Inventor · disambiguated record
Xinghua Sun
Also filed as: SUN XINGHUA
18 granted patents·9 pending applications·20 citations·filing 2006–2025
89Inventor score
Files withTOKYO ELECTRON LTD13SUZHOU LUXSHARE TECH CO LTD9KUNSHAN LUXSHARE RF TECH CO LTD2APPLIED MATERIALS INC1GLOBE UNION IND CORP1
Top patents by PatentIndex Score
27 records- 0184US11515203B2Selective deposition of conductive cap for fully-aligned-via (FAV)TOKYO ELECTRON LTD·Filed 2020·Granted Nov 29, 2022·2 cites·20 claims
- 0282US11121027B2High aspect ratio via etch using atomic layer deposition protection layerTOKYO ELECTRON LTD·Filed 2018·Granted Sep 14, 2021·4 cites·19 claims
- 0377US11164781B2ALD (atomic layer deposition) liner for via profile control and related applicationsTOKYO ELECTRON LTD·Filed 2019·Granted Nov 2, 2021·2 cites·20 claims
- 0477US10304725B2Manufacturing methods to protect ULK materials from damage during etch processing to obtain desired featuresTOKYO ELECTRON LTD·Filed 2017·Granted May 28, 2019·2 cites·25 claims
- 0577US2025125512A1Cavity filterSUZHOU LUXSHARE TECH CO LTD·Filed 2024·Application pending·0 cites
- 0676US11031798B2Charger for electronic cigaretteSHENZHEN FIRST UNION TECH CO·Filed 2018·Granted Jun 8, 2021·2 cites·7 claims
- 0771US12212031B2Cavity filterSUZHOU LUXSHARE TECH CO LTD·Filed 2022·Granted Jan 28, 2025·0 cites·15 claims
- 0865US11742241B2ALD (atomic layer deposition) liner for via profile control and related applicationsTOKYO ELECTRON LTD·Filed 2021·Granted Aug 29, 2023·0 cites·19 claims
- 0964US12412969B2Coaxial filter and communication radio frequency deviceSUZHOU LUXSHARE TECH CO LTD·Filed 2023·Granted Sep 9, 2025·0 cites·17 claims
- 1064US11289325B2Radiation of substrates during processing and systems thereofTOKYO ELECTRON LTD·Filed 2021·Granted Mar 29, 2022·0 cites·16 claims
- 1164US2025385414A1Resonator and filterSUZHOU LUXSHARE TECH CO LTD·Filed 2025·Application pending·0 cites
- 1261US2022189764A1Radiation of Substrates During Processing and Systems ThereofTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1356US2025391708A1Substrate processing for improved wafer thickness uniformityAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1455US12451574B2Cavity filterSUZHOU LUXSHARE TECH CO LTD·Filed 2023·Granted Oct 21, 2025·0 cites·9 claims
- 1555US2025246789A1FilterSUZHOU LUXSHARE TECH CO LTD·Filed 2024·Application pending·0 cites
- 1653US2025146520A1Self-locking tuning assembly with self-locking tuning screwSUZHOU LUXSHARE TECH CO LTD·Filed 2024·Application pending·0 cites
- 1751US12451353B2Double hardmasks for self-aligned multi-patterning processesTOKYO ELECTRON LTD·Filed 2022·Granted Oct 21, 2025·0 cites·20 claims
- 1850US11127594B2Manufacturing methods for mandrel pull from spacers for multi-color patterningTOKYO ELECTRON LTD·Filed 2018·Granted Sep 21, 2021·0 cites·27 claims
- 1949US11532517B2Localized etch stop layerTOKYO ELECTRON LTD·Filed 2020·Granted Dec 20, 2022·0 cites·16 claims
- 2049US11335984B2Dielectric waveguide filterKUNSHAN LUXSHARE RF TECH CO LTD·Filed 2020·Granted May 17, 2022·0 cites·16 claims
- 2148USD573385SBath accessory baseGLOBE UNION IND CORP·Filed 2006·Granted Jul 22, 2008·8 cites·1 claims
- 2247US11756790B2Method for patterning a dielectric layerTOKYO ELECTRON LTD·Filed 2021·Granted Sep 12, 2023·0 cites·6 claims
- 2347US2025210838A1Tm-mode dielectric filterSUZHOU LUXSHARE TECH CO LTD·Filed 2024·Application pending·0 cites
- 2445US10964587B2Atomic layer deposition for low-K trench protection during etchTOKYO ELECTRON LTD·Filed 2019·Granted Mar 30, 2021·0 cites·19 claims
- 2543US11929537B2Resonator filterKUNSHAN LUXSHARE RF TECH CO LTD·Filed 2022·Granted Mar 12, 2024·0 cites·19 claims
- 2643US2025210837A1Dielectric filterSUZHOU LUXSHARE TECH CO LTD·Filed 2024·Application pending·0 cites
- 2742US2021265205A1Dielectric etch stop layer for reactive ion etch (rie) lag reduction and chamfer corner protectionTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →