Inventor · disambiguated record
Ulrich Matejka
Also filed as: MATEJKA ULRICH
20 granted patents·11 pending applications·37 citations·filing 2009–2025
91Inventor score
Top patents by PatentIndex Score
31 records- 0193US10068325B2Method for three-dimensionally measuring a 3D aerial image of a lithography maskZEISS CARL SMT GMBH·Filed 2017·Granted Sep 4, 2018·10 cites·20 claims
- 0290US10606048B2Imaging optical unit for a metrology system for examining a lithography maskZEISS CARL SMT GMBH·Filed 2017·Granted Mar 31, 2020·3 cites·21 claims
- 0386US11892769B2Method for detecting an object structure and apparatus for carrying out the methodZEISS CARL SMT GMBH·Filed 2020·Granted Feb 6, 2024·2 cites·23 claims
- 0483US10168539B2Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unitZEISS CARL AG·Filed 2018·Granted Jan 1, 2019·3 cites·12 claims
- 0583US9904060B2Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unitZEISS CARL AG·Filed 2014·Granted Feb 27, 2018·5 cites·38 claims
- 0681US11237185B2Apparatus and method for a scanning probe microscopeZEISS CARL SMT GMBH·Filed 2019·Granted Feb 1, 2022·1 cites·18 claims
- 0780US11079338B2Method for detecting a structure of a lithography mask and device for carrying out the methodZEISS CARL SMT GMBH·Filed 2019·Granted Aug 3, 2021·2 cites·30 claims
- 0878US8730474B2Method and apparatus for measuring of masks for the photo-lithographySCHERUEBL THOMAS·Filed 2009·Granted May 20, 2014·7 cites·25 claims
- 0978US2024152057A1Apparatus and method for characterizing a microlithographic maskZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1076US2025298324A1Method and device for mask inspectionZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1172US10698318B2Method and device for characterizing a mask for microlithographyZEISS CARL SMT GMBH·Filed 2018·Granted Jun 30, 2020·1 cites·19 claims
- 1272US10634886B2Method for three-dimensionally measuring a 3D aerial image of a lithography maskZEISS CARL SMT GMBH·Filed 2018·Granted Apr 28, 2020·1 cites·6 claims
- 1370US11914303B2Apparatus and method for characterizing a microlithographic maskZEISS CARL SMT GMBH·Filed 2021·Granted Feb 27, 2024·0 cites·17 claims
- 1469US11796563B2Apparatus and method for a scanning probe microscopeZEISS CARL SMT GMBH·Filed 2022·Granted Oct 24, 2023·0 cites·20 claims
- 1569US9207544B2Method for simulating an aerial imageMATEJKA ULRICH·Filed 2012·Granted Dec 8, 2015·2 cites·38 claims
- 1667US2025369899A1Mask metrology measuring device and method for examining a photomaskZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1766US2024255857A1Measurement apparatus, method for operating a mask-metrology measurement apparatus, and computer program productZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1864US10578881B2Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unitZEISS CARL AG·Filed 2018·Granted Mar 3, 2020·0 cites·20 claims
- 1964US2024061328A1Method and apparatus for characterization of a microlithography maskZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 2064US2025093770A1Illumination optical unit for a mask inspection systemZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2163US2025208398A1Magnifying imaging optical unit for a metrology system for examining objectsZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2261US11112702B2Device and method for characterizing a microlithographic maskZEISS CARL SMT GMBH·Filed 2020·Granted Sep 7, 2021·0 cites·20 claims
- 2357USRE44216EMicroscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspectionTOTZECK MICHAEL·Filed 2009·Granted May 14, 2013·0 cites·35 claims
- 2456US2024295828A1Method and measuring device for inspecting photomasks, and euv cameraZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2555US2024353757A1Measurement apparatus and method for inspecting photomasks intended for euv microlithographyZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2654US11619882B2Method and apparatus for characterizing a microlithographic maskZEISS CARL SMT GMBH·Filed 2021·Granted Apr 4, 2023·0 cites·20 claims
- 2754US2023221571A1Optical system, in particular for characterizing a microlithography maskZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 2854US2025175589A1Test system for a camera, mask inspections system and method for testing a cameraZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2952US11029259B2Detection device for detecting a structure on an area portion of a lithography mask, and apparatus comprising a detection device of this typeZEISS CARL SMT GMBH·Filed 2019·Granted Jun 8, 2021·0 cites·20 claims
- 3043US9535244B2Emulation of reproduction of masks corrected by local density variationsZEISS CARL SMT GMBH·Filed 2015·Granted Jan 3, 2017·0 cites·20 claims
- 3137US8970951B2Mask inspection microscope with variable illumination settingMATEJKA ULRICH·Filed 2010·Granted Mar 3, 2015·0 cites·51 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →