Inventor · disambiguated record
Wilhelmus Henricus Theodorus Maria Aangenent
Also filed as: AANGENENT WILHELMUS HENRICUS THEODORUS MARIA
14 granted patents·12 citations·filing 2011–2019
86Inventor score
Files withASML NETHERLANDS BV11AANGENENT WILHELMUS HENRICUS THEODORUS MARIA1HOL SVEN ANTOIN JOHAN1VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS1
Top patents by PatentIndex Score
14 records- 0177US9927721B2Object positioning system, control system, lithographic apparatus, object positioning method and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Mar 27, 2018·2 cites·20 claims
- 0276US10401743B2Control system, positioning system, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Sep 3, 2019·2 cites·20 claims
- 0372US9081307B2Variable reluctance device, stage apparatus, lithographic apparatus and device manufacturing methodHOL SVEN ANTOIN JOHAN·Filed 2011·Granted Jul 14, 2015·3 cites·13 claims
- 0470US9141004B2Lithographic apparatus and methodVERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS·Filed 2012·Granted Sep 22, 2015·2 cites·20 claims
- 0568US10481498B2Droplet generator for lithographic apparatus, EUV source and lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Nov 19, 2019·1 cites·21 claims
- 0663US9715182B2Lithographic apparatus, substrate support system, device manufacturing method and control programASML NETHERLANDS BV·Filed 2013·Granted Jul 25, 2017·1 cites·21 claims
- 0762US10904994B2Supply system for an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2019·Granted Jan 26, 2021·0 cites·28 claims
- 0860US9494869B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2012·Granted Nov 15, 2016·1 cites·20 claims
- 0958US10499485B2Supply system for an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2018·Granted Dec 3, 2019·0 cites·25 claims
- 1045US9383659B2Positioning system, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Jul 5, 2016·0 cites·14 claims
- 1141US10095123B2Control system, positioning system, lithographic apparatus, control method, device manufacturing method and control programASML NETHERLANDS BV·Filed 2015·Granted Oct 9, 2018·0 cites·19 claims
- 1240US10750604B2Droplet generator for lithographic apparatus, EUV source and lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Aug 18, 2020·0 cites·17 claims
- 1335US9897926B2Stage positioning system and lithographic apparatusASML NETHERLANDS BV·Filed 2015·Granted Feb 20, 2018·0 cites·20 claims
- 1433US9507277B2Lithographic apparatus and device manufacturing methodAANGENENT WILHELMUS HENRICUS THEODORUS MARIA·Filed 2011·Granted Nov 29, 2016·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →