Inventor · disambiguated record
Tza-Jing Gung
Also filed as: GUNG TZA-JING
57 granted patents·17 pending applications·328 citations·filing 2001–2024
98Inventor score
Top patents by PatentIndex Score
74 records- 0197US11915918B2Cleaning of sin with CCP plasma or RPS cleanAPPLIED MATERIALS INC·Filed 2021·Granted Feb 27, 2024·4 cites·8 claims
- 0292US11289312B2Physical vapor deposition (PVD) chamber with in situ chamber cleaning capabilityAPPLIED MATERIALS INC·Filed 2019·Granted Mar 29, 2022·4 cites·18 claims
- 0391US10790180B2Electrostatic chuck with variable pixelated magnetic fieldAPPLIED MATERIALS INC·Filed 2019·Granted Sep 29, 2020·5 cites·9 claims
- 0491US10577689B2Sputtering showerheadAPPLIED MATERIALS INC·Filed 2017·Granted Mar 3, 2020·3 cites·20 claims
- 0591US7569125B2Shields usable with an inductively coupled plasma reactorAPPLIED MATERIALS INC·Filed 2005·Granted Aug 4, 2009·16 cites·17 claims
- 0691US6491801B1Auxiliary vertical magnet outside a nested unbalanced magnetronAPPLIED MATERIALS INC·Filed 2001·Granted Dec 10, 2002·41 cites·16 claims
- 0790US10410889B2Systems and methods for electrical and magnetic uniformity and skew tuning in plasma processing reactorsAPPLIED MATERIALS INC·Filed 2015·Granted Sep 10, 2019·7 cites·16 claims
- 0890US7736473B2Magnetron having continuously variable radial positionAPPLIED MATERIALS INC·Filed 2005·Granted Jun 15, 2010·11 cites·8 claims
- 0990US7686926B2Multi-step process for forming a metal barrier in a sputter reactorAPPLIED MATERIALS INC·Filed 2005·Granted Mar 30, 2010·16 cites·11 claims
- 1090US7186319B2Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetryAPPLIED MATERIALS INC·Filed 2005·Granted Mar 6, 2007·15 cites·21 claims
- 1189US11898236B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2021·Granted Feb 13, 2024·1 cites·17 claims
- 1289US11562909B2Directional selective junction clean with field polymer protectionsAPPLIED MATERIALS INC·Filed 2020·Granted Jan 24, 2023·2 cites·8 claims
- 1389US9646843B2Tunable magnetic field to improve uniformityAPPLIED MATERIALS INC·Filed 2015·Granted May 9, 2017·6 cites·16 claims
- 1489US9613783B2Method and apparatus for controlling a magnetic field in a plasma chamberAPPLIED MATERIALS INC·Filed 2014·Granted Apr 4, 2017·7 cites·20 claims
- 1588US10115566B2Method and apparatus for controlling a magnetic field in a plasma chamberAPPLIED MATERIALS INC·Filed 2017·Granted Oct 30, 2018·4 cites·12 claims
- 1688US7018515B2Selectable dual position magnetronAPPLIED MATERIALS INC·Filed 2004·Granted Mar 28, 2006·21 cites·40 claims
- 1788US6495009B1Auxiliary in-plane magnet inside a nested unbalanced magnetronAPPLIED MATERIALS INC·Filed 2001·Granted Dec 17, 2002·29 cites·18 claims
- 1887US7041201B2Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewithAPPLIED MATERIALS INC·Filed 2003·Granted May 9, 2006·31 cites·18 claims
- 1987US6663754B2Tubular magnet as center pole in unbalanced sputtering magnetronAPPLIED MATERIALS INC·Filed 2001·Granted Dec 16, 2003·26 cites·22 claims
- 2086US10763090B2High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this processAPPLIED MATERIALS INC·Filed 2016·Granted Sep 1, 2020·3 cites·19 claims
- 2185US7767064B2Position controlled dual magnetronAPPLIED MATERIALS INC·Filed 2006·Granted Aug 3, 2010·10 cites·25 claims
- 2284US9779953B2Electromagnetic dipole for plasma density tuning in a substrate processing chamberAPPLIED MATERIALS INC·Filed 2014·Granted Oct 3, 2017·6 cites·5 claims
- 2384US8685215B2Mechanism for continuously varying radial position of a magnetronMILLER KEITH A·Filed 2010·Granted Apr 1, 2014·5 cites·12 claims
- 2481US11152248B2Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutionsAPPLIED MATERIALS INC·Filed 2020·Granted Oct 19, 2021·1 cites·20 claims
- 2580US8871064B2Electromagnet array in a sputter reactorGUNG TZA-JING·Filed 2010·Granted Oct 28, 2014·6 cites·6 claims
- 2679US9028659B2Magnetron design for extended target life in radio frequency (RF) plasmasAPPLIED MATERIALS INC·Filed 2013·Granted May 12, 2015·1 cites·20 claims
- 2778US9620339B2Sputter source for semiconductor process chambersAPPLIED MATERIALS INC·Filed 2013·Granted Apr 11, 2017·1 cites·8 claims
- 2878US2022310363A1Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2977US11948846B2Analyzing in-plane distortionAPPLIED MATERIALS INC·Filed 2023·Granted Apr 2, 2024·0 cites·20 claims
- 3077US10515796B2Dry etch rate reduction of silicon nitride filmsAPPLIED MATERIALS INC·Filed 2018·Granted Dec 24, 2019·2 cites·20 claims
- 3177US9499901B2High density TiN RF/DC PVD deposition with stress tuningAPPLIED MATERIALS INC·Filed 2013·Granted Nov 22, 2016·1 cites·10 claims
- 3277US8476162B2Methods of forming layers on substratesHA TAE HONG·Filed 2011·Granted Jul 2, 2013·4 cites·20 claims
- 3376US11339475B2Film stack overlay improvementAPPLIED MATERIALS INC·Filed 2019·Granted May 24, 2022·2 cites·17 claims
- 3476US2024243018A1Analyzing in-plane distortionAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3575US7527713B2Variable quadruple electromagnet array in plasma processingAPPLIED MATERIALS INC·Filed 2004·Granted May 5, 2009·12 cites·20 claims
- 3674US11626410B2Silicon-containing layer for bit line resistance reductionAPPLIED MATERIALS INC·Filed 2022·Granted Apr 11, 2023·0 cites·16 claims
- 3774US11587764B2Magnetic housing systemsAPPLIED MATERIALS INC·Filed 2019·Granted Feb 21, 2023·1 cites·12 claims
- 3874US2022310364A1Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 3973US10707116B2Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutionsAPPLIED MATERIALS INC·Filed 2018·Granted Jul 7, 2020·1 cites·20 claims
- 4072US10109462B2Dual radio-frequency tuner for process control of a plasma processAPPLIED MATERIALS INC·Filed 2018·Granted Oct 23, 2018·1 cites·20 claims
- 4172US7686928B2Pressure switched dual magnetronAPPLIED MATERIALS INC·Filed 2004·Granted Mar 30, 2010·12 cites·16 claims
- 4270US11637107B2Silicon-containing layer for bit line resistance reductionAPPLIED MATERIALS INC·Filed 2021·Granted Apr 25, 2023·0 cites·12 claims
- 4370US8841211B2Methods for forming interconnect structuresLEE JOUNG JOO·Filed 2011·Granted Sep 23, 2014·4 cites·22 claims
- 4470US2021319989A1Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 4569US12027354B2Cleaning of SIN with CCP plasma or RPS cleanAPPLIED MATERIALS INC·Filed 2022·Granted Jul 2, 2024·0 cites·10 claims
- 4668US2020357616A1High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this processAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 4767US12463052B2Directional selective junction clean with field polymer protectionsAPPLIED MATERIALS INC·Filed 2022·Granted Nov 4, 2025·0 cites·8 claims
- 4867US11637043B2Analyzing in-plane distortionAPPLIED MATERIALS INC·Filed 2020·Granted Apr 25, 2023·0 cites·15 claims
- 4966US10460968B2Electrostatic chuck with variable pixelated magnetic fieldAPPLIED MATERIALS INC·Filed 2013·Granted Oct 29, 2019·1 cites·6 claims
- 5065US9752228B2Sputtering target for PVD chamberLIU ZHENDONG·Filed 2010·Granted Sep 5, 2017·1 cites·6 claims
Showing the top 50 of 74 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →