Inventor · disambiguated record
Tuan Ngo
Also filed as: NGO TUAN · NGO TUAN M
11 granted patents·632 citations·filing 1983–2012
93Inventor score
Top patents by PatentIndex Score
11 records- 0196US5689215AMethod of and apparatus for controlling reactive impedances of a matching network connected between an RF source and an RF plasma processorLAM RES CORP·Filed 1996·Granted Nov 18, 1997·137 cites·35 claims
- 0294US5929717AMethod of and apparatus for minimizing plasma instability in an RF processorLAM RES CORP·Filed 1998·Granted Jul 27, 1999·163 cites·30 claims
- 0387US5982099AMethod of and apparatus for igniting a plasma in an r.f. plasma processorLAM RES CORP·Filed 1996·Granted Nov 9, 1999·109 cites·37 claims
- 0486US6361645B1Method and device for compensating wafer bias in a plasma processing chamberLAM RES CORP·Filed 1998·Granted Mar 26, 2002·83 cites·32 claims
- 0584US6526355B1Integrated full wavelength spectrometer for wafer processingLAM RES CORP·Filed 2000·Granted Feb 25, 2003·23 cites·6 claims
- 0681US4507078AWafer handling apparatus and methodSILICON VALLEY GROUP·Filed 1983·Granted Mar 26, 1985·57 cites·26 claims
- 0780US9659757B2Measuring and controlling wafer potential in pulsed RF bias processingLAM RES CORP·Filed 2012·Granted May 23, 2017·4 cites·11 claims
- 0874US6622286B1Integrated electronic hardware for wafer processing control and diagnosticLAM RES CORP·Filed 2000·Granted Sep 16, 2003·20 cites·10 claims
- 0972US6060837AMethod of and apparatus for minimizing plasma instability in an rf processorLAM RES CORP·Filed 1999·Granted May 9, 2000·34 cites·25 claims
- 1063US8192576B2Methods of and apparatus for measuring and controlling wafer potential in pulsed RF bias processingKUTHI ANDRAS·Filed 2007·Granted Jun 5, 2012·2 cites·22 claims
- 1147US8303763B2Measuring and controlling wafer potential in pulsed RF bias processingKUTHI ANDRAS·Filed 2012·Granted Nov 6, 2012·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →