Inventor · disambiguated record
William F. Divergilio
Also filed as: DIVERGILIO WILLIAM · DIVERGILIO WILLIAM F
33 granted patents·7 pending applications·490 citations·filing 1998–2014
97Inventor score
Files withAXCELIS TECH INC26DIVERGILIO WILLIAM F3LEE WILLIAM D2ADVANCED ION BEAM TECH INC1AXCHLISRTECHNOLOGIES INC1
Top patents by PatentIndex Score
40 records- 0195US8932430B2RF coupled plasma abatement system comprising an integrated power oscillatorSRIVASTAVA ASEEM K·Filed 2011·Granted Jan 13, 2015·22 cites·18 claims
- 0295US6305316B1Integrated power oscillator RF source of plasma immersion ion implantation systemAXCELIS TECH INC·Filed 2000·Granted Oct 23, 2001·67 cites·19 claims
- 0391US6759665B2Method and system for ion beam containment in an ion beam guideAXCELIS TECH INC·Filed 2001·Granted Jul 6, 2004·34 cites·16 claims
- 0491US6414329B1Method and system for microwave excitation of plasma in an ion beam guideAXCELIS TECH INC·Filed 2000·Granted Jul 2, 2002·32 cites·25 claims
- 0589US7589333B2Methods for rapidly switching off an ion beamAXCELIS TECH INC·Filed 2006·Granted Sep 15, 2009·12 cites·19 claims
- 0689US6635890B2Slit double gap buncher and method for improved ion bunching in an ion implantation systemAXCELIS TECH INC·Filed 2002·Granted Oct 21, 2003·31 cites·16 claims
- 0787US7531819B2Fluorine based cleaning of an ion sourceAXCELIS TECH INC·Filed 2006·Granted May 12, 2009·18 cites·26 claims
- 0885US6541781B1Waveguide for microwave excitation of plasma in an ion beam guideAXCELIS TECH INC·Filed 2000·Granted Apr 1, 2003·22 cites·25 claims
- 0984US7800083B2Plasma electron flood for ion beam implanterAXCELIS TECH INC·Filed 2007·Granted Sep 21, 2010·7 cites·12 claims
- 1081US7845310B2Wide area radio frequency plasma apparatus for processing multiple substratesAXCELIS TECH INC·Filed 2006·Granted Dec 7, 2010·11 cites·11 claims
- 1180US8193513B2Hybrid ion source/multimode ion sourceDIVERGILIO WILLIAM F·Filed 2008·Granted Jun 5, 2012·8 cites·10 claims
- 1280US6664548B2Ion source and coaxial inductive coupler for ion implantation systemAXCELIS TECH INC·Filed 2002·Granted Dec 16, 2003·15 cites·23 claims
- 1379US6208095B1Compact helical resonator coil for ion implanter linear acceleratorAXCELIS TECH INC·Filed 1998·Granted Mar 27, 2001·37 cites·13 claims
- 1478US6949895B2Unipolar electrostatic quadrupole lens and switching methods for charged beam transportAXCELIS TECH INC·Filed 2003·Granted Sep 27, 2005·24 cites·16 claims
- 1577US8237135B2Enhanced low energy ion beam transport in ion implantationVANDERBERG BO H·Filed 2009·Granted Aug 7, 2012·4 cites·19 claims
- 1677US7453074B2Ion implanter with ionization chamber electrode designAXCELIS TECH INC·Filed 2005·Granted Nov 18, 2008·4 cites·26 claims
- 1777US7078707B1Ion beam scanning control methods and systems for ion implantation uniformityAXCELIS TECH INC·Filed 2005·Granted Jul 18, 2006·5 cites·20 claims
- 1876US8089052B2Ion source with adjustable apertureTIEGER DANIEL·Filed 2009·Granted Jan 3, 2012·6 cites·20 claims
- 1974US6879109B2Thin magnetron structures for plasma generation in ion implantation systemsAXCELIS TECH INC·Filed 2003·Granted Apr 12, 2005·10 cites·47 claims
- 2074US6653643B2Method and apparatus for improved ion acceleration in an ion implantation systemAXCELIS TECH INC·Filed 2001·Granted Nov 25, 2003·17 cites·29 claims
- 2173US8760054B2Microwave plasma electron floodDIVERGILIO WILLIAM·Filed 2011·Granted Jun 24, 2014·4 cites·12 claims
- 2272US6137112ATime of flight energy measurement apparatus for an ion beam implanterEATON CORP·Filed 1998·Granted Oct 24, 2000·44 cites·24 claims
- 2370US7947966B2Double plasma ion sourceAXCELIS TECH INC·Filed 2008·Granted May 24, 2011·2 cites·16 claims
- 2469US9653253B2Plasma-based material modification using a plasma source with magnetic confinementADVANCED ION BEAM TECH INC·Filed 2014·Granted May 16, 2017·2 cites·32 claims
- 2568US6947274B2Clamping and de-clamping semiconductor wafers on an electrostatic chuck using wafer inertial confinement by applying a single-phase square wave AC clamping voltageAXCELIS TECH INC·Filed 2003·Granted Sep 20, 2005·11 cites·20 claims
- 2664US9842752B2Optical heat source with restricted wavelengths for process heatingBERNHARDT DAVID·Filed 2013·Granted Dec 12, 2017·2 cites·12 claims
- 2764US7748344B2Segmented resonant antenna for radio frequency inductively coupled plasmasAXCELIS TECH INC·Filed 2003·Granted Jul 6, 2010·4 cites·12 claims
- 2861US2011108058A1Method and apparatus for cleaning residue from an ion source componentAXCELIS TECH INC·Filed 2009·Application pending·0 cites
- 2960US6583429B2Method and apparatus for improved ion bunching in an ion implantation systemAXCELIS TECH INC·Filed 2002·Granted Jun 24, 2003·12 cites·41 claims
- 3056US7750314B2Elevated temperature RF ion sourceAXCELIS TECH INC·Filed 2008·Granted Jul 6, 2010·0 cites·22 claims
- 3156US6653803B1Integrated resonator and amplifier systemAXCELIS TECH INC·Filed 2000·Granted Nov 25, 2003·10 cites·16 claims
- 3255US8803110B2Methods for beam current modulation by ion source parameter modulationGRAF MICHAEL A·Filed 2006·Granted Aug 12, 2014·1 cites·13 claims
- 3355US2013305989A1Method and apparatus for cleaning residue from an ion source componentAXCELIS TECH INC·Filed 2013·Application pending·0 cites
- 3452US6291828B1Glass-like insulator for electrically isolating electrodes from ion implanter housingAXCHLISRTECHNOLOGIES INC·Filed 1999·Granted Sep 18, 2001·12 cites·16 claims
- 3551US2007044717A1Segmented resonant antenna for radio frequency inductively coupled plasmasDIVERGILIO WILLIAM F·Filed 2006·Application pending·0 cites
- 3650US2016175804A1Laser-Induced Borane Production for Ion ImplantationAXCELIS TECH INC·Filed 2014·Application pending·0 cites
- 3747US2011036500A1Wide area radio frequency plasma apparatus for processing multiple substratesAXCELIS TECH INC·Filed 2010·Application pending·0 cites
- 3839US8692215B2Heated rotary seal and bearing for chilled ion implantation systemLEE WILLIAM D·Filed 2011·Granted Apr 8, 2014·0 cites·15 claims
- 3937US2011291022A1Post Implant Wafer Heating Using LightLEE WILLIAM D·Filed 2010·Application pending·0 cites
- 4034US2013305988A1Inline Capacitive Ignition of Inductively Coupled Plasma Ion SourceDIVERGILIO WILLIAM F·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →