus, and method of manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2024·Granted Dec 23, 2025·0 cites·14 claims
- 0480US9911580B2Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatusYANAI HIDEHIRO·Filed 2011·Granted Mar 6, 2018·5 cites·17 claims
- 0575US11948778B2Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2021·Granted Apr 2, 2024·0 cites·13 claims
- 0668US7691413B2Composite particle and process for producing the sameKAO CORP·Filed 2005·Granted Apr 6, 2010·2 cites·18 claims
- 0750US6410605B1Process for preparing emulsionKAO CORP·Filed 2000·Granted Jun 25, 2002·13 cites·28 claims
- 0848US5613848AProcess for the production of glass-like carbon substrates for use as recording media and a setter for use in the processKAO CORP·Filed 1995·Granted Mar 25, 1997·6 cites·6 claims
- 0940US9082797B2Substrate processing apparatus and method of manufacturing semiconductor deviceABURATANI YUKINORI·Filed 2012·Granted Jul 14, 2015·0 cites·12 claims
- 1038US2012329290A1Substrate Placement Stage, Substrate Processing Apparatus and Method of Manufacturing Semiconductor DeviceSHIMADA TOSHIYA·Filed 2012·Application pending·0 cites
- 1134US10403478B2Plasma processing apparatus and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2015·Granted Sep 3, 2019·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →