Inventor · disambiguated record
Vincent Sylvester Kuiper
Also filed as: KUIPER VINCENT SYLVESTER
20 granted patents·12 pending applications·53 citations·filing 2011–2025
93Inventor score
Files withASML NETHERLANDS BV23MAPPER LITHOGRAPHY IP BV5KUIPER VINCENT SYLVESTER2DE BOER GUIDO1SLOT ERWIN1
Top patents by PatentIndex Score
32 records- 0196US10600733B2Fabricating unique chips using a charged particle multi-beamlet lithography systemASML NETHERLANDS BV·Filed 2019·Granted Mar 24, 2020·6 cites·20 claims
- 0294US10522472B2Secure chips with serial numbersASML NETHERLANDS BV·Filed 2017·Granted Dec 31, 2019·16 cites·20 claims
- 0393US10714427B2Secure chips with serial numbersASML NETHERLANDS BV·Filed 2017·Granted Jul 14, 2020·10 cites·15 claims
- 0491US10079206B2Fabricating unique chips using a charged particle multi-beamlet lithography systemMAPPER LITHOGRAPHY IP BV·Filed 2016·Granted Sep 18, 2018·5 cites·21 claims
- 0588US9575418B2Apparatus for transferring a substrate in a lithography systemMAPPER LITHOGRAPHY IP BV·Filed 2015·Granted Feb 21, 2017·4 cites·22 claims
- 0686US10418324B2Fabricating unique chips using a charged particle multi-beamlet lithography systemASML NETHERLANDS BV·Filed 2016·Granted Sep 17, 2019·3 cites·21 claims
- 0783US11004800B2Secure chips with serial numbersASML NETHERLANDS BV·Filed 2019·Granted May 11, 2021·2 cites·20 claims
- 0879US9934943B2Beam grid layoutMAPPER LITHOGRAPHY IP BV·Filed 2014·Granted Apr 3, 2018·3 cites·33 claims
- 0978US2023369237A1Secure chips with serial numbersASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1071US11152302B2Fabricating unique chips using a charged particle multi-beamlet lithography systemASML NETHERLANDS BV·Filed 2020·Granted Oct 19, 2021·0 cites·7 claims
- 1171US9665014B2Charged particle lithography system with alignment sensor and beam measurement sensorMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted May 30, 2017·2 cites·18 claims
- 1270US11688694B2Secure chips with serial numbersASML NETHERLANDS BV·Filed 2020·Granted Jun 27, 2023·0 cites·20 claims
- 1366US2025253123A1Charged particle-optical apparatusASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 1466US2025118528A1Charged particle assessment system and methodASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 1565US9176397B2Apparatus for transferring a substrate in a lithography systemKUIPER VINCENT SYLVESTER·Filed 2012·Granted Nov 3, 2015·1 cites·21 claims
- 1664US9244726B2Network architecture for lithography machine clusterSLOT ERWIN·Filed 2012·Granted Jan 26, 2016·1 cites·21 claims
- 1764US2025095133A1Method of processing data derived from a sampleASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 1863USRE48903EApparatus for transferring a substrate in a lithography systemASML NETHERLANDS BV·Filed 2019·Granted Jan 25, 2022·0 cites·22 claims
- 1962US2024087842A1Data processing device and method, charged particle assessment system and methodASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2061US2024339290A1Method of processing a sample, and charged particle assessment systemASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 2160US12322569B2Method and system for fabricating unique chips using a charged particle multi-beamlet lithography systemASML NETHERLANDS BV·Filed 2021·Granted Jun 3, 2025·0 cites·20 claims
- 2260US2023023939A1Data processing device and method, charged particle assessment system and methodASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2358USRE49952EBeam grid layoutASML NETHERLANDS BV·Filed 2014·Granted Apr 30, 2024·0 cites·34 claims
- 2457US2023207259A1Alignment determination method and computer programASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2556US2025329511A1Electron-optical apparatus and method of obtaining topographical information about a sample surfaceASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2655US2024331971A1Charged particle assessment system and methodASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 2754USRE49732ECharged particle lithography system with alignment sensor and beam measurement sensorASML NETHERLANDS BV·Filed 2013·Granted Nov 21, 2023·0 cites·30 claims
- 2852US11137689B2Method and system for fabricating unique chips using a charged particle multi-beamlet lithography systemASML NETHERLANDS BV·Filed 2017·Granted Oct 5, 2021·0 cites·20 claims
- 2951US8936994B2Method of processing a substrate in a lithography systemKUIPER VINCENT SYLVESTER·Filed 2012·Granted Jan 20, 2015·0 cites·16 claims
- 3051US2025385072A1Charged particle apparatusASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 3149US2018068047A1Method and system for fabricating unique chips using a charged particle multi-beamlet lithography systemMAPPER LITHOGRAPHY IP BV·Filed 2016·Application pending·0 cites
- 3248US8895943B2Lithography system and method of processing substrates in such a lithography systemDE BOER GUIDO·Filed 2011·Granted Nov 25, 2014·0 cites·28 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →