Inventor · disambiguated record
Xing Lin
Also filed as: LIN XING · LIN XING-CHUAN
30 granted patents·31 pending applications·517 citations·filing 2002–2025
96Inventor score
Top patents by PatentIndex Score
61 records- 0198US10950477B2Ceramic heater and esc with enhanced wafer edge performanceAPPLIED MATERIALS INC·Filed 2016·Granted Mar 16, 2021·280 cites·9 claims
- 0296US8633423B2Methods and apparatus for controlling substrate temperature in a process chamberLIN XING·Filed 2011·Granted Jan 21, 2014·131 cites·17 claims
- 0395US9123762B2Substrate support with symmetrical feed structureLIN XING·Filed 2010·Granted Sep 1, 2015·40 cites·19 claims
- 0494US10403535B2Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition systemAPPLIED MATERIALS INC·Filed 2015·Granted Sep 3, 2019·11 cites·17 claims
- 0593US11764101B2Susceptor for semiconductor substrate processingASM IP HOLDING BV·Filed 2020·Granted Sep 19, 2023·4 cites·45 claims
- 0692US9725806B2Multi-zone pedestal for plasma processingAPPLIED MATERIALS INC·Filed 2015·Granted Aug 8, 2017·7 cites·17 claims
- 0789US11053591B2Multi-port gas injection system and reactor system including sameASM IP HOLDING BV·Filed 2018·Granted Jul 6, 2021·4 cites·22 claims
- 0889US8982530B2Methods and apparatus toward preventing ESC bonding adhesive erosionAPPLIED MATERIALS INC·Filed 2012·Granted Mar 17, 2015·8 cites·11 claims
- 0985US10879041B2Method and apparatus of achieving high input impedance without using ferrite materials for RF filter applications in plasma chambersAPPLIED MATERIALS INC·Filed 2016·Granted Dec 29, 2020·4 cites·19 claims
- 1084USD1030687SSusceptorASM IP HOLDING BV·Filed 2022·Granted Jun 11, 2024·10 cites·1 claims
- 1179US12006572B2Reactor system including a gas distribution assembly for use with activated species and method of using sameASM IP HOLDING BV·Filed 2020·Granted Jun 11, 2024·1 cites·25 claims
- 1279US10692703B2Ceramic heater with enhanced RF power deliveryAPPLIED MATERIALS INC·Filed 2017·Granted Jun 23, 2020·2 cites·15 claims
- 1378US2025391681A1Wafer far edge temperature measurement system with lamp bank alignmentASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 1477USD1067204SSusceptorASM IP HOLDING BV·Filed 2022·Granted Mar 18, 2025·6 cites·1 claims
- 1575US10090187B2Multi-zone pedestal for plasma processingAPPLIED MATERIALS INC·Filed 2017·Granted Oct 2, 2018·1 cites·20 claims
- 1674US2025327180A1High temperature coatings for a preclean and etch apparatus and related methodsASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 1773US2025336712A1Susceptors with film deposition control featuresASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 1871US8492980B2Methods for calibrating RF power applied to a plurality of RF coils in a plasma processing systemBANNA SAMER·Filed 2011·Granted Jul 23, 2013·3 cites·20 claims
- 1969US12378665B2High temperature coatings for a preclean and etch apparatus and related methodsASM IP HOLDING BV·Filed 2018·Granted Aug 5, 2025·1 cites·21 claims
- 2068US9948214B2High temperature electrostatic chuck with real-time heat zone regulating capabilityAPPLIED MATERIALS INC·Filed 2013·Granted Apr 17, 2018·2 cites·21 claims
- 2168US2025285891A1Fixture and method for determining position of a target in a reaction chamberASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 2268US2023386889A1Susceptor for semiconductor substrate processingASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 2367US12417933B2Wafer far edge temperature measurement system with lamp bank alignmentASM IP HOLDING BV·Filed 2022·Granted Sep 16, 2025·0 cites·20 claims
- 2467US2024429038A1Semiconductor processing preclean methods and apparatusASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 2565US12394659B2Susceptors with film deposition control featuresASM IP HOLDING BV·Filed 2022·Granted Aug 19, 2025·0 cites·23 claims
- 2663US12354893B2Fixture and method for determining position of a target in a reaction chamberASM IP HOLDING BV·Filed 2021·Granted Jul 8, 2025·0 cites·11 claims
- 2763US10971389B2Multi-zone pedestal for plasma processingAPPLIED MATERIALS INC·Filed 2018·Granted Apr 6, 2021·0 cites·22 claims
- 2863US2022367175A1Apparatus and method for removal of oxide and carbon from semiconductor films in a single processing chamberASM IP HOLDING BV·Filed 2022·Application pending·0 cites
- 2962US10811301B2Dual-zone heater for plasma processingAPPLIED MATERIALS INC·Filed 2019·Granted Oct 20, 2020·0 cites·18 claims
- 3062US2024071804A1Method, assembly and system for gas injection and controlASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 3161US10770328B2Substrate support with symmetrical feed structureAPPLIED MATERIALS INC·Filed 2018·Granted Sep 8, 2020·0 cites·20 claims
- 3261US2021296144A1Substrate support pedestal having plasma confinement featuresAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 3360US2024376634A1Liquid precursor containers, liquid precursor systems and semiconductor processing systems having liquid precursor containers, and methods of depositing material layers using liquid precursorsASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 3460US2024175130A1High-throughput silicon carbide reactorASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 3559US2021111000A1Method and apparatus of achieving high input impedance without using ferrite materials for rf filter applications in plasmaAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 3657US12112938B2Semiconductor processing preclean methods and apparatusASM IP HOLDING BV·Filed 2022·Granted Oct 8, 2024·0 cites·11 claims
- 3756US2024425986A1Gas injection system for use in a processing chamberASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 3856US2025038039A1Lift pins, lift pin arrangements, semiconductor processing systems, and methods of making lift pin arrangements for semiconductor processing systemsASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 3955US2024112946A1Lift pin actuators for semiconductor processing systems and related methodsASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 4054US10497606B2Dual-zone heater for plasma processingAPPLIED MATERIALS INC·Filed 2016·Granted Dec 3, 2019·0 cites·10 claims
- 4154US10096494B2Substrate support with symmetrical feed structureAPPLIED MATERIALS INC·Filed 2015·Granted Oct 9, 2018·0 cites·20 claims
- 4254US2023386874A1Substrate supports, semiconductor processing systems, and material layer deposition methodsASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 4354US2025034714A1Reflectors, semiconductor processing systems having reflectors, and methods of depositing material layers in semiconductor processing systems using reflectorsASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 4454US2024112930A1Chamber arrangements with laser sources, semiconductor processing systems, and material layer deposition methodsASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 4553US2024376597A1Liquid precursor containers, liquid precursor systems and semiconductor processing systems having liquid precursor containers, and methods of depositing material layers using liquid precursorsASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 4651USD1031676SCombined susceptor, support, and lift systemASM IP HOLDING BV·Filed 2020·Granted Jun 18, 2024·2 cites·1 claims
- 4751US2024071805A1Method, assembly and system for gas injectionASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 4851US2023116427A1Systems and methods for purging reactor lower chambers with etchants during film depositionASM IP HOLDING BV·Filed 2022·Application pending·0 cites
- 4951US2024175138A1Systems and methods for controlling pressure in substrate processing systemsASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 5050US2023203706A1Epitaxial reactor systems and methods of using sameASM IP HOLDING BV·Filed 2022·Application pending·0 cites
Showing the top 50 of 61 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →