Inventor · disambiguated record
Wataru Shibayama
Also filed as: SHIBAYAMA WATARU
32 granted patents·31 pending applications·56 citations·filing 2008–2024
95Inventor score
Files withNISSAN CHEMICAL CORP38NISSAN CHEMICAL IND LTD16NAKAJIMA MAKOTO4KANNO YUTA2SHIBAYAMA WATARU2
Top patents by PatentIndex Score
63 records- 0186US8426112B2Resist underlayer film forming composition containing polymer having nitrogen-containing silyl groupNAKAJIMA MAKOTO·Filed 2008·Granted Apr 23, 2013·9 cites·10 claims
- 0283US8828879B2Silicon-containing composition having sulfonamide group for forming resist underlayer filmKANNO YUTA·Filed 2010·Granted Sep 9, 2014·4 cites·12 claims
- 0382US9023588B2Resist underlayer film forming composition containing silicon having nitrogen-containing ringNAKAJIMA MAKOTO·Filed 2011·Granted May 5, 2015·8 cites·16 claims
- 0481US8835093B2Resist underlayer film forming composition containing silicon having anion groupSHIBAYAMA WATARU·Filed 2009·Granted Sep 16, 2014·7 cites·9 claims
- 0581US8815494B2Resist underlayer film forming composition containing silicon having anion groupNISSAN CHEMICAL IND LTD·Filed 2012·Granted Aug 26, 2014·4 cites·2 claims
- 0679US8864894B2Resist underlayer film forming composition containing silicone having onium groupSHIBAYAMA WATARU·Filed 2009·Granted Oct 21, 2014·5 cites·15 claims
- 0778US9760006B2Silicon-containing resist underlayer film forming composition having urea groupNAKAJIMA MAKOTO·Filed 2009·Granted Sep 12, 2017·5 cites·9 claims
- 0877US10197917B2Silicon-containing resists underlayer film-forming composition having phenyl group-containing chromophoreNISSAN CHEMICAL IND LTD·Filed 2015·Granted Feb 5, 2019·2 cites·10 claims
- 0976US10082735B2Silicon-containing resist underlayer film-forming composition having organic group having aliphatic polycyclic structureNISSAN CHEMICAL IND LTD·Filed 2015·Granted Sep 25, 2018·1 cites·11 claims
- 1076US2025044697A1Composition for forming silicon-containing resist underlayer film having carbonyl structureNISSAN CHEMICAL CORP·Filed 2024·Application pending·0 cites
- 1175US11022884B2Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl groupNISSAN CHEMICAL IND LTD·Filed 2015·Granted Jun 1, 2021·2 cites·18 claims
- 1275US10139729B2Coating composition for pattern reversal on soc patternNISSAN CHEMICAL IND LTD·Filed 2015·Granted Nov 27, 2018·2 cites·6 claims
- 1375US2024385521A1Primer for semiconductor substrate and method for forming a patternNISSAN CHEMICAL CORP·Filed 2024·Application pending·0 cites
- 1474US12248251B2Silicon-containing resist underlayer film-forming composition including organic group having ammonium groupNISSAN CHEMICAL CORP·Filed 2022·Granted Mar 11, 2025·0 cites·11 claims
- 1573US11215927B2Substrate treating composition and method for fabricating a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Jan 4, 2022·0 cites·9 claims
- 1673US2023112897A1Composition for forming photocurable silicon-containing coating filmNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 1770US9627217B2Silicon-containing EUV resist underlayer film-forming composition including additiveNISSAN CHEMICAL IND LTD·Filed 2013·Granted Apr 18, 2017·2 cites·14 claims
- 1869US11561472B2Radiation sensitive compositionNISSAN CHEMICAL IND LTD·Filed 2016·Granted Jan 24, 2023·1 cites·11 claims
- 1969US2023125270A1Radiation sensitive compositionNISSAN CHEMICAL IND LTD·Filed 2022·Application pending·0 cites
- 2068US10372040B2Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide groupNISSAN CHEMICAL IND LTD·Filed 2015·Granted Aug 6, 2019·1 cites·13 claims
- 2167US2021054231A1Composition for forming photocurable silicon-containing coating filmNISSAN CHEMICAL CORP·Filed 2018·Application pending·0 cites
- 2266US10558119B2Composition for coating resist patternNISSAN CHEMICAL IND LTD·Filed 2016·Granted Feb 11, 2020·1 cites·15 claims
- 2365US2024295819A1Composition for forming silicon-containing resist underlayer filmNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 2465US2022155688A1Alkaline developer soluable silicon-containing resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 2564US9725618B2Metal-containing resist underlayer film-forming composition containing polyacidNISSAN CHEMICAL IND LTD·Filed 2014·Granted Aug 8, 2017·1 cites·9 claims
- 2663US10613440B2Silicon-containing EUV resist underlayer film-forming composition containing onium sulfonateNISSAN CHEMICAL IND LTD·Filed 2013·Granted Apr 7, 2020·1 cites·7 claims
- 2759US2025377596A1Silicon-containing resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 2858US11175583B2Silicon-containing resist underlayer film-forming composition having phenyl group-containing chromophoreNISSAN CHEMICAL IND LTD·Filed 2018·Granted Nov 16, 2021·0 cites·8 claims
- 2958US2025362609A1Silicon-containing resist underlayer film-forming composition containing polyfunctional sulfonic acidNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 3057US2025348001A1Method for producing laminate and method for producing semiconductor elementNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 3156US11281104B2Alkaline developer soluable silicon-containing resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2018·Granted Mar 22, 2022·0 cites·12 claims
- 3256US10676491B1Isocyanuric acid derivative having alkoxyalkyl groups and method for producing the sameNISSAN CHEMICAL CORP·Filed 2018·Granted Jun 9, 2020·0 cites·5 claims
- 3355US11966164B2Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium groupNISSAN CHEMICAL CORP·Filed 2018·Granted Apr 23, 2024·0 cites·9 claims
- 3455US2021124266A1Primer for semiconductor substrate and method for forming a patternNISSAN CHEMICAL CORP·Filed 2019·Application pending·0 cites
- 3554US2024419073A1Additive-containing silicon-containing resist underlayer film forming compositionNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 3654US2024377745A1Silicon-containing resist underlayer film-forming composition and silicon-containing resist underlayer filmNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 3754US2025110402A1Silicon-containing resist underlayer film-forming composition having unsaturated bond and cyclic structureNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 3854US2024393693A1Silicon-containing resist underlayer film forming composition, laminate using the composition, and method for manufacturing semiconductor elementNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 3953US2022177653A1Film-forming compositionNISSAN CHEMICAL CORP·Filed 2020·Application pending·0 cites
- 4052US12372875B2Composition for resist pattern metallization processNISSAN CHEMICAL CORP·Filed 2020·Granted Jul 29, 2025·0 cites·10 claims
- 4152US2023176481A1Film-forming compositionNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 4252US2020041906A1Composition for forming silicon-containing resist underlayer film having carbonyl structureNISSAN CHEMICAL CORP·Filed 2018·Application pending·0 cites
- 4351US2024201593A1Composition for forming silicon-containing resist underlayer filmNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 4451US2024295815A1Silicon-containing resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 4551US2024231230A1Composition for forming silicon-containing resist underlayer filmNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 4650US2024162086A1Substrate with thin film, and semiconductor substrateNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 4749US2025355357A1Silicon-containing resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 4848US12493243B2Film-forming compositionNISSAN CHEMICAL CORP·Filed 2021·Granted Dec 9, 2025·0 cites·17 claims
- 4948US2024069441A1Composition for resist underlying film formationNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 5048US2025044692A1Silicon-containing resist underlayer film forming compositionNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
Showing the top 50 of 63 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →