Inventor · disambiguated record
Wouter Onno Pril
Also filed as: PRIL WOUTER ONNO
11 granted patents·2 pending applications·326 citations·filing 2001–2024
90Inventor score
Top patents by PatentIndex Score
13 records- 0198US7348574B2Position measurement system and lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Mar 25, 2008·138 cites·22 claims
- 0295US7333174B2Lithographic apparatus and method for determining Z position errors/variations and substrate table flatnessASML NETHERLANDS BV·Filed 2005·Granted Feb 19, 2008·140 cites·25 claims
- 0380US6747729B2Lithographic projection apparatus, device manufacturing method, device manufactured thereby and gas compositionASML NETHERLANDS BV·Filed 2001·Granted Jun 8, 2004·20 cites·31 claims
- 0479US7599043B2Position measurement system and lithographic apparatusASML NETHERLANDS BV·Filed 2006·Granted Oct 6, 2009·4 cites·20 claims
- 0577US9177219B2Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productTEL WIM TJIBBO·Filed 2011·Granted Nov 3, 2015·9 cites·16 claims
- 0664US2025132122A1Assessment apparatus and methodsASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 0756US7310130B2Lithographic apparatus and position measuring methodASML NETHERLANDS BV·Filed 2004·Granted Dec 18, 2007·4 cites·25 claims
- 0855US7251042B2Lithographic apparatus, interferometer and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jul 31, 2007·4 cites·29 claims
- 0954US7535578B2Lithographic apparatus and interferometer systemASML NETHERLANDS BV·Filed 2004·Granted May 19, 2009·4 cites·25 claims
- 1052US11476077B2Interferometric stage positioning apparatusASML NETHERLANDS BV·Filed 2020·Granted Oct 18, 2022·0 cites·20 claims
- 1150US2023205101A1Apparatus for use in a metrology process or lithographic processASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 1245US6987557B2Enhanced lithographic displacement measurement systemASML NETHERLANDS BV·Filed 2003·Granted Jan 17, 2006·3 cites·20 claims
- 1331US10768025B2Encoder, position measurement system and lithographic apparatus involving an enclosing deviceASML NETHERLANDS BV·Filed 2015·Granted Sep 8, 2020·0 cites·21 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →