Inventor · disambiguated record
Tsuyoshi Moriya
Also filed as: MORIYA TSUYOSHI
106 granted patents·48 pending applications·778 citations·filing 1999–2025
99Inventor score
Top patents by PatentIndex Score
154 records- 0198US8052798B2Particle removal apparatus and method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2009·Granted Nov 8, 2011·47 cites·8 claims
- 0296US8236109B2Component cleaning method and storage mediumMORIYA TSUYOSHI·Filed 2009·Granted Aug 7, 2012·43 cites·12 claims
- 0396US7416635B2Gas supply member and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Aug 26, 2008·28 cites·12 claims
- 0495US7654010B2Substrate processing system, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted Feb 2, 2010·27 cites·10 claims
- 0595US7651586B2Particle removal apparatus and method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Jan 26, 2010·52 cites·22 claims
- 0694US8877002B2Internal member of a plasma processing vesselTOKYO ELECTRON LTD·Filed 2013·Granted Nov 4, 2014·7 cites·13 claims
- 0794US7780786B2Internal member of a plasma processing vesselTOKYO ELECTRON LTD·Filed 2003·Granted Aug 24, 2010·51 cites·9 claims
- 0894US6184489B1Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particlesNEC CORP·Filed 1999·Granted Feb 6, 2001·119 cites·13 claims
- 0992US7628864B2Substrate cleaning apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Dec 8, 2009·19 cites·12 claims
- 1092US7464581B2Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoringTOKYO ELECTRON LTD·Filed 2005·Granted Dec 16, 2008·11 cites·8 claims
- 1191US8449715B2Internal member of a plasma processing vesselMITSUHASHI KOUJI·Filed 2010·Granted May 28, 2013·9 cites·5 claims
- 1290US8043971B2Plasma processing apparatus, ring member and plasma processing methodTOKYO ELECTRON LTD·Filed 2008·Granted Oct 25, 2011·13 cites·18 claims
- 1389US10805526B2Imaging apparatus, imaging method, and computer program productSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Oct 13, 2020·5 cites·22 claims
- 1489US8337629B2Method for cleaning elements in vacuum chamber and apparatus for processing substratesMORIYA TSUYOSHI·Filed 2012·Granted Dec 25, 2012·7 cites·19 claims
- 1589US7913702B2Substrate cleaning method, substrate cleaning apparatus, substrate processing system, substrate cleaning program and storage mediumTOKYO ELECTRON LTD·Filed 2009·Granted Mar 29, 2011·12 cites·17 claims
- 1688US8152907B2Gas purification apparatus and methodMORIYA TSUYOSHI·Filed 2008·Granted Apr 10, 2012·10 cites·7 claims
- 1787US8257498B2Substrate transfer module and substrate processing systemYAMAWAKU JUN·Filed 2008·Granted Sep 4, 2012·12 cites·18 claims
- 1887US7560083B2Method for removing water molecules from vacuum chamber, program for executing the method, and storage medium storing the programTOKYO ELECTRON LTD·Filed 2006·Granted Jul 14, 2009·6 cites·12 claims
- 1987US6423176B1Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particlesNEC CORP·Filed 2000·Granted Jul 23, 2002·27 cites·27 claims
- 2085US7756599B2Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the programTOKYO ELECTRON LTD·Filed 2005·Granted Jul 13, 2010·10 cites·8 claims
- 2184US6737666B1Apparatus and method for detecting an end point of a cleaning processNEC ELECTRONICS CORP·Filed 2000·Granted May 18, 2004·34 cites·8 claims
- 2283US7347006B2Processing apparatus and method for removing particles therefromTOKYO ELECTRON LTD·Filed 2005·Granted Mar 25, 2008·9 cites·6 claims
- 2382US9661290B2Image processing apparatus and methodSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted May 23, 2017·3 cites·20 claims
- 2481US7648581B2Substrate cleaning method, substrate cleaning apparatus, substrate processing system, substrate cleaning program and storage mediumTOKYO ELECTRON LTD·Filed 2005·Granted Jan 19, 2010·6 cites·10 claims
- 2580US7299104B2Substrate processing apparatus and substrate transferring methodTOKYO ELECTRON LTD·Filed 2004·Granted Nov 20, 2007·24 cites·10 claims
- 2679US10771754B2Image white balance correction method and electronic deviceSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Sep 8, 2020·2 cites·12 claims
- 2779US7458247B2Vacuum apparatus including a particle monitoring unit, particle monitoring method, and programTOKYO ELECTRON LTD·Filed 2007·Granted Dec 2, 2008·6 cites·14 claims
- 2878US10491875B2Image processing apparatus and image processing methodSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Nov 26, 2019·2 cites·15 claims
- 2978US7927066B2Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing componentTOKYO ELECTRON LTD·Filed 2006·Granted Apr 19, 2011·8 cites·12 claims
- 3078US7852476B2Particle monitor system and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2008·Granted Dec 14, 2010·5 cites·7 claims
- 3178US7245364B2Apparatus for inspecting a surface of an object to be processedTOKYO ELECTRON LTD·Filed 2005·Granted Jul 17, 2007·5 cites·13 claims
- 3277US11450512B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Sep 20, 2022·2 cites·2 claims
- 3377US7913351B2Cleaning apparatus and cleaning methodTOKYO ELECTRON LTD·Filed 2007·Granted Mar 29, 2011·5 cites·13 claims
- 3476US12482635B2Plasma processing device, and plasma processing methodTOKYO ELECTRON LTD·Filed 2024·Granted Nov 25, 2025·0 cites·12 claims
- 3576US8058186B2Components for substrate processing apparatus and manufacturing method thereofMORIYA TSUYOSHI·Filed 2005·Granted Nov 15, 2011·5 cites·4 claims
- 3676US8048235B2Gate valve cleaning method and substrate processing systemTOKYO ELECTRON LTD·Filed 2008·Granted Nov 1, 2011·4 cites·11 claims
- 3775US11776105B2Contaminant detection system, contaminant detecting method, and semiconductor manufacturing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Oct 3, 2023·1 cites·17 claims
- 3875US7837432B2Exhaust system and exhausting pump connected to a processing chamber of a substrate processing apparatusTOKYO ELECTRON LTD·Filed 2008·Granted Nov 23, 2010·5 cites·7 claims
- 3975US7797984B2Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoringTOKYO ELECTRON LTD·Filed 2008·Granted Sep 21, 2010·2 cites·11 claims
- 4075US7748138B2Particle removal method for a substrate transfer mechanism and apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Jul 6, 2010·5 cites·7 claims
- 4174US8082124B2Method and system for diagnosing abnormal plasma dischargeMIYANO TAKAYA·Filed 2007·Granted Dec 20, 2011·5 cites·15 claims
- 4274US7006682B1Apparatus for monitoring particles and method of doing the sameNEC CORP·Filed 2000·Granted Feb 28, 2006·11 cites·81 claims
- 4374US2024240324A1Carbon hard mask, film forming apparatus, and film forming methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 4473US9022225B2Filtration filter and production method thereforMORIYA TSUYOSHI·Filed 2012·Granted May 5, 2015·2 cites·21 claims
- 4573US8382938B2Gate valve cleaning method and substrate processing systemTOKYO ELECTRON LTD·Filed 2011·Granted Feb 26, 2013·2 cites·12 claims
- 4673US7976637B2Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for implementing the methodTOKYO ELECTRON LTD·Filed 2007·Granted Jul 12, 2011·3 cites·6 claims
- 4773US7937178B2Charging method for semiconductor device manufacturing apparatus, storage medium storing program for implementing the charging method, and semiconductor device manufacturing apparatus implementing the charging methodTOKYO ELECTRON LTD·Filed 2007·Granted May 3, 2011·2 cites·10 claims
- 4872US8945313B2Vacuum exhaust method and a substrate processing apparatus thereforTOKYO ELECTRON LTD·Filed 2012·Granted Feb 3, 2015·2 cites·18 claims
- 4972US8585831B2Substrate cleaning methodMATSUI HIDEFUMI·Filed 2010·Granted Nov 19, 2013·3 cites·6 claims
- 5072US7045465B2Particle-removing method for a semiconductor device manufacturing apparatusNEC ELECTRONICS CORP·Filed 2001·Granted May 16, 2006·10 cites·7 claims
Showing the top 50 of 154 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →