Inventor · disambiguated record
Toshikazu Tachikawa
Also filed as: TACHIKAWA TOSHIKAZU
21 granted patents·29 pending applications·238 citations·filing 1997–2010
95Inventor score
Top patents by PatentIndex Score
50 records- 0192US6811817B2Method for reducing pattern dimension in photoresist layerTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Nov 2, 2004·47 cites·4 claims
- 0291US6936400B2Negative resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Aug 30, 2005·40 cites·27 claims
- 0390US6406829B1Negative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Jun 18, 2002·44 cites·7 claims
- 0481US7553610B2Method of forming fine patternsTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Jun 30, 2009·6 cites·7 claims
- 0579US8124318B2Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2010·Granted Feb 28, 2012·2 cites·20 claims
- 0678US7189499B2Method of forming fine patternsTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Mar 13, 2007·15 cites·7 claims
- 0774US7527909B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted May 5, 2009·9 cites·6 claims
- 0873US6455228B1Multilayered body for photolithographic patterningTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Sep 24, 2002·13 cites·6 claims
- 0968US7541138B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Jun 2, 2009·6 cites·3 claims
- 1068US7235345B2Agent for forming coating for narrowing patterns and method for forming fine pattern using the sameTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jun 26, 2007·9 cites·6 claims
- 1158US8187798B2Method of forming fine patternsSUGETA YOSHIKI·Filed 2009·Granted May 29, 2012·0 cites·6 claims
- 1257US8142980B2Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2009·Granted Mar 27, 2012·0 cites·13 claims
- 1357US7501220B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Mar 10, 2009·9 cites·10 claims
- 1457US2009041948A1Method of forming fine patternsSHINBORI HIROSHI·Filed 2008·Application pending·0 cites
- 1557US2010075263A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2009·Application pending·0 cites
- 1657US2009186156A1Method of forming fine patternsSUGETA YOSHIKI·Filed 2009·Application pending·0 cites
- 1756US2009148611A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2009·Application pending·0 cites
- 1856US2010139838A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2009·Application pending·0 cites
- 1955US2009011601A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2008·Application pending·0 cites
- 2055US2008145539A1Method of forming fine patternsSUGETA YOSHIKI·Filed 2008·Application pending·0 cites
- 2155US2009126855A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2009·Application pending·0 cites
- 2253US2006263728A1Method of forming fine patternsSHINBORI HIROSHI·Filed 2006·Application pending·0 cites
- 2352US2007213447A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2007·Application pending·0 cites
- 2451US2006258809A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2006·Application pending·0 cites
- 2550US2010272909A1Method of forming fine patternsSHINBORI HIROSHI·Filed 2010·Application pending·0 cites
- 2650US2006099347A1Method for reducing pattern dimension in photoresist layerSUGETA YOSHIKI·Filed 2005·Application pending·0 cites
- 2750US2006003601A1Method of forming fine patternsSUGETA YOSHIKI·Filed 2005·Application pending·0 cites
- 2849US2006079628A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2005·Application pending·0 cites
- 2948US5928837ANegative-working chemical-sensitization photoresist composition comprising oxime sulfonate compoundsTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jul 27, 1999·14 cites·10 claims
- 3048US2005245663A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2005·Application pending·0 cites
- 3147US6171749B1Negative-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jan 9, 2001·12 cites·14 claims
- 3244US7033731B2Multilayered body for photolithographic patterningTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Apr 25, 2006·0 cites·7 claims
- 3344US2005058950A1Method for reducing pattern dimension in photoresist layerFiled 2004·Application pending·0 cites
- 3443US2005009365A1Method of forming fine patternsFiled 2003·Application pending·0 cites
- 3543US2005175926A1Coating forming agent for reducing pattern dimension and method of forming fine pattern therewithTOKYO OHKA KOGYO CO LTD·Filed 2003·Application pending·0 cites
- 3642US2004121615A1Method of forming fine patternsFiled 2003·Application pending·0 cites
- 3742US2004067303A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentFiled 2003·Application pending·0 cites
- 3842US2004137377A1Method for forming fine patternsSHINBORI HIROSHI·Filed 2002·Application pending·0 cites
- 3942US2004106737A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentFiled 2003·Application pending·0 cites
- 4042US2003008968A1Method for reducing pattern dimension in photoresist layerFiled 2002·Application pending·0 cites
- 4140US2007141508A1Negative resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
- 4240US2002146645A1Multilayered body for photolithographic patterningFiled 2002·Application pending·0 cites
- 4340US2006134545A1Negative resist composition and process for formation of resist patternsIWASHITA JYUN·Filed 2004·Application pending·0 cites
- 4440US2004241576A1Negative resist material and method for forming resist patternFiled 2004·Application pending·0 cites
- 4539US8043798B2Method of forming fine patternsTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Oct 25, 2011·0 cites·7 claims
- 4639US6544712B1Negative working resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Apr 8, 2003·5 cites·7 claims
- 4738US2006110676A1Resist material for liquid immersion lithography process and method for forming resist pattern using the resist materialIWASHITA JYUN·Filed 2004·Application pending·0 cites
- 4836US6276861B1Writing instrumentTACHIKAWA KABUSHIKI KAISHA·Filed 1999·Granted Aug 21, 2001·6 cites·1 claims
- 4933US8198004B2Resist compositionHIRAYAMA TAKU·Filed 2008·Granted Jun 12, 2012·0 cites·2 claims
- 5033US6864036B2Negative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Mar 8, 2005·1 cites·25 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →