Inventor · disambiguated record
Wolfgang Aderhold
Also filed as: ADERHOLD WOLFGANG · ADERHOLD WOLFGANG R · ADERHOLD WOLFGANG ROBERT
53 granted patents·29 pending applications·401 citations·filing 1991–2025
98Inventor score
Files withAPPLIED MATERIALS INC68ADERHOLD WOLFGANG6ADERHOLD WOLFGANG R2SORABJI KHURSHED2FRAUNHOFER GES FORSCHUNG1
Top patents by PatentIndex Score
82 records- 0195US9390950B2Rapid thermal processing chamber with micro-positioning systemAPPLIED MATERIALS INC·Filed 2014·Granted Jul 12, 2016·15 cites·20 claims
- 0294US8314371B2Rapid thermal processing chamber with micro-positioning systemSORABJI KHURSHED·Filed 2009·Granted Nov 20, 2012·18 cites·12 claims
- 0393US8900889B2Rapid thermal processing chamber with micro-positioning systemAPPLIED MATERIALS INC·Filed 2012·Granted Dec 2, 2014·10 cites·10 claims
- 0492US8111978B2Rapid thermal processing chamber with shower headSORABJI KHURSHED·Filed 2008·Granted Feb 7, 2012·21 cites·24 claims
- 0592US7414224B2Backside rapid thermal processing of patterned wafersAPPLIED MATERIALS INC·Filed 2006·Granted Aug 19, 2008·16 cites·10 claims
- 0691US10741457B2System for non radial temperature control for rotating substratesAPPLIED MATERIALS INC·Filed 2017·Granted Aug 11, 2020·4 cites·20 claims
- 0791US6215106B1Thermally processing a substrateAPPLIED MATERIALS INC·Filed 1999·Granted Apr 10, 2001·87 cites·23 claims
- 0890US11735447B2Enhanced process and hardware architecture to detect and correct realtime product substratesAPPLIED MATERIALS INC·Filed 2020·Granted Aug 22, 2023·2 cites·20 claims
- 0990US8249436B2System for non radial temperature control for rotating substratesADERHOLD WOLFGANG R·Filed 2009·Granted Aug 21, 2012·11 cites·19 claims
- 1090US7398693B2Adaptive control method for rapid thermal processing of a substrateAPPLIED MATERIALS INC·Filed 2006·Granted Jul 15, 2008·19 cites·33 claims
- 1189US8104951B2Temperature uniformity measurements during rapid thermal processingADERHOLD WOLFGANG·Filed 2007·Granted Jan 31, 2012·18 cites·19 claims
- 1288US8865602B2Edge ring lipAPPLIED MATERIALS INC·Filed 2012·Granted Oct 21, 2014·8 cites·14 claims
- 1388US8724977B2System for non radial temperature control for rotating substratesADERHOLD WOLFGANG R·Filed 2012·Granted May 13, 2014·6 cites·20 claims
- 1486US9245768B2Method of improving substrate uniformity during rapid thermal processingAPPLIED MATERIALS INC·Filed 2013·Granted Jan 26, 2016·7 cites·19 claims
- 1586US9018110B2Apparatus and methods for microwave processing of semiconductor substratesSTOWELL MICHAEL W·Filed 2012·Granted Apr 28, 2015·7 cites·18 claims
- 1686US7195934B2Method and system for deposition tuning in an epitaxial film growth apparatusAPPLIED MATERIALS INC·Filed 2005·Granted Mar 27, 2007·5 cites·23 claims
- 1785US2023402331A1System for non radial temperature control for rotating substratesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1884US12080573B2Temperature offset and zone control tuningAPPLIED MATERIALS INC·Filed 2020·Granted Sep 3, 2024·2 cites·19 claims
- 1984US9728471B2System for non radial temperature control for rotating substratesAPPLIED MATERIALS INC·Filed 2014·Granted Aug 8, 2017·3 cites·3 claims
- 2084US9564349B2Rapid thermal processing chamber with micro-positioning systemAPPLIED MATERIALS INC·Filed 2012·Granted Feb 7, 2017·4 cites·20 claims
- 2181US6803546B1Thermally processing a substrateAPPLIED MATERIALS INC·Filed 2000·Granted Oct 12, 2004·25 cites·33 claims
- 2280US12390843B2Rapid thermal processing (RTP) chamber outgassing removalAPPLIED MATERIALS INC·Filed 2023·Granted Aug 19, 2025·0 cites·12 claims
- 2380US12366481B2Reflector plate for substrate processingAPPLIED MATERIALS INC·Filed 2023·Granted Jul 22, 2025·0 cites·20 claims
- 2480US2025332624A1Rapid thermal processing (rtp) chamber outgassing removalAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2578US6164816ATuning a substrate temperature measurement systemAPPLIED MATERIALS INC·Filed 1998·Granted Dec 26, 2000·53 cites·25 claims
- 2677US10571337B2Thermal cooling member with low temperature controlAPPLIED MATERIALS INC·Filed 2017·Granted Feb 25, 2020·2 cites·12 claims
- 2777US8109669B2Temperature uniformity measurement during thermal processingADERHOLD WOLFGANG·Filed 2008·Granted Feb 7, 2012·8 cites·20 claims
- 2876US11915953B2Apparatus, systems, and methods of measuring edge ring distance for thermal processing chambersAPPLIED MATERIALS INC·Filed 2020·Granted Feb 27, 2024·1 cites·17 claims
- 2976US2025067511A1Rtp substrate temperature one for all control algorithmAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3076US2025068195A1Systems, methods, and apparatus for correcting thermal processing of substratesAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3175US11942381B2System for non radial temperature control for rotating substratesAPPLIED MATERIALS INC·Filed 2020·Granted Mar 26, 2024·0 cites·20 claims
- 3274US12278127B2Auto fine-tuner for desired temperature profileAPPLIED MATERIALS INC·Filed 2022·Granted Apr 15, 2025·0 cites·13 claims
- 3374US12261047B2Doping techniquesAPPLIED MATERIALS INC·Filed 2022·Granted Mar 25, 2025·0 cites·16 claims
- 3474US2024194508A1Automated substrate placement to chamber centerAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3573US9431278B2Backside rapid thermal processing of patterned wafersADERHOLD WOLFGANG·Filed 2008·Granted Aug 30, 2016·3 cites·15 claims
- 3673US5343293AEllipsometerFRAUNHOFER GES FORSCHUNG·Filed 1991·Granted Aug 30, 1994·33 cites·13 claims
- 3772US11942345B2Automated substrate placement to chamber centerAPPLIED MATERIALS INC·Filed 2022·Granted Mar 26, 2024·0 cites·20 claims
- 3871US12379253B2Emissivity independence tuningAPPLIED MATERIALS INC·Filed 2022·Granted Aug 5, 2025·0 cites·20 claims
- 3971US2025259881A1Susceptor for a silicon carbide substrateAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4071US2025105035A1Temperature offset and zone control tuningAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4170US2025210384A1Auto fine-tuner for desired temperature profileAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 4269US11664250B2Methods and apparatus for measuring edge ring temperatureAPPLIED MATERIALS INC·Filed 2022·Granted May 30, 2023·0 cites·20 claims
- 4368US2024066627A1Laser enhanced microwave annealAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4468US2024203766A1Apparatus, systems, and methods of measuring edge ring distance for thermal processing chambersAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4568US2025259880A1Susceptor for a silicon carbide substrateAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4667US11828656B2Reflector plate for substrate processingAPPLIED MATERIALS INC·Filed 2020·Granted Nov 28, 2023·0 cites·20 claims
- 4765US7667162B2Semiconductor thermal process control utilizing position oriented temperature generated thermal maskAPPLIED MATERIALS INC·Filed 2005·Granted Feb 23, 2010·2 cites·20 claims
- 4864US12085965B2Systems, methods, and apparatus for correcting thermal processing of substratesAPPLIED MATERIALS INC·Filed 2021·Granted Sep 10, 2024·0 cites·20 claims
- 4963US10948353B2Thermal processing chamber with low temperature controlAPPLIED MATERIALS INC·Filed 2020·Granted Mar 16, 2021·0 cites·20 claims
- 5063US9640412B2Apparatus and method for enhancing the cool down of radiatively heated substratesADERHOLD WOLFGANG·Filed 2009·Granted May 2, 2017·1 cites·12 claims
Showing the top 50 of 82 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Wolfgang Aderhold files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →