Inventor · disambiguated record
Xinkang Tian
Also filed as: TIAN XINKANG
28 granted patents·12 pending applications·233 citations·filing 2005–2024
96Inventor score
Files withTOKYO ELECTRON LTD35TIAN XINKANG2KLA TENCOR TECH CORP1MADRIAGA MANUEL1TOKYO ELECTRON LIMTED1
Top patents by PatentIndex Score
40 records- 0197US10345246B2Dark field wafer nano-defect inspection system with a singular beamTOKYO ELECTRON LTD·Filed 2017·Granted Jul 9, 2019·20 cites·20 claims
- 0295US11538723B2Optical diagnostics of semiconductor process using hyperspectral imagingTOKYO ELECTRON LTD·Filed 2020·Granted Dec 27, 2022·3 cites·25 claims
- 0394US8173451B1Etch stage measurement systemTIAN XINKANG·Filed 2011·Granted May 8, 2012·35 cites·17 claims
- 0492US10910201B1Synthetic wavelengths for endpoint detection in plasma etchingTOKYO ELECTRON LTD·Filed 2019·Granted Feb 2, 2021·7 cites·22 claims
- 0592US8193007B1Etch process control using optical metrology and sensor devicesMADRIAGA MANUEL·Filed 2011·Granted Jun 5, 2012·24 cites·5 claims
- 0692US7595869B1Optical metrology system optimized with a plurality of design goalsTOKYO ELECTRON LTD·Filed 2008·Granted Sep 29, 2009·24 cites·20 claims
- 0789US7761178B2Automated process control using an optical metrology system optimized with design goalsTOKYO ELECTRON LTD·Filed 2008·Granted Jul 20, 2010·16 cites·23 claims
- 0887US8173450B1Method of designing an etch stage measurement systemTIAN XINKANG·Filed 2011·Granted May 8, 2012·10 cites·18 claims
- 0986US10692705B2Advanced optical sensor and method for detecting an optical event in a light emission signal in a plasma chamberTOKYO ELECTRON LTD·Filed 2016·Granted Jun 23, 2020·5 cites·23 claims
- 1086US7734437B2Apparatus for designing an optical metrology system optimized with signal criteriaTOKYO ELECTRON LTD·Filed 2008·Granted Jun 8, 2010·12 cites·20 claims
- 1186US7660696B1Apparatus for auto focusing a workpiece using two or more focus parametersTOKYO ELECTRON LTD·Filed 2008·Granted Feb 9, 2010·15 cites·17 claims
- 1285US7589845B1Process control using an optical metrology system optimized with signal criteriaTOKYO ELECTRON LTD·Filed 2008·Granted Sep 15, 2009·16 cites·20 claims
- 1383US12261030B2Normal-incidence in-situ process monitor sensorTOKYO ELECTRON LTD·Filed 2024·Granted Mar 25, 2025·0 cites·10 claims
- 1483US7742889B2Designing an optical metrology system optimized with signal criteriaTOKYO ELECTRON LTD·Filed 2008·Granted Jun 22, 2010·9 cites·20 claims
- 1582US10978278B2Normal-incident in-situ process monitor sensorTOKYO ELECTRON LTD·Filed 2018·Granted Apr 13, 2021·2 cites·19 claims
- 1682US10453653B2Endpoint detection algorithm for atomic layer etching (ALE)TOKYO ELECTRON LTD·Filed 2017·Granted Oct 22, 2019·3 cites·13 claims
- 1780US9059038B2System for in-situ film stack measurement during etching and etch control methodTOKYO ELECTRON LTD·Filed 2013·Granted Jun 16, 2015·5 cites·10 claims
- 1880US7761250B2Optical metrology system optimized with design goalsTOKYO ELECTRON LTD·Filed 2008·Granted Jul 20, 2010·12 cites·18 claims
- 1978US12165937B2Optical diagnostics of semiconductor process using hyperspectral imagingTOKYO ELECTRON LTD·Filed 2022·Granted Dec 10, 2024·0 cites·22 claims
- 2078US8030631B2Apparatus for controlling angle of incidence of multiple illumination beamsTOKYO ELECTRON LTD·Filed 2009·Granted Oct 4, 2011·5 cites·20 claims
- 2176US2024419885A1Hybrid modeling for film metrologyTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2273US2024418501A1Optical sensor for film thickness measurementTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2371US7538868B2Pattern recognition matching for bright field imaging of low contrast semiconductor devicesKLA TENCOR TECH CORP·Filed 2005·Granted May 26, 2009·4 cites·20 claims
- 2469US11961721B2Normal-incidence in-situ process monitor sensorTOKYO ELECTRON LTD·Filed 2021·Granted Apr 16, 2024·0 cites·8 claims
- 2569US11538722B2Optical diagnostics of semiconductor process using hyperspectral imagingTOKYO ELECTRON LTD·Filed 2020·Granted Dec 27, 2022·0 cites·16 claims
- 2668US8030632B2Controlling angle of incidence of multiple-beam optical metrology toolsTOKYO ELECTRON LIMTED·Filed 2009·Granted Oct 4, 2011·5 cites·20 claims
- 2767US10837902B2Optical sensor for phase determinationTOKYO ELECTRON LTD·Filed 2018·Granted Nov 17, 2020·1 cites·20 claims
- 2866US2025060324A1Hybrid x-ray and optical metrology and navigationTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2960US2024387448A1Roentgen integrated metrology for hybrid bonding process control in ultra high 3d integrationTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3060US2025305971A1X-ray methods and systems for semiconductor substrate alignmentTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3159US2025164410A1Optical metrologyTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3259US2025157801A1Sub-millisecond optical detection of pulsed plasma processesTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3356US2009234687A1Method of designing an optical metrology system optimized for operating time budgetTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 3454US2025112065A1Metrology integrated with vacuum processingTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3553US11692874B2Peak alignment for the wavelength calibration of a spectrometerTOKYO ELECTRON LTD·Filed 2021·Granted Jul 4, 2023·0 cites·11 claims
- 3652US11763161B2Enhanced resolution in semiconductor fabrication data acquisition instruments using machine learningTOKYO ELECTRON LTD·Filed 2020·Granted Sep 19, 2023·0 cites·12 claims
- 3747US2022139743A1Optical Sensor for Inspecting Pattern Collapse DefectsTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 3846US2009240537A1Apparatus for designing an optical metrology system optimized for operating time budgetTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 3937US2018286643A1Advanced optical sensor, system, and methodologies for etch processing monitoringTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 4036US7948630B2Auto focus of a workpiece using two or more focus parametersTOKYO ELECTRON LTD·Filed 2008·Granted May 24, 2011·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →