Inventor · disambiguated record
Xiaopu Li
Also filed as: LI XIAOPU
8 granted patents·6 pending applications·2 citations·filing 2019–2025
74Inventor score
Files withAPPLIED MATERIALS INC14
Top patents by PatentIndex Score
14 records- 0179US11823871B2Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing toolAPPLIED MATERIALS INC·Filed 2019·Granted Nov 21, 2023·2 cites·20 claims
- 0278US12228534B2Capacitive sensor for monitoring gas concentrationAPPLIED MATERIALS INC·Filed 2024·Granted Feb 18, 2025·0 cites·19 claims
- 0377US2025346999A1Shaped showerhead for edge plasma modulationAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0475US2024393373A1Rf measurement from a transmission line sensorAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0570US12061215B2RF measurement from a transmission line sensorAPPLIED MATERIALS INC·Filed 2022·Granted Aug 13, 2024·0 cites·15 claims
- 0667US12338530B2Shaped showerhead for edge plasma modulationAPPLIED MATERIALS INC·Filed 2021·Granted Jun 24, 2025·0 cites·16 claims
- 0766US11959868B2Capacitive sensor for monitoring gas concentrationAPPLIED MATERIALS INC·Filed 2021·Granted Apr 16, 2024·0 cites·9 claims
- 0860US12224156B2Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing toolAPPLIED MATERIALS INC·Filed 2021·Granted Feb 11, 2025·0 cites·20 claims
- 0955US2024249924A1Bipolar electrostatic chuck electrode designsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1052US11908662B2Device and method for tuning plasma distribution using phase controlAPPLIED MATERIALS INC·Filed 2019·Granted Feb 20, 2024·0 cites·14 claims
- 1151US2023107392A1Method and apparatus for generating plasma with ion blocker plateAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 1248US11581206B2Capacitive sensor for chamber condition monitoringAPPLIED MATERIALS INC·Filed 2020·Granted Feb 14, 2023·0 cites·13 claims
- 1348US2022333245A1Systems, methods, and apparatus for applying a bias voltage to an ion blocker plate during substrate processing operationsAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 1445US2022028710A1Distribution components for semiconductor processing systemsAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →