Inventor · disambiguated record
Wei V. Tang
Also filed as: TANG WEI · TANG WEI V
33 granted patents·82 citations·filing 2012–2023
95Inventor score
Files withAPPLIED MATERIALS INC33
Top patents by PatentIndex Score
33 records- 0197US11715667B2Thermal process chamber lid with backside pumpingAPPLIED MATERIALS INC·Filed 2022·Granted Aug 1, 2023·5 cites·10 claims
- 0294US10014185B1Selective etch of metal nitride filmsAPPLIED MATERIALS INC·Filed 2017·Granted Jul 3, 2018·22 cites·14 claims
- 0393US9082702B2Atomic layer deposition methods for metal gate electrodesAPPLIED MATERIALS INC·Filed 2013·Granted Jul 14, 2015·18 cites·8 claims
- 0490US11335591B2Thermal process chamber lid with backside pumpingAPPLIED MATERIALS INC·Filed 2020·Granted May 17, 2022·2 cites·11 claims
- 0589US10407771B2Atomic layer deposition chamber with thermal lidAPPLIED MATERIALS INC·Filed 2014·Granted Sep 10, 2019·12 cites·18 claims
- 0686US9748354B2Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereofAPPLIED MATERIALS INC·Filed 2016·Granted Aug 29, 2017·5 cites·20 claims
- 0786US9145612B2Deposition of N-metal films comprising aluminum alloysAPPLIED MATERIALS INC·Filed 2013·Granted Sep 29, 2015·3 cites·18 claims
- 0885US8927059B2Deposition of metal films using alane-based precursorsAPPLIED MATERIALS INC·Filed 2012·Granted Jan 6, 2015·6 cites·19 claims
- 0980US11732358B2High temperature chemical vapor deposition lidAPPLIED MATERIALS INC·Filed 2022·Granted Aug 22, 2023·0 cites·15 claims
- 1079US12387975B2Thermal process chamber lid with backside pumpingAPPLIED MATERIALS INC·Filed 2023·Granted Aug 12, 2025·0 cites·19 claims
- 1179US8987080B2Methods for manufacturing metal gatesAPPLIED MATERIALS INC·Filed 2013·Granted Mar 24, 2015·4 cites·20 claims
- 1276US11894233B2Electronic device having an oxygen free platinum group metal filmAPPLIED MATERIALS INC·Filed 2022·Granted Feb 6, 2024·0 cites·9 claims
- 1376US9947578B2Methods for forming low-resistance contacts through integrated process flow systemsAPPLIED MATERIALS INC·Filed 2016·Granted Apr 17, 2018·2 cites·19 claims
- 1473US11447866B2High temperature chemical vapor deposition lidAPPLIED MATERIALS INC·Filed 2021·Granted Sep 20, 2022·0 cites·20 claims
- 1573US11075276B2Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursorsAPPLIED MATERIALS INC·Filed 2019·Granted Jul 27, 2021·1 cites·16 claims
- 1672US12328872B2Liner for V-NAND word line stackAPPLIED MATERIALS INC·Filed 2022·Granted Jun 10, 2025·0 cites·7 claims
- 1769US12463093B2Method of tuning film properties of metal nitride using plasmaAPPLIED MATERIALS INC·Filed 2023·Granted Nov 4, 2025·0 cites·7 claims
- 1867US10170321B2Aluminum content control of TiAIN filmsAPPLIED MATERIALS INC·Filed 2017·Granted Jan 1, 2019·1 cites·15 claims
- 1965US11623253B2In-situ DC plasma for cleaning pedestal heaterAPPLIED MATERIALS INC·Filed 2022·Granted Apr 11, 2023·0 cites·17 claims
- 2062US11476267B2Liner for V-NAND word line stackAPPLIED MATERIALS INC·Filed 2020·Granted Oct 18, 2022·0 cites·8 claims
- 2161US8927423B2Methods for annealing a contact metal layer to form a metal silicidation layerAPPLIED MATERIALS INC·Filed 2012·Granted Jan 6, 2015·1 cites·18 claims
- 2260US11260432B2In-situ DC plasma for cleaning pedestal heaterAPPLIED MATERIALS INC·Filed 2020·Granted Mar 1, 2022·0 cites·3 claims
- 2359US11488830B2Oxygen free deposition of platinum group metal filmsAPPLIED MATERIALS INC·Filed 2019·Granted Nov 1, 2022·0 cites·14 claims
- 2459US9683287B2Deposition of films comprising aluminum alloys with high aluminum contentAPPLIED MATERIALS INC·Filed 2013·Granted Jun 20, 2017·0 cites·15 claims
- 2557US11646226B2Method of tuning film properties of metal nitride using plasmaAPPLIED MATERIALS INC·Filed 2020·Granted May 9, 2023·0 cites·15 claims
- 2655US11171047B2Fluorine-doped nitride films for improved high-k reliabilityAPPLIED MATERIALS INC·Filed 2020·Granted Nov 9, 2021·0 cites·18 claims
- 2755US10755947B2Methods of increasing selectivity for selective etch processesAPPLIED MATERIALS INC·Filed 2019·Granted Aug 25, 2020·0 cites·20 claims
- 2852US10991586B2In-situ tungsten deposition without barrier layerAPPLIED MATERIALS INC·Filed 2020·Granted Apr 27, 2021·0 cites·20 claims
- 2952US10636705B1High pressure annealing of metal gate structuresAPPLIED MATERIALS INC·Filed 2018·Granted Apr 28, 2020·0 cites·20 claims
- 3051US11018009B2Tuning work function of p-metal work function films through vapor depositionAPPLIED MATERIALS INC·Filed 2019·Granted May 25, 2021·0 cites·17 claims
- 3150US10879081B2Methods of reducing or eliminating defects in tungsten filmAPPLIED MATERIALS INC·Filed 2018·Granted Dec 29, 2020·0 cites·20 claims
- 3250US10665450B2Methods and apparatus for doping engineering and threshold voltage tuning by integrated deposition of titanium nitride and aluminum filmsAPPLIED MATERIALS INC·Filed 2018·Granted May 26, 2020·0 cites·20 claims
- 3349US10347488B2Titanium compound based hard mask filmsAPPLIED MATERIALS INC·Filed 2016·Granted Jul 9, 2019·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →