Inventor · disambiguated record
Wilhelmus Petrus De Boeij
Also filed as: DE BOEIJ WILHELMUS PETRUS
19 granted patents·4 pending applications·327 citations·filing 2002–2017
93Inventor score
Files withASML NETHERLANDS BV17BANINE VADIM YEVGENYEVICH2DE BOEIJ WILHELMUS PETRUS1LOOPSTRA ERIK ROELOF1VAN DAM MARINUS JOHANNES MARIA1
Top patents by PatentIndex Score
23 records- 0196US7345740B2Polarized radiation in lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Mar 18, 2008·65 cites·25 claims
- 0295US9989864B2Lithographic method and apparatusASML NETHERLANDS BV·Filed 2015·Granted Jun 5, 2018·8 cites·20 claims
- 0395US7245355B2Lithographic apparatus, device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Jul 17, 2007·35 cites·24 claims
- 0495US6650399B2Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrationsASML NETHERLANDS BV·Filed 2002·Granted Nov 18, 2003·172 cites·15 claims
- 0594US7375799B2Lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted May 20, 2008·24 cites·15 claims
- 0685US7317512B2Different polarization in cross-section of a radiation beam in a lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Jan 8, 2008·8 cites·24 claims
- 0772US7535644B2Lens element, lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2005·Granted May 19, 2009·3 cites·20 claims
- 0869US9164401B2Projection system and lithographic apparatusLOOPSTRA ERIK ROELOF·Filed 2009·Granted Oct 20, 2015·2 cites·23 claims
- 0964US8351022B2Radiation beam modification apparatus and methodASML NETHERLANDS BV·Filed 2010·Granted Jan 8, 2013·1 cites·19 claims
- 1058US7312852B2Polarized radiation in lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Dec 25, 2007·5 cites·29 claims
- 1157US9170498B2Lithographic apparatus and a method for determining a polarization property of a projection system using an adjustable polarizer and interferometric sensorASML NETHERLANDS BV·Filed 2013·Granted Oct 27, 2015·0 cites·12 claims
- 1255US10001709B2Lithographic apparatus, spectral purity filter and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Jun 19, 2018·0 cites·18 claims
- 1355US7929116B2Polarized radiation in lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2008·Granted Apr 19, 2011·0 cites·24 claims
- 1453US9097982B2Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for radiation system and method for forming a spectral purity filterBANINE VADIM YEVGENYEVICH·Filed 2009·Granted Aug 4, 2015·0 cites·20 claims
- 1548US6906787B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Jun 14, 2005·4 cites·24 claims
- 1647US9594306B2Lithographic apparatus, spectral purity filter and device manufacturing methodBANINE VADIM YEVGENYEVICH·Filed 2011·Granted Mar 14, 2017·0 cites·17 claims
- 1746US7889316B2Method for patterning a radiation beam, patterning device for patterning a radiation beamASML NETHERLANDS BV·Filed 2006·Granted Feb 15, 2011·0 cites·19 claims
- 1842US8675176B2Parameter control in a lithographic apparatus using polarizationVAN DAM MARINUS JOHANNES MARIA·Filed 2006·Granted Mar 18, 2014·0 cites·21 claims
- 1939US2010118288A1Lithographic projection system and projection lens polarization sensorVAN DE KERKHOF MARCUS ADRIANUS·Filed 2006·Application pending·0 cites
- 2039US2010182582A1Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography toolASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 2139US2010045956A1Lithographic Apparatus, Method for Determining at Least One Polarization Property Thereof, Polarization Analyzer and Polarization Sensor ThereofASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 2238US2012262690A1Illumination system, lithographic apparatus and illumination methodDE BOEIJ WILHELMUS PETRUS·Filed 2010·Application pending·0 cites
- 2330US10088756B2Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2015·Granted Oct 2, 2018·0 cites·23 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →