Inventor · disambiguated record
Wen Dar Liu
Also filed as: LIU WEN DAR
34 granted patents·7 pending applications·45 citations·filing 2002–2022
95Inventor score
Top patents by PatentIndex Score
41 records- 0194US12110435B2Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2022·Granted Oct 8, 2024·3 cites·18 claims
- 0293US9976111B2TiN hard mask and etch residual removalAIR PROD & CHEM·Filed 2016·Granted May 22, 2018·5 cites·30 claims
- 0392US9222018B1Titanium nitride hard mask and etch residue removalAIR PROD & CHEM·Filed 2015·Granted Dec 29, 2015·8 cites·30 claims
- 0484US9201308B2Water-rich stripping and cleaning formulation and method for using sameAIR PROD & CHEM·Filed 2013·Granted Dec 1, 2015·3 cites·20 claims
- 0581US11180697B2Etching solution having silicon oxide corrosion inhibitor and method of using the sameVERSUM MAT US LLC·Filed 2019·Granted Nov 23, 2021·2 cites·8 claims
- 0681US10934485B2Etching solution for selectively removing silicon over silicon-germanium alloy from a silicon-germanium/ silicon stack during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2018·Granted Mar 2, 2021·3 cites·19 claims
- 0779US10870799B2Etching solution for selectively removing tantalum nitride over titanium nitride during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2018·Granted Dec 22, 2020·2 cites·22 claims
- 0876US11035044B2Etching solution for tungsten and GST filmsVERSUM MAT US LLC·Filed 2018·Granted Jun 15, 2021·1 cites·25 claims
- 0976US10332784B2Selectively removing titanium nitride hard mask and etch residue removalAIR PROD & CHEM·Filed 2016·Granted Jun 25, 2019·2 cites·11 claims
- 1073US10934484B2Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/ germanium stack during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2019·Granted Mar 2, 2021·1 cites·25 claims
- 1172US9472420B2Composition for titanium nitride hard mask and etch residue removalAIR PROD & CHEM·Filed 2014·Granted Oct 18, 2016·2 cites·21 claims
- 1270US11017995B2Composition for TiN hard mask removal and etch residue cleaningVERSUM MAT US LLC·Filed 2019·Granted May 25, 2021·1 cites·16 claims
- 1370US10879076B2Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/silicon stack during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2018·Granted Dec 29, 2020·1 cites·22 claims
- 1469US11499236B2Etching solution for tungsten word line recessVERSUM MAT US LLC·Filed 2019·Granted Nov 15, 2022·1 cites·23 claims
- 1569US10072237B2Photoresist cleaning composition used in photolithography and a method for treating substrate therewithAIR PROD & CHEM·Filed 2016·Granted Sep 11, 2018·1 cites·20 claims
- 1667US10400167B2Etching compositions and methods for using sameVERSUM MAT US LLC·Filed 2016·Granted Sep 3, 2019·1 cites·22 claims
- 1766US11175587B2Stripper solutions and methods of using stripper solutionsVERSUM MAT US LLC·Filed 2018·Granted Nov 16, 2021·1 cites·20 claims
- 1866US10301580B2Stripping compositions having high WN/W etching selectivityVERSUM MAT US LLC·Filed 2015·Granted May 28, 2019·1 cites·29 claims
- 1964US8889609B2Cleaning formulations and method of using the cleaning formulationsWU AIPING·Filed 2012·Granted Nov 18, 2014·1 cites·21 claims
- 2059US12281251B2Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2020·Granted Apr 22, 2025·0 cites·23 claims
- 2158US8357646B2Stripper for dry film removalAIR PROD & CHEM·Filed 2009·Granted Jan 22, 2013·1 cites·10 claims
- 2255US11946148B2Hafnium oxide corrosion inhibitorVERSUM MAT US LLC·Filed 2020·Granted Apr 2, 2024·0 cites·17 claims
- 2354US12110436B2Co/Cu selective wet etchantVERSUM MAT US LLC·Filed 2020·Granted Oct 8, 2024·0 cites·21 claims
- 2454US6689872B2Dye for optical recording mediumRITEK CORP·Filed 2002·Granted Feb 10, 2004·4 cites·5 claims
- 2553US11955341B2Etching solution and method for selectively removing silicon nitride during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2020·Granted Apr 9, 2024·0 cites·17 claims
- 2653US10711227B2TiN hard mask and etch residue removalVERSUM MAT US LLC·Filed 2018·Granted Jul 14, 2020·0 cites·24 claims
- 2753US2024392194A1Post-Dry Etching Photoresist And Metal Containing Residue Removal FormulationVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 2852US2024271040A1Etching Solution For Selectively Removing Silicon-Germanium Alloy From A Silicon-Germanium/ Silicon Stack During Manufacture Of A Semiconductor DeviceVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 2950US11929257B2Etching solution and method for aluminum nitrideVERSUM MAT US LLC·Filed 2020·Granted Mar 12, 2024·0 cites·21 claims
- 3050US11186771B2Etching solution for selectively removing silicon nitride during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2018·Granted Nov 30, 2021·0 cites·16 claims
- 3148US10954480B2Compositions and methods for preventing collapse of high aspect ratio structures during dryingVERSUM MAT US LLC·Filed 2018·Granted Mar 23, 2021·0 cites·24 claims
- 3248US8518865B2Water-rich stripping and cleaning formulation and method for using sameRAO MADHUKAR BHASKARA·Filed 2010·Granted Aug 27, 2013·0 cites·6 claims
- 3347US9536730B2Cleaning formulationsAIR PROD & CHEM·Filed 2013·Granted Jan 3, 2017·0 cites·21 claims
- 3445US2022298417A1Liquid Compositions For Selectively Removing Polysilicon Over P-Doped Silicon And Silicon-Germanium During Manufacture Of A Semiconductor DeviceVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 3544US10647950B2Cleaning formulationsVERSUM MAT US LLC·Filed 2016·Granted May 12, 2020·0 cites·21 claims
- 3644US2024010915A1Etching Solution For Titanium Nitride And Molybdenum Conductive Metal LinesVERSUM MAT US LLC·Filed 2021·Application pending·0 cites
- 3744US2024103377A1Etching Composition And Method For EUV Mask Protective StructureVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 3843US2009229629A1Stripper For Copper/Low k BEOL CleanAIR PROD & CHEM·Filed 2009·Application pending·0 cites
- 3941US9957469B2Copper corrosion inhibition systemVERSUM MAT US LLC·Filed 2015·Granted May 1, 2018·0 cites·18 claims
- 4035US2019103282A1Etching Solution for Simultaneously Removing Silicon and Silicon-Germanium Alloy From a Silicon-Germanium/Silicon Stack During Manufacture of a Semiconductor DeviceVERSUM MAT US LLC·Filed 2018·Application pending·0 cites
- 4129US7078149B2Optical recording medium and method for making the sameRITEK CORP·Filed 2002·Granted Jul 18, 2006·0 cites·21 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →