Inventor · disambiguated record
Willard E. Conley
Also filed as: CONLEY JR WILLARD E · CONLEY JR WILLARD EARL · CONLEY WILLARD E · CONLEY WILLARD EARL
28 granted patents·9 pending applications·424 citations·filing 1987–2024
96Inventor score
Top patents by PatentIndex Score
37 records- 0196US9989866B2Wafer-based light source parameter controlCymer LLC·Filed 2016·Granted Jun 5, 2018·18 cites·50 claims
- 0293US9835959B1Controlling for wafer stage vibrationCymer LLC·Filed 2016·Granted Dec 5, 2017·7 cites·22 claims
- 0388US4939070AThermally stable photoresists with high sensitivityBRUNSVOLD WILLIAM R·Filed 1988·Granted Jul 3, 1990·86 cites·15 claims
- 0486US9997888B2Control of a spectral feature of a pulsed light beamCymer LLC·Filed 2016·Granted Jun 12, 2018·5 cites·21 claims
- 0585US9229051B2Integrated circuit with degradation monitoringFREESCALE SEMICONDUCTOR INC·Filed 2012·Granted Jan 5, 2016·6 cites·20 claims
- 0684US5322765ADry developable photoresist compositions and method for use thereofIBM·Filed 1991·Granted Jun 21, 1994·47 cites·23 claims
- 0783US5296332ACrosslinkable aqueous developable photoresist compositions and method for use thereofIBM·Filed 1991·Granted Mar 22, 1994·49 cites·24 claims
- 0882US10416566B2Optimization of source and bandwidth for new and existing patterning devicesCymer LLC·Filed 2016·Granted Sep 17, 2019·3 cites·20 claims
- 0982US2024310736A1Forming multiple aerial images in a single lithography exposure passCymer LLC·Filed 2024·Application pending·0 cites
- 1079US12001144B2Forming multiple aerial images in a single lithography exposure passCymer LLC·Filed 2022·Granted Jun 4, 2024·0 cites·21 claims
- 1179US4931379AHigh sensitivity resists having autodecomposition temperatures greater than about 160° C.IBM·Filed 1988·Granted Jun 5, 1990·30 cites·11 claims
- 1278US7741221B2Method of forming a semiconductor device having dummy featuresFREESCALE SEMICONDUCTOR INC·Filed 2005·Granted Jun 22, 2010·6 cites·19 claims
- 1378US5240812ATop coat for acid catalyzed resistsIBM·Filed 1991·Granted Aug 31, 1993·35 cites·8 claims
- 1476US5023164AHighly sensitive dry developable deep UV photoresistIBM·Filed 1989·Granted Jun 11, 1991·26 cites·14 claims
- 1574US7883829B2Lithography for pitch reductionIBM·Filed 2008·Granted Feb 8, 2011·4 cites·25 claims
- 1673US6300035B1Chemically amplified positive photoresistsSHIPLEY CO LLC·Filed 1998·Granted Oct 9, 2001·28 cites·20 claims
- 1763US11526082B2Forming multiple aerial images in a single lithography exposure passCymer LLC·Filed 2018·Granted Dec 13, 2022·0 cites·27 claims
- 1863US2025217705A1Method for radiation spectrum aware source mask optimization for lithographyASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1961US11747739B2Method and apparatus for imaging using narrowed bandwidthASML NETHERLANDS BV·Filed 2020·Granted Sep 5, 2023·0 cites·20 claims
- 2061US6207353B1Resist formulation which minimizes blistering during etchingIBM·Filed 1997·Granted Mar 27, 2001·28 cites·20 claims
- 2157US2024045341A1Optimization of lithographic process based on bandwidth and speckleASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 2255US10268123B2Wafer-based light source parameter controlCymer LLC·Filed 2018·Granted Apr 23, 2019·0 cites·20 claims
- 2354US2023010700A1Method and system for enhancing target features of a pattern imaged onto a substrateCymer LLC·Filed 2020·Application pending·0 cites
- 2453US5663036AMicrolithographic structure with an underlayer film comprising a thermolyzed azideIBM·Filed 1994·Granted Sep 2, 1997·11 cites·5 claims
- 2552US5783361AMicrolithographic structure with an underlayer film containing a thermolyzed azide compoundIBM·Filed 1997·Granted Jul 21, 1998·10 cites·11 claims
- 2651US5795701AMaking of microlithographic structures with an underlayer film containing a thermolyzed azide compoundIBM·Filed 1996·Granted Aug 18, 1998·12 cites·9 claims
- 2747US8507187B2Multi-exposure lithography employing a single anti-reflective coating layerBASKER VEERARAGHAVAN S·Filed 2008·Granted Aug 13, 2013·0 cites·16 claims
- 2846US2021349404A1Method to create the ideal source spectra with source and mask optimizationASML NETHERLANDS BV·Filed 2019·Application pending·0 cites
- 2941US4828964APolyimide formulation for forming a patterned film on a substrateIBM·Filed 1987·Granted May 9, 1989·7 cites·24 claims
- 3040US2009325106A1Method for Implant Imaging with Spin-on Hard MasksCONLEY WILLARD E·Filed 2008·Application pending·0 cites
- 3140US2010099255A1Method of forming a contact through an insulating layerCONLEY WILLARD E·Filed 2008·Application pending·0 cites
- 3238US8119334B2Method of making a semiconductor device using negative photoresistCONLEY WILLARD E·Filed 2008·Granted Feb 21, 2012·0 cites·19 claims
- 3338US2005026084A1Semiconductor device and method for elimination of resist linewidth slimming by fluorinationFiled 2003·Application pending·0 cites
- 3436US5567569AProcess for producing a positive pattern utilizing naphtho quinone diazide compound having non-metallic atom directly bonded to the naphthalene ringIBM·Filed 1996·Granted Oct 22, 1996·4 cites·19 claims
- 3535US2004248016A1Method of designing a reticle and forming a semiconductor device therewithFiled 2003·Application pending·0 cites
- 3632US5552256APositive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ringIBM·Filed 1994·Granted Sep 3, 1996·2 cites·8 claims
- 3730US5644038AQuinone diazo compound containing non-metallic atomIBM·Filed 1996·Granted Jul 1, 1997·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →