Inventor · disambiguated record
Udo Dinger
Also filed as: DINGER UDO
46 granted patents·9 pending applications·1,340 citations·filing 1996–2025
98Inventor score
Files withZEISS CARL SMT AG24ZEISS CARL SMT GMBH13ZEISS STIFTUNG6DINGER UDO4CARL ZEISS SEMICONDUCTOR1
Top patents by PatentIndex Score
55 records- 0198US6438199B1Illumination system particularly for microlithographyZEISS STIFTUNG·Filed 2000·Granted Aug 20, 2002·199 cites·65 claims
- 0298US6353470B1Microlithography reduction objective and projection exposure apparatusFiled 2000·Granted Mar 5, 2002·173 cites·39 claims
- 0398US6198793B1Illumination system particularly for EUV lithographyZEISS STIFTUNG·Filed 1999·Granted Mar 6, 2001·236 cites·54 claims
- 0494US7977651B2Illumination system particularly for microlithographyZEISS CARL SMT GMBH·Filed 2009·Granted Jul 12, 2011·15 cites·20 claims
- 0593US7375798B2Projection system for EUV lithographyZEISS CARL SMT AG·Filed 2007·Granted May 20, 2008·25 cites·17 claims
- 0693US7355678B2Projection system for EUV lithographyZEISS CARL SMT AG·Filed 2005·Granted Apr 8, 2008·25 cites·20 claims
- 0793US6600552B2Microlithography reduction objective and projection exposure apparatusZEISS CARL SMT AG·Filed 2001·Granted Jul 29, 2003·49 cites·14 claims
- 0893US6244717B1Reduction objective for extreme ultraviolet lithographyZEISS STIFTUNG·Filed 1999·Granted Jun 12, 2001·103 cites·19 claims
- 0992US8587767B2Illumination optics for EUV microlithography and related system and apparatusFIOLKA DAMIAN·Filed 2010·Granted Nov 19, 2013·12 cites·22 claims
- 1092US6985210B2Projection system for EUV lithographyZEISS CARL SMT AG·Filed 2003·Granted Jan 10, 2006·34 cites·35 claims
- 1191US7151592B2Projection system for EUV lithographyZEISS CARL SMT AG·Filed 2003·Granted Dec 19, 2006·34 cites·31 claims
- 1290US6902283B2Microlithography reduction objective and projection exposure apparatusZEISS CARL SMT AG·Filed 2003·Granted Jun 7, 2005·37 cites·36 claims
- 1389USRE42118EProjection system for EUV lithographyZEISS CARL SMT AG·Filed 2007·Granted Feb 8, 2011·20 cites·35 claims
- 1488US9411241B2Facet mirror for use in a projection exposure apparatus for microlithographyDINGER UDO·Filed 2010·Granted Aug 9, 2016·11 cites·27 claims
- 1588US7118449B1Method of manufacturing an optical elementZEISS CARL SMT AG·Filed 2004·Granted Oct 10, 2006·33 cites·19 claims
- 1688US6867913B26-mirror microlithography projection objectiveZEISS CARL SMT AG·Filed 2001·Granted Mar 15, 2005·31 cites·23 claims
- 1788US6859328B2Illumination system particularly for microlithographyCARL ZEISS SEMICONDUCTOR·Filed 2002·Granted Feb 22, 2005·58 cites·24 claims
- 1885US7348565B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2007·Granted Mar 25, 2008·10 cites·27 claims
- 1984US7186983B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2004·Granted Mar 6, 2007·21 cites·21 claims
- 2084US6577443B2Reduction objective for extreme ultraviolet lithographyZEISS STIFTUNG·Filed 2001·Granted Jun 10, 2003·30 cites·19 claims
- 2182US9996012B2Facet mirror for use in a projection exposure apparatus for microlithographyZEISS CARL SMT GMBH·Filed 2016·Granted Jun 12, 2018·2 cites·16 claims
- 2282US8976927B2Substrate for mirrors for EUV lithographyZEISS CARL SMT GMBH·Filed 2013·Granted Mar 10, 2015·6 cites·20 claims
- 2382US7481543B1Mirror for use in a projection exposure apparatusZEISS CARL SMT AG·Filed 2006·Granted Jan 27, 2009·8 cites·10 claims
- 2481US10261424B2Lithography apparatus and method for operating a lithography apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Apr 16, 2019·2 cites·29 claims
- 2581US7623620B2Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nmZEISS CARL SMT AG·Filed 2004·Granted Nov 24, 2009·26 cites·25 claims
- 2679US8710471B2Projection illumination system for EUV microlithographyDINGER UDO·Filed 2010·Granted Apr 29, 2014·3 cites·28 claims
- 2779US7006595B2Illumination system particularly for microlithographyZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Feb 28, 2006·15 cites·22 claims
- 2878US7456408B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2008·Granted Nov 25, 2008·6 cites·14 claims
- 2977US8934085B2Bundle-guiding optical collector for collecting the emission of a radiation sourceDINGER UDO·Filed 2010·Granted Jan 13, 2015·7 cites·22 claims
- 3075US9007559B2EUV collector with cooling deviceLAYH MICHAEL·Filed 2011·Granted Apr 14, 2015·4 cites·13 claims
- 3175US6700952B2Optical apparatus for diffracting radiation having wavelength ≦160 nmZEISS CARL SMT AG·Filed 2001·Granted Mar 2, 2004·14 cites·31 claims
- 3275US2025278025A1Euv optics module for an euv projection exposure apparatusZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 3374US5982558AREMA objective for microlithographic projection exposure systemsZEISS STIFTUNG·Filed 1996·Granted Nov 9, 1999·45 cites·13 claims
- 3471US9997268B2EUV-mirror, optical system with EUV-mirror and associated operating methodZEISS CARL SMT GMBH·Filed 2016·Granted Jun 12, 2018·1 cites·22 claims
- 3571US9442383B2EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating methodZEISS CARL SMT GMBH·Filed 2013·Granted Sep 13, 2016·3 cites·25 claims
- 3671US7592598B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2008·Granted Sep 22, 2009·2 cites·19 claims
- 3770US7443948B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2006·Granted Oct 28, 2008·2 cites·31 claims
- 3868US9444214B2Beam guidance system for the focusing guidance of radiation from a high-power laser light source toward a target and LPP X-ray source comprising a laser light source and such a beam guidance systemZEISS CARL SMT GMBH·Filed 2014·Granted Sep 13, 2016·2 cites·23 claims
- 3968US7910900B2Collector for an illumination systemZEISS CARL SMT GMBH·Filed 2007·Granted Mar 22, 2011·2 cites·43 claims
- 4068US6495839B1Microlithography projection objective and projection exposure apparatusZEISS STIFTUNG·Filed 2000·Granted Dec 17, 2002·11 cites·17 claims
- 4167US7557902B2Projection objectiveZEISS CARL SMT AG·Filed 2003·Granted Jul 7, 2009·10 cites·25 claims
- 4262US11303092B2Radiation source and device for feeding back emitted radiation to a laser sourceZEISS CARL SMT GMBH·Filed 2021·Granted Apr 12, 2022·0 cites·21 claims
- 4362US11199780B2Reflective optical element for EUV lithography and method for adapting a geometry of a componentZEISS CARL SMT GMBH·Filed 2020·Granted Dec 14, 2021·0 cites·23 claims
- 4461US7077533B2Reflecting device for electromagnetic wavesZEISS CARL SMT AG·Filed 2002·Granted Jul 18, 2006·6 cites·11 claims
- 4561US2010007866A1Method for producing facet mirrors and projection exposure apparatusZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 4660US7031428B2Substrate material for X-ray optical componentsSCHOTT AG·Filed 2004·Granted Apr 18, 2006·6 cites·28 claims
- 4757US2010182710A1Method for producing an optical element through a molding process, optical element produced according to the method, collector, and lighting systemZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 4855US8253927B2Optical element with multiple primary light sourcesDINGER UDO·Filed 2009·Granted Aug 28, 2012·1 cites·21 claims
- 4951US2013100426A1Method for producing facet mirrors and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2012·Application pending·0 cites
- 5051US2009015812A1Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
Showing the top 50 of 55 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →