Inventor · disambiguated record
Wu-Song Huang
Also filed as: HUANG WU-SONG · HUANG WU-SONG S
109 granted patents·13 pending applications·2,130 citations·filing 1989–2015
99Inventor score
Top patents by PatentIndex Score
122 records- 0199US6420088B1Antireflective silicon-containing compositions as hardmask layerIBM·Filed 2000·Granted Jul 16, 2002·214 cites·8 claims
- 0299US5300208AFabrication of printed circuit boards using conducting polymerIBM·Filed 1989·Granted Apr 5, 1994·108 cites·30 claims
- 0398US8227307B2Method for removing threshold voltage adjusting layer with external acid diffusion processCHEN KUANG-JUNG·Filed 2009·Granted Jul 24, 2012·101 cites·20 claims
- 0498US6503692B2Antireflective silicon-containing compositions as hardmask layerIBM·Filed 2002·Granted Jan 7, 2003·85 cites·9 claims
- 0596US7862982B2Chemical trim of photoresist lines by means of a tuned overcoat materialIBM·Filed 2008·Granted Jan 4, 2011·21 cites·14 claims
- 0696US6730454B2Antireflective SiO-containing compositions for hardmask layerIBM·Filed 2002·Granted May 4, 2004·112 cites·11 claims
- 0796US5198153AElectrically conductive polymericIBM·Filed 1989·Granted Mar 30, 1993·232 cites·16 claims
- 0896US5062896ASolder/polymer composite paste and methodIBM·Filed 1990·Granted Nov 5, 1991·96 cites·16 claims
- 0995US8759220B1Patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Jun 24, 2014·13 cites·46 claims
- 1095US6420084B1Mask-making using resist having SIO bond-containing polymerIBM·Filed 2000·Granted Jul 16, 2002·83 cites·28 claims
- 1195US6338934B1Hybrid resist based on photo acid/photo base blendingIBM·Filed 1999·Granted Jan 15, 2002·126 cites·29 claims
- 1294US9337033B1Dielectric tone inversion materialsIBM·Filed 2015·Granted May 10, 2016·9 cites·15 claims
- 1393US7838200B2Photoresist compositions and method for multiple exposures with multiple layer resist systemsIBM·Filed 2009·Granted Nov 23, 2010·17 cites·23 claims
- 1492US8999625B2Silicon-containing antireflective coatings including non-polymeric silsesquioxanesIBM·Filed 2013·Granted Apr 7, 2015·8 cites·17 claims
- 1592US7838198B2Photoresist compositions and method for multiple exposures with multiple layer resist systemsIBM·Filed 2007·Granted Nov 23, 2010·14 cites·31 claims
- 1692US7709370B2Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structuresIBM·Filed 2007·Granted May 4, 2010·22 cites·13 claims
- 1791US7320855B2Silicon containing TARC/barrier layerIBM·Filed 2004·Granted Jan 22, 2008·37 cites·13 claims
- 1890US8137893B2Chemical trim of photoresist lines by means of a tuned overcoatBURNS SEAN DAVID·Filed 2011·Granted Mar 20, 2012·9 cites·14 claims
- 1990US5712078AHigh contrast photoresists comprising acid sensitive crosslinked polymeric resinsIBM·Filed 1995·Granted Jan 27, 1998·79 cites·8 claims
- 2089US8546062B2Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using sameHUANG WU-SONG·Filed 2011·Granted Oct 1, 2013·7 cites·16 claims
- 2189US8236476B2Multiple exposure photolithography methods and photoresist compositionsCHEN KUANG-JUNG·Filed 2008·Granted Aug 7, 2012·7 cites·4 claims
- 2288US7141692B2Molecular photoresists containing nonpolymeric silsesquioxanesIBM·Filed 2003·Granted Nov 28, 2006·19 cites·69 claims
- 2388US6939664B2Low-activation energy silicon-containing resist systemIBM·Filed 2003·Granted Sep 6, 2005·30 cites·20 claims
- 2487US9281212B1Dielectric tone inversion materialsIBM·Filed 2014·Granted Mar 8, 2016·6 cites·15 claims
- 2587US8293451B2Near-infrared absorbing film compositionsGLODDE MARTIN·Filed 2009·Granted Oct 23, 2012·8 cites·17 claims
- 2685US8999624B2Developable bottom antireflective coating composition and pattern forming method using thereofCHEN KUANG-JUNG·Filed 2012·Granted Apr 7, 2015·5 cites·13 claims
- 2785US8715907B2Developable bottom antireflective coating compositions for negative resistsCHEN KUANG-JUNG·Filed 2011·Granted May 6, 2014·4 cites·22 claims
- 2885US7300741B2Advanced chemically amplified resist for sub 30 nm dense feature resolutionIBM·Filed 2006·Granted Nov 27, 2007·7 cites·19 claims
- 2985US6203965B1Photoresist comprising blends of photoacid generatorsSHIPLEY CO LLC·Filed 2000·Granted Mar 20, 2001·19 cites·4 claims
- 3085US5609989AAcid scavengers for use in chemically amplified photoresistsIBM·Filed 1995·Granted Mar 11, 1997·47 cites·11 claims
- 3184US8986918B2Hybrid photoresist composition and pattern forming method using thereofIBM·Filed 2013·Granted Mar 24, 2015·3 cites·20 claims
- 3284US7709187B2High resolution imaging process using an in-situ image modifying layerIBM·Filed 2006·Granted May 4, 2010·8 cites·23 claims
- 3384US7560222B2Si-containing polymers for nano-pattern device fabricationIBM·Filed 2006·Granted Jul 14, 2009·7 cites·1 claims
- 3484US6043003AE-beam application to mask making using new improved KRS resist systemIBM·Filed 1999·Granted Mar 28, 2000·45 cites·19 claims
- 3582US7803521B2Photoresist compositions and process for multiple exposures with multiple layer photoresist systemsIBM·Filed 2007·Granted Sep 28, 2010·5 cites·27 claims
- 3681US8568960B2Multiple exposure photolithography methodsCHEN KUANG-JUNG·Filed 2012·Granted Oct 29, 2013·2 cites·20 claims
- 3780US8846295B2Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereofCHEN KUANG-JUNG·Filed 2012·Granted Sep 30, 2014·2 cites·18 claims
- 3880US8097401B2Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using sameHUANG WU-SONG·Filed 2009·Granted Jan 17, 2012·4 cites·14 claims
- 3980US6653045B2Radiation sensitive silicon-containing negative resists and use thereofIBM·Filed 2001·Granted Nov 25, 2003·15 cites·16 claims
- 4079US9465290B2Near-infrared absorbing film compositionsGLOBALFOUNDRIES INC·Filed 2014·Granted Oct 11, 2016·2 cites·8 claims
- 4179US8182978B2Developable bottom antireflective coating compositions especially suitable for ion implant applicationsHUANG WU-SONG·Filed 2009·Granted May 22, 2012·4 cites·21 claims
- 4279US6037097AE-beam application to mask making using new improved KRS resist systemIBM·Filed 1998·Granted Mar 14, 2000·50 cites·35 claims
- 4377US7807332B2Underlayer compositions containing heterocyclic aromatic structuresIBM·Filed 2008·Granted Oct 5, 2010·3 cites·5 claims
- 4476US6543617B2Packaged radiation sensitive coated workpiece process for making and method of storing sameIBM·Filed 2001·Granted Apr 8, 2003·16 cites·49 claims
- 4575US8772376B2Near-infrared absorbing film compositionsHUANG WU-SONG·Filed 2009·Granted Jul 8, 2014·3 cites·13 claims
- 4675US7090963B2Process for forming features of 50 nm or less half-pitch with chemically amplified resist imagingIBM·Filed 2003·Granted Aug 15, 2006·16 cites·15 claims
- 4774US9040225B2Developable bottom antireflective coating composition and pattern forming method using thereofIBM·Filed 2014·Granted May 26, 2015·2 cites·12 claims
- 4874US8846296B2Photoresist compositionsCHEN KUANG-JUNG·Filed 2012·Granted Sep 30, 2014·1 cites·15 claims
- 4974US7944055B2Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structuresIBM·Filed 2010·Granted May 17, 2011·3 cites·11 claims
- 5073US7544750B2Top antireflective coating composition with low refractive index at 193nm radiation wavelengthIBM·Filed 2005·Granted Jun 9, 2009·3 cites·20 claims
Showing the top 50 of 122 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →