Inventor · disambiguated record
Yao-Ching Ku
Also filed as: KU YAO-CHING
32 granted patents·3 pending applications·294 citations·filing 1998–2018
97Inventor score
Files withTAIWAN SEMICONDUCTOR MFG17UNITED MICROELECTRONICS CORP7TAIWAN SEMICONDUCTOR MFG CO LTD3LIU GEORGE2HOU YUNG-CHIN1
Top patents by PatentIndex Score
35 records- 0194US10162258B2Pellicle fabrication methods and structures thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 25, 2018·8 cites·20 claims
- 0293US6492073B1Removal of line end shortening in microlithography and mask set for removalTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Dec 10, 2002·59 cites·20 claims
- 0391US7685558B2Method for detection and scoring of hot spots in a design layoutTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Mar 23, 2010·28 cites·16 claims
- 0490US8431291B2Intensity selective exposure photomaskLIU GEORGE·Filed 2011·Granted Apr 30, 2013·5 cites·16 claims
- 0590US7954072B2Model import for electronic design automationTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted May 31, 2011·20 cites·20 claims
- 0689US7783999B2Electrical parameter extraction for integrated circuit designTAIWAN SEMICONDUCTOR MFG·Filed 2008·Granted Aug 24, 2010·23 cites·16 claims
- 0788US8001494B2Table-based DFM for accurate post-layout analysisTAIWAN SEMICONDUCTOR MFG·Filed 2008·Granted Aug 16, 2011·16 cites·20 claims
- 0887US8037575B2Method for shape and timing equivalent dimension extractionTAIWAN SEMICONDUCTOR MFG·Filed 2008·Granted Oct 18, 2011·17 cites·18 claims
- 0982US10747103B2Pellicle fabrication methods and structures thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Aug 18, 2020·2 cites·20 claims
- 1082US7778805B2Regression system and methods for optical proximity correction modelingTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Aug 17, 2010·7 cites·27 claims
- 1175US8352888B2Model import for electronic design automationTAIWAN SEMICONDUCTOR MFG·Filed 2011·Granted Jan 8, 2013·3 cites·8 claims
- 1274US8214772B2Model import for electronic design automationLIU RU-GUN·Filed 2011·Granted Jul 3, 2012·3 cites·20 claims
- 1373US7727682B2System and method for providing phase shift mask passivation layerTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Jun 1, 2010·4 cites·11 claims
- 1472US10163738B2Structure and method for overlay marksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 25, 2018·1 cites·20 claims
- 1572US9026957B2Method of defining an intensity selective exposure photomaskTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted May 5, 2015·1 cites·15 claims
- 1670US8673520B2Intensity selective exposure photomaskLIU GEORGE·Filed 2011·Granted Mar 18, 2014·1 cites·19 claims
- 1770US6979820B2CD SEM automatic focus methodology and apparatus for constant electron beam dosage controlTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Dec 27, 2005·9 cites·30 claims
- 1867US7387969B2Top patterned hardmask and method for patterningTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Jun 17, 2008·2 cites·14 claims
- 1966US8987008B2Integrated circuit layout and method with double patterningTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Mar 24, 2015·1 cites·17 claims
- 2065US9543406B2Structure and method for overlay marksWANG HSIEN-CHENG·Filed 2011·Granted Jan 10, 2017·1 cites·20 claims
- 2164US6251564B1Method for forming a pattern with both logic-type and memory-type circuitUNITED MICROELECTRONICS CORP·Filed 1999·Granted Jun 26, 2001·22 cites·14 claims
- 2264US6165693AMethod of designing an assist featureUNITED MICROELECTRONICS CORP·Filed 1998·Granted Dec 26, 2000·22 cites·16 claims
- 2363US8201111B2Table-based DFM for accurate post-layout analysisHOU YUNG-CHIN·Filed 2011·Granted Jun 12, 2012·1 cites·20 claims
- 2462US8375347B2Driven metal critical dimension (CD) biasingTAIWAN SEMICONDUCTOR MFG·Filed 2009·Granted Feb 12, 2013·2 cites·20 claims
- 2554US7218400B2In-situ overlay alignmentTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted May 15, 2007·4 cites·12 claims
- 2654US6013397AMethod for automatically forming a phase shifting maskUNITED MICROELECTRONICS CORP·Filed 1998·Granted Jan 11, 2000·14 cites·14 claims
- 2747US7314689B2System and method for processing masks with oblique featuresTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Jan 1, 2008·2 cites·25 claims
- 2846US2009258159A1Novel treatment for mask surface chemical reductionTAIWAN SEMICONDUCTOR MFG·Filed 2008·Application pending·0 cites
- 2942US6064485AMethod of optical proximity correctionUNITED MICROELECTRONICS CORP·Filed 1999·Granted May 16, 2000·6 cites·10 claims
- 3042US6016201AInspection method for a correction patternUNITED MICROELECTRONICS CORP·Filed 1998·Granted Jan 18, 2000·8 cites·6 claims
- 3141US8609545B2Method to improve mask critical dimension uniformity (CDU)HUANG I-HSIUNG·Filed 2008·Granted Dec 17, 2013·0 cites·12 claims
- 3236US2002064716A1Method of optical proximity correctionFiled 2002·Application pending·0 cites
- 3333US6291112B1Method of automatically forming a rim phase shifting maskUNITED MICROELECTRONICS CORP·Filed 1998·Granted Sep 18, 2001·2 cites·14 claims
- 3430US6087049AMixed mode photomask for optical proximity correction in a lithographic processUNITED MICROELECTRONICS CORP·Filed 1999·Granted Jul 11, 2000·0 cites·6 claims
- 3530US2001003026A1Method of manufacturing a strong phase shifting maskFiled 1999·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Yao-Ching Ku files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →