Inventor · disambiguated record
Vishwas Hardikar
Also filed as: HARDIKAR VISHWAS · HARDIKAR VISHWAS V · HARDIKAR VISHWAS VINAYAK
11 granted patents·5 pending applications·81 citations·filing 2003–2024
87Inventor score
Files withNOVELLUS SYSTEMS INC7SAMTEC INC4HARDIKAR VISHWAS2APPLIED MATERIALS INC1HARDIKAR VISHWAS V1
Top patents by PatentIndex Score
16 records- 0186US7195548B1Method and apparatus for post-CMP cleaning of a semiconductor work pieceNOVELLUS SYSTEMS INC·Filed 2006·Granted Mar 27, 2007·15 cites·20 claims
- 0284US6869336B1Methods and compositions for chemical mechanical planarization of rutheniumNOVELLUS SYSTEMS INC·Filed 2003·Granted Mar 22, 2005·36 cites·9 claims
- 0377US7422700B1Compositions and methods of electrochemical removal of material from a barrier layer of a waferNOVELLUS SYSTEMS INC·Filed 2005·Granted Sep 9, 2008·6 cites·10 claims
- 0474US12476117B2Electrically conductive vias and methods for producing sameSAMTEC INC·Filed 2024·Granted Nov 18, 2025·0 cites·14 claims
- 0574US7105082B2Composition and method for electrodeposition of metal on a work pieceNOVELLUS SYSTEMS INC·Filed 2003·Granted Sep 12, 2006·9 cites·39 claims
- 0666US2025014983A1Electrically conductive vias and methods for producing sameSAMTEC INC·Filed 2024·Application pending·0 cites
- 0764US7335288B2Methods for depositing copper on a noble metal layer of a work pieceNOVELLUS SYSTEMS INC·Filed 2003·Granted Feb 26, 2008·10 cites·17 claims
- 0857US12100647B2Electrically conductive vias and methods for producing sameSAMTEC INC·Filed 2020·Granted Sep 24, 2024·0 cites·22 claims
- 0955US7182673B2Method and apparatus for post-CMP cleaning of a semiconductor work pieceNOVELLUS SYSTEMS INC·Filed 2004·Granted Feb 27, 2007·5 cites·46 claims
- 1052US12009225B2Electrically conductive vias and methods for producing sameSAMTEC INC·Filed 2019·Granted Jun 11, 2024·0 cites·10 claims
- 1142US2014199842A1Chemical mechanical polishing process and slurry containing silicon nanoparticlesAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 1240US7468322B1Methods of multi-step electrochemical mechanical planarization of CuNOVELLUS SYSTEMS INC·Filed 2005·Granted Dec 23, 2008·0 cites·31 claims
- 1337US2005016861A1Method for planarizing a work pieceFiled 2003·Application pending·0 cites
- 1436US2005230354A1Method and composition of post-CMP wetting of thin filmsHARDIKAR VISHWAS V·Filed 2004·Application pending·0 cites
- 1530US2006042664A1Apparatus and method for removing a liquid from a rotating substrate surfaceHARDIKAR VISHWAS·Filed 2004·Application pending·0 cites
- 1629US8261758B2Apparatus and method for cleaning and removing liquids from front and back sides of a rotating workpieceHARDIKAR VISHWAS·Filed 2006·Granted Sep 11, 2012·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →