Inventor · disambiguated record
Wenceslao A. Cebuhar
Also filed as: CEBUHAR WENCESLAO · CEBUHAR WENCESLAO A
19 granted patents·3 pending applications·172 citations·filing 2003–2009
94Inventor score
Top patents by PatentIndex Score
22 records- 0192US7133121B2Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap regionASML HOLDING NV·Filed 2005·Granted Nov 7, 2006·13 cites·10 claims
- 0292US6831768B1Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithographyASML HOLDING NV·Filed 2003·Granted Dec 14, 2004·39 cites·21 claims
- 0390US6876440B1Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap regionASML HOLDING NV·Filed 2003·Granted Apr 5, 2005·22 cites·15 claims
- 0489US7061591B2Maskless lithography systems and methods utilizing spatial light modulator arraysASML HOLDING NV·Filed 2003·Granted Jun 13, 2006·24 cites·13 claims
- 0588US7936445B2Altering pattern data based on measured optical element characteristicsASML NETHERLANDS BV·Filed 2006·Granted May 3, 2011·11 cites·31 claims
- 0686US7469058B2Method and system for a maskless lithography rasterization technique based on global optimizationASML HOLDING NV·Filed 2006·Granted Dec 23, 2008·8 cites·22 claims
- 0780US7410736B2Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zonesASML HOLDING NV·Filed 2003·Granted Aug 12, 2008·15 cites·9 claims
- 0880US7006295B2Illumination system and method for efficiently illuminating a pattern generatorASML HOLDING NV·Filed 2004·Granted Feb 28, 2006·15 cites·23 claims
- 0976US7688423B2Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zonesASML HOLDING NV·Filed 2008·Granted Mar 30, 2010·3 cites·16 claims
- 1072US7567368B2Systems and methods for minimizing scattered light in multi-SLM maskless lithographyASML HOLDING NV·Filed 2005·Granted Jul 28, 2009·3 cites·10 claims
- 1170US7158307B2Efficiently illuminating a modulating deviceASML HOLDING NV·Filed 2006·Granted Jan 2, 2007·4 cites·18 claims
- 1268US7859735B2Systems and methods for minimizing scattered light in multi-SLM maskless lithographyASML HOLDING NV·Filed 2009·Granted Dec 28, 2010·2 cites·8 claims
- 1368US7542013B2System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination modeASML HOLDING NV·Filed 2005·Granted Jun 2, 2009·2 cites·20 claims
- 1466US8259285B2Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint dataTROOST KARS ZEGER·Filed 2006·Granted Sep 4, 2012·5 cites·25 claims
- 1564US7463402B2Using time and/or power modulation to achieve dose gray-scale in optical maskless lithographyASML HOLDING NV·Filed 2006·Granted Dec 9, 2008·1 cites·3 claims
- 1662US7403266B2Maskless lithography systems and methods utilizing spatial light modulator arraysASML HOLDING NV·Filed 2006·Granted Jul 22, 2008·1 cites·36 claims
- 1760US6985280B2Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithographyASML HOLDING NV·Filed 2004·Granted Jan 10, 2006·4 cites·9 claims
- 1856US7773199B2Methods and systems to compensate for a stitching disturbance of a printed patternASML HOLDING NV·Filed 2007·Granted Aug 10, 2010·0 cites·17 claims
- 1956US7630054B2Methods and systems to compensate for a stitching disturbance of a printed patternASML HOLDING NV·Filed 2007·Granted Dec 8, 2009·0 cites·19 claims
- 2054US2007146672A1Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap regionASML HOLDING NV·Filed 2006·Application pending·0 cites
- 2141US2005046819A1Maskless lithography systems and methods utilizing spatial light modulator arraysASML HOLDING NV·Filed 2004·Application pending·0 cites
- 2232US2004239901A1System and method for producing gray scaling using multiple spatial light modulators in a maskless lithography systemASML HOLDING NV·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →