Inventor · disambiguated record
Tomotaka Yamada
Also filed as: YAMADA TOMOTAKA
16 granted patents·10 pending applications·91 citations·filing 2000–2024
92Inventor score
Files withTOKYO OHKA KOGYO CO LTD18HIRAYAMA TAKU4SATO KAZUFUMI2HIRAYAMA KAWASAKI-SHI1NAKAMURA TSUYOSHI1
Top patents by PatentIndex Score
26 records- 0179US7318992B2Lift-off positive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Jan 15, 2008·6 cites·12 claims
- 0274US7527909B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted May 5, 2009·9 cites·6 claims
- 0374US6630282B2Crosslinked positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Oct 7, 2003·14 cites·14 claims
- 0472US7261994B2Positive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Aug 28, 2007·4 cites·9 claims
- 0572US6340553B1Positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Jan 22, 2002·26 cites·14 claims
- 0671US10261416B2Resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Apr 16, 2019·1 cites·4 claims
- 0768US7541138B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Jun 2, 2009·6 cites·3 claims
- 0863US2024295814A1Resist composition, resist pattern forming method, and polymerTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 0960US2023314945A1Negative-tone resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2023·Application pending·0 cites
- 1060US2024118619A1Resist composition and resist pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2023·Application pending·0 cites
- 1158US6818380B2Method for the preparation of a semiconductor deviceTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Nov 16, 2004·4 cites·7 claims
- 1257US8216763B2Photosensitive resin composition and method of forming patternSATO KAZUFUMI·Filed 2006·Granted Jul 10, 2012·1 cites·14 claims
- 1357US7501220B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Mar 10, 2009·9 cites·10 claims
- 1454US6777158B2Method for the preparation of a semiconductor deviceTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Aug 17, 2004·3 cites·13 claims
- 1553US2009068586A1Silsesquioxane resin, positive resist composition, resist laminate, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Application pending·0 cites
- 1650US7416832B2Positive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Aug 26, 2008·4 cites·12 claims
- 1749US9170487B2Resist composition, method of forming resist pattern, and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Oct 27, 2015·0 cites·7 claims
- 1847US2007281098A1Composition for forming antireflection coatingHIRAYAMA TAKU·Filed 2007·Application pending·0 cites
- 1943US2006021964A1Composition for forming antireflection coatingHIRAYAMA TAKU·Filed 2005·Application pending·0 cites
- 2042US6485887B2Positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Nov 26, 2002·4 cites·4 claims
- 2142US2005282090A1Composition for forming antireflection coatingHIRAYAMA KAWASAKI-SHI·Filed 2003·Application pending·0 cites
- 2241US8828304B2Method of forming resist pattern by nanoimprint lithographySATO KAZUFUMI·Filed 2007·Granted Sep 9, 2014·0 cites·3 claims
- 2339US2006222866A1Silsesquioxane resin, positive resist composition,layered product including resist and method of forming resist patternNAKAMURA TSUYOSHI·Filed 2004·Application pending·0 cites
- 2437US2007009828A1Positive resist composition, resist laminates and process for forming resist patternsTOKYO OHKA KOGYO CO LTD·Filed 2004·Application pending·0 cites
- 2533US8198004B2Resist compositionHIRAYAMA TAKU·Filed 2008·Granted Jun 12, 2012·0 cites·2 claims
- 2630US2006003252A1Chemical amplification type silicone based positive photoresist compositionHIRAYAMA TAKU·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →