Inventor · disambiguated record
William D. Budinger
Also filed as: BUDINGER WILLIAM D
30 granted patents·3 pending applications·2,581 citations·filing 1976–2005
98Inventor score
Top patents by PatentIndex Score
33 records- 0198US5578362APolymeric polishing pad containing hollow polymeric microelementsRODEL INC·Filed 1994·Granted Nov 26, 1996·433 cites·21 claims
- 0298US4927432APad material for grinding, lapping and polishingRODEL INC·Filed 1986·Granted May 22, 1990·231 cites·19 claims
- 0398US4512113AWorkpiece holder for polishing operationBUDINGER WILLIAM D·Filed 1982·Granted Apr 23, 1985·623 cites·7 claims
- 0497US5900164AMethod for planarizing a semiconductor device surface with polymeric pad containing hollow polymeric microelementsRODEL INC·Filed 1997·Granted May 4, 1999·141 cites·17 claims
- 0594US6488570B1Method relating to a polishing system having a multi-phase polishing layerRODEL INC·Filed 2000·Granted Dec 3, 2002·68 cites·8 claims
- 0693US6899611B2Polishing pad for a semiconductor device having a dissolvable substanceROHM & HAAS ELECT MAT·Filed 2002·Granted May 31, 2005·32 cites·8 claims
- 0793US6210254B1Method of manufacturing a polymeric polishing pad having photolithographically induced surface pattern(s)RODEL INC·Filed 2000·Granted Apr 3, 2001·45 cites·1 claims
- 0892US6069080AFixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the likeRODEL INC·Filed 1998·Granted May 30, 2000·126 cites·37 claims
- 0991US6860793B2Window portion with an adjusted rate of wearROHM & HAAS ELECT MAT·Filed 2001·Granted Mar 1, 2005·43 cites·13 claims
- 1091US6517417B2Polishing pad with a transparent portionRODEL INC·Filed 2001·Granted Feb 11, 2003·38 cites·34 claims
- 1191US6022264APolishing pad and methods relating theretoRODEL INC·Filed 1998·Granted Feb 8, 2000·99 cites·18 claims
- 1290US6337281B1Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the likeRODEL INC·Filed 2000·Granted Jan 8, 2002·44 cites·31 claims
- 1390US6036579APolymeric polishing pad having photolithographically induced surface patterns(s) and methods relating theretoRODEL INC·Filed 1998·Granted Mar 14, 2000·82 cites·15 claims
- 1489US6099394APolishing system having a multi-phase polishing substrate and methods relating theretoRODEL INC·Filed 1998·Granted Aug 8, 2000·82 cites·13 claims
- 1588US4876903AMethod and apparatus for determination and display of critical gas supply informationBUDINGER WILLIAM D·Filed 1988·Granted Oct 31, 1989·50 cites·2 claims
- 1687US5932486AApparatus and methods for recirculating chemical-mechanical polishing of semiconductor wafersRODEL INC·Filed 1997·Granted Aug 3, 1999·83 cites·8 claims
- 1786US4198739APrinting roller with polymeric coner and method of making the sameRODEL INC·Filed 1976·Granted Apr 22, 1980·60 cites·14 claims
- 1885US6439989B1Polymeric polishing pad having continuously regenerated work surfaceRODEL INC·Filed 1999·Granted Aug 27, 2002·39 cites·14 claims
- 1985US6375559B1Polishing system having a multi-phase polishing substrate and methods relating theretoRODEL INC·Filed 1999·Granted Apr 23, 2002·61 cites·14 claims
- 2079US6375694B1Polishing slurry compositions capable of providing multi-modal particle packingRODEL INC·Filed 2000·Granted Apr 23, 2002·19 cites·22 claims
- 2178US5384337APoromeric material having uniformly distributed electrets for maintaining an electrostatic chargeFiled 1993·Granted Jan 24, 1995·36 cites·13 claims
- 2277US6093649APolishing slurry compositions capable of providing multi-modal particle packing and methods relating theretoRODEL INC·Filed 1998·Granted Jul 25, 2000·43 cites·23 claims
- 2376US6210525B1Apparatus and methods for chemical-mechanical polishing of semiconductor wafersRODEL INC·Filed 2000·Granted Apr 3, 2001·14 cites·10 claims
- 2470US6245679B1Apparatus and methods for chemical-mechanical polishing of semiconductor wafersRODEL INC·Filed 2000·Granted Jun 12, 2001·13 cites·28 claims
- 2565US6903021B2Method of polishing a semiconductor deviceROHM & HAAS ELECT MAT·Filed 2004·Granted Jun 7, 2005·6 cites·10 claims
- 2665US6030899AApparatus and methods for recirculating chemical-mechanical polishing of semiconductor wafersRODEL INC·Filed 1999·Granted Feb 29, 2000·21 cites·32 claims
- 2757US5016483AMethod and apparatus for determination and display of critical gas supply informationBUDINGER WILLIAM D·Filed 1990·Granted May 21, 1991·22 cites·2 claims
- 2855US6518188B2Apparatus and methods for chemical-mechanical polishing of semiconductor wafersRODEL INC·Filed 2002·Granted Feb 11, 2003·3 cites·26 claims
- 2952US2005221741A1Polymeric polishing pad having continuously regenerated work surfaceREINHARDT HEINZ F·Filed 2005·Application pending·0 cites
- 3042US4926703AMethod and apparatus for determination and display of critical gas supply informationBUDINGER WILLIAM D·Filed 1989·Granted May 22, 1990·8 cites·3 claims
- 3140US2002020495A1Apparatus and methods for chemical-mechanical polishing of semiconductor wafersFiled 2001·Application pending·0 cites
- 3239US2001032111A1System for ordering and manufacturing a tangible deviceFiled 2000·Application pending·0 cites
- 3334US4970897AMethod and apparatus for determination and display of gas consumption timeBUDINGER WILLIAM D·Filed 1989·Granted Nov 20, 1990·16 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →