Inventor · disambiguated record
Xuelong Shi
Also filed as: SHI XUELONG
20 granted patents·892 citations·filing 1998–2007
96Inventor score
Top patents by PatentIndex Score
20 records- 0198US7175940B2Method of two dimensional feature model calibration and optimizationASML MASKTOOLS BV·Filed 2002·Granted Feb 13, 2007·365 cites·20 claims
- 0298US6792591B2Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programsASML MASKTOOLS BV·Filed 2002·Granted Sep 14, 2004·160 cites·26 claims
- 0396US7242459B2Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated Eigen decomposition modelASML MASKTOOLS BV·Filed 2005·Granted Jul 10, 2007·31 cites·15 claims
- 0495US7342646B2Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition modelASML MASKTOOLS BV·Filed 2005·Granted Mar 11, 2008·27 cites·12 claims
- 0591US7506299B2Feature optimization using interference mapping lithographyASML HOLDING NV·Filed 2004·Granted Mar 17, 2009·46 cites·30 claims
- 0691US6519760B2Method and apparatus for minimizing optical proximity effectsASML MASKTOOLS BV·Filed 2001·Granted Feb 11, 2003·61 cites·13 claims
- 0790US7820341B2Method of two dimensional feature model calibration and optimizationASML MASKTOOLS BV·Filed 2007·Granted Oct 26, 2010·12 cites·24 claims
- 0888US7440082B2Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition modelASML MASKTOOLS BV·Filed 2007·Granted Oct 21, 2008·8 cites·15 claims
- 0986US7550235B2Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithographyASML MASKTOOLS BV·Filed 2004·Granted Jun 23, 2009·25 cites·12 claims
- 1083US7398508B2Eigen decomposition based OPC modelASML MASKTOOKS B V·Filed 2004·Granted Jul 8, 2008·27 cites·22 claims
- 1182US7594199B2Method of optical proximity correction design for contact hole maskASML MASKTOOLS BV·Filed 2004·Granted Sep 22, 2009·22 cites·13 claims
- 1282US7434195B2Method for performing full-chip manufacturing reliability checking and correctionASML MASKTOOLS BV·Filed 2005·Granted Oct 7, 2008·13 cites·11 claims
- 1379US8040573B2Method, program product and apparatus for translating geometrical design rules into boundary conditions in the imaging space so as to define test patterns for use in optical model calibrationASML MASKTOOLS BV·Filed 2007·Granted Oct 18, 2011·5 cites·18 claims
- 1478US7514183B2Method for performing transmission tuning of a mask pattern to improve process latitudeASML MASKTOOLS BV·Filed 2004·Granted Apr 7, 2009·16 cites·12 claims
- 1578US7100145B2Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programsASML MASKTOOLS BV·Filed 2004·Granted Aug 29, 2006·13 cites·9 claims
- 1676US7735052B2Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programsASML MASKTOOLS BV·Filed 2006·Granted Jun 8, 2010·4 cites·16 claims
- 1776US7124395B2Automatic optical proximity correction (OPC) rule generationASML MASKTOOLS BV·Filed 2003·Granted Oct 17, 2006·18 cites·20 claims
- 1875US7376930B2Method, program product and apparatus for generating assist features utilizing an image field mapASML MASKTOOLS BV·Filed 2004·Granted May 20, 2008·13 cites·16 claims
- 1960US6100012AInfra-red radiation post-exposure bake process for chemically amplified resist lithographyNAT SEMICONDUCTOR CORP·Filed 1998·Granted Aug 8, 2000·19 cites·11 claims
- 2043US6245491B1Photo-assisted post exposure bake for chemically amplified photoresist processNAT SEMICONDUCTOR CORP·Filed 1999·Granted Jun 12, 2001·7 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →