Inventor · disambiguated record
Tomonori Takahashi
Also filed as: TAKAHASHI TOMONORI
106 granted patents·21 pending applications·1,812 citations·filing 1983–2025
99Inventor score
Files withNGK INSULATORS LTD60FUJIFILM CORP29FUJIFILM ELECTRONIC MAT USA INC17KIOXIA CORP4TAKAHASHI TOMONORI3
Top patents by PatentIndex Score
127 records- 0196US12275921B2Treatment liquid and substrate treatment methodFUJIFILM CORP·Filed 2023·Granted Apr 15, 2025·3 cites·28 claims
- 0296US10415005B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2019·Granted Sep 17, 2019·7 cites·15 claims
- 0396US9562211B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2014·Granted Feb 7, 2017·15 cites·48 claims
- 0496US5897970ASystem for production of high-purity hydrogen, process for production of high-purity hydrogen, and fuel cell systemNGK INSULATORS LTD·Filed 1997·Granted Apr 27, 1999·177 cites·5 claims
- 0596US5741474AProcess for production of high-purity hydrogenNGK INSULATORS LTD·Filed 1995·Granted Apr 21, 1998·180 cites·5 claims
- 0695US5674301AHydrogen preparing apparatusNGK INSULATORS LTD·Filed 1995·Granted Oct 7, 1997·106 cites·4 claims
- 0795US5612012AMethod for removing carbon monoxide from reformed gasNGK INSULATORS LTD·Filed 1995·Granted Mar 18, 1997·120 cites·10 claims
- 0895US5518530AConnected body comprising a gas separator and a metal, and apparatus for separating hydrogen gas from a mixed gasNGK INSULATORS LTD·Filed 1994·Granted May 21, 1996·113 cites·9 claims
- 0994US10253282B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2016·Granted Apr 9, 2019·6 cites·43 claims
- 1094US5614001AHydrogen separator, hydrogen separating apparatus and method for manufacturing hydrogen separatorNGK INSULATORS LTD·Filed 1995·Granted Mar 25, 1997·113 cites·12 claims
- 1192US4543346APolycrystalline transparent spinel sintered body and method of producing the sameNGK INSULATORS LTD·Filed 1983·Granted Sep 24, 1985·45 cites·9 claims
- 1291US10490417B2Etching compositionFUJIFILM ELECTRONIC MAT USA INC·Filed 2015·Granted Nov 26, 2019·6 cites·16 claims
- 1390US11499099B2Etching compositionFUJIFILM ELECTRONIC MAT USA INC·Filed 2020·Granted Nov 15, 2022·2 cites·27 claims
- 1490US10533146B2Cleaning formulations for removing residues on semiconductor substratesFUJIFILM ELECTRONIC MAT USA INC·Filed 2017·Granted Jan 14, 2020·6 cites·64 claims
- 1590US8709277B2Etching compositionFUJIFILM ELECTRONIC MATERIALS·Filed 2013·Granted Apr 29, 2014·10 cites·39 claims
- 1689US10927329B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2019·Granted Feb 23, 2021·2 cites·15 claims
- 1789US10696933B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2019·Granted Jun 30, 2020·2 cites·40 claims
- 1889US8617417B2Cleaning composition, method for producing semiconductor device, and cleaning methodINABA TADASHI·Filed 2011·Granted Dec 31, 2013·14 cites·14 claims
- 1989US5746985AReforming reactorNGK INSULATORS LTD·Filed 1997·Granted May 5, 1998·66 cites·4 claims
- 2085US11639487B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2022·Granted May 2, 2023·0 cites·29 claims
- 2185US11618867B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2022·Granted Apr 4, 2023·0 cites·30 claims
- 2284US12481218B2Treatment liquid, method for washing substrate, and method for removing resistFUJIFILM CORP·Filed 2023·Granted Nov 25, 2025·0 cites·17 claims
- 2384US5980989AGas separator and method for preparing itNGK INSULATORS LTD·Filed 1994·Granted Nov 9, 1999·57 cites·2 claims
- 2483US11732190B2Chemical solution, method for manufacturing chemical solution, and method for treating substrateFUJIFILM CORP·Filed 2020·Granted Aug 22, 2023·1 cites·46 claims
- 2582US9726978B2Cleaning composition, cleaning process, and process for producing semiconductor deviceFUJIFILM CORP·Filed 2015·Granted Aug 8, 2017·3 cites·18 claims
- 2682US5958091AHydrogen preparing apparatusNGK INSULATORS LTD·Filed 1997·Granted Sep 28, 1999·42 cites·8 claims
- 2782US2022275313A1Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2022·Application pending·0 cites
- 2881US11401487B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2022·Granted Aug 2, 2022·0 cites·28 claims
- 2981US5348794AMonoaxially oriented multilayered packaging materialNIPPON PETROCHEMICALS CO LTD·Filed 1993·Granted Sep 20, 1994·50 cites·6 claims
- 3081US4584151AMethod of producing a polycrystalline transparent spinel sintered bodyNKG INSULATORS LTD·Filed 1985·Granted Apr 22, 1986·27 cites·11 claims
- 3181US2024312519A1Semiconductor memory device to hold 5-bits of data per memory cellKIOXIA CORP·Filed 2024·Application pending·0 cites
- 3279US9396926B2Cleaning composition, cleaning process, and process for producing semiconductor deviceFUJIFILM CORP·Filed 2014·Granted Jul 19, 2016·3 cites·20 claims
- 3379US5705129ANOx sensorNGK INSULATORS LTD·Filed 1996·Granted Jan 6, 1998·53 cites·7 claims
- 3479US5432024APorous lanthanum manganite sintered bodies and solid oxide fuel cellsNGK INSULATORS LTD·Filed 1993·Granted Jul 11, 1995·29 cites·37 claims
- 3579US2025086363A1Porous body design method and porous body manufacturing methodNGK INSULATORS LTD·Filed 2024·Application pending·0 cites
- 3678US12027203B2Semiconductor memory device to hold 5-bits of data per memory cellKIOXIA CORP·Filed 2023·Granted Jul 2, 2024·0 cites·20 claims
- 3778US11899369B2Treatment liquid, method for washing substrate, and method for removing resistFUJIFILM CORP·Filed 2022·Granted Feb 13, 2024·0 cites·21 claims
- 3876US11286444B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2020·Granted Mar 29, 2022·0 cites·25 claims
- 3976US10961453B2Etching compositionsFUJIFILM ELECTRONIC MAT USA INC·Filed 2019·Granted Mar 30, 2021·1 cites·25 claims
- 4075US9068153B2Cleaning composition, cleaning process, and process for producing semiconductor deviceTAKAHASHI TOMONORI·Filed 2010·Granted Jun 30, 2015·3 cites·17 claims
- 4174US11699486B2Semiconductor memory device to hold 5-bits of data per memory cellKIOXIA CORP·Filed 2022·Granted Jul 11, 2023·0 cites·18 claims
- 4274US8647523B2Etching compositionTAKAHASHI TOMONORI·Filed 2012·Granted Feb 11, 2014·3 cites·30 claims
- 4374US6403041B1Reaction vessel having an oxygen permeable membraneNGK INSULATORS LTD·Filed 1998·Granted Jun 11, 2002·36 cites·17 claims
- 4474US5194337AGlass joint body and method of manufacturing the sameNGK INSULATORS LTD·Filed 1991·Granted Mar 16, 1993·28 cites·4 claims
- 4573US6511527B2Method of treating exhaust gasNGK INSULATORS LTD·Filed 2001·Granted Jan 28, 2003·18 cites·7 claims
- 4672US12234399B2Chemical solution, method for manufacturing chemical solution, and method for treating substrateFUJIFILM CORP·Filed 2023·Granted Feb 25, 2025·0 cites·4 claims
- 4771US4795724ASilicon nitride sintered bodies and process for manufacturing the sameNGK INSULATORS LTD·Filed 1987·Granted Jan 3, 1989·22 cites·5 claims
- 4870US11361820B2Semiconductor memory device to hold 5-bits of data per memory cellKIOXIA CORP·Filed 2021·Granted Jun 14, 2022·0 cites·18 claims
- 4970US9834746B2Cleaning formulations for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2014·Granted Dec 5, 2017·2 cites·21 claims
- 5069USD902661SBowlTAKAHASHI TOMONORI·Filed 2019·Granted Nov 24, 2020·10 cites·1 claims
Showing the top 50 of 127 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →