Inventor · disambiguated record
Yasunari Sohda
Also filed as: SOHDA YASUNARI
76 granted patents·2 pending applications·508 citations·filing 1991–2020
99Inventor score
Top patents by PatentIndex Score
78 records- 0194US7378668B2Method and apparatus for applying charged particle beamHITACHI HIGH TECH CORP·Filed 2006·Granted May 27, 2008·25 cites·11 claims
- 0292US7745237B2Pattern forming method and pattern forming systemHITACHI LTD·Filed 2007·Granted Jun 29, 2010·15 cites·17 claims
- 0392US6903353B2Charged particle beam exposure apparatus, device manufacturing method, and charged particle beam applied apparatusADVANTEST CORP·Filed 2002·Granted Jun 7, 2005·57 cites·7 claims
- 0490US6667486B2Electron beam exposure method, electron beam exposure apparatus and device manufacturing method using the sameHITACHI LTD·Filed 2002·Granted Dec 23, 2003·34 cites·8 claims
- 0589US7425714B2Measurement method of electron beam current, electron beam writing system and electron beam detectorHITACHI HIGH TECH CORP·Filed 2005·Granted Sep 16, 2008·12 cites·12 claims
- 0688US7655907B2Charged particle beam apparatus and pattern measuring methodHITACHI HIGH TECH CORP·Filed 2007·Granted Feb 2, 2010·12 cites·12 claims
- 0786US6121625ACharged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 1998·Granted Sep 19, 2000·30 cites·11 claims
- 0884US8766183B2Charged particle beam deviceFUKUDA MUNEYUKI·Filed 2009·Granted Jul 1, 2014·8 cites·17 claims
- 0983US11251018B2Scanning electron microscopeHITACHI HIGH TECH CORP·Filed 2018·Granted Feb 15, 2022·3 cites·13 claims
- 1083US7423274B2Electron beam writing system and electron beam writing methodHITACHI HIGH TECH CORP·Filed 2006·Granted Sep 9, 2008·7 cites·12 claims
- 1181US7884325B2Electron beam measurement apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Feb 8, 2011·6 cites·12 claims
- 1280US7612334B2Standard reference component for calibration, fabrication method for the same, and scanning electron microscope using the sameHITACHI HIGH TECH CORP·Filed 2007·Granted Nov 3, 2009·5 cites·15 claims
- 1379US8263929B2Standard member for correction, scanning electron microscope using same, and scanning electron microscope correction methodNAKAYAMA YOSHINORI·Filed 2009·Granted Sep 11, 2012·6 cites·20 claims
- 1479US5283440AElectron beam writing system used in a cell projection methodHITACHI LTD·Filed 1991·Granted Feb 1, 1994·34 cites·10 claims
- 1578US8704175B2Scanning electron microscopeSOHDA YASUNARI·Filed 2011·Granted Apr 22, 2014·4 cites·14 claims
- 1678US7875850B2Standard component for calibration and electron-beam system using the sameHITACHI HIGH TECH CORP·Filed 2008·Granted Jan 25, 2011·8 cites·13 claims
- 1778US7476882B2Calibration method for electron-beam system and electron-beam systemHITACHI HIGH TECH CORP·Filed 2006·Granted Jan 13, 2009·4 cites·14 claims
- 1878US7385194B2Charged particle beam application systemHITACHI HIGH TECH CORP·Filed 2006·Granted Jun 10, 2008·6 cites·19 claims
- 1978US6573520B1Electron beam lithography systemHITACHI LTD·Filed 2000·Granted Jun 3, 2003·14 cites·8 claims
- 2077US9520266B2Pattern critical dimension measurement equipment and method for measuring pattern critical dimensionHITACHI HIGH TECH CORP·Filed 2014·Granted Dec 13, 2016·4 cites·20 claims
- 2176US9543053B2Electron beam equipmentHITACHI HIGH TECH CORP·Filed 2014·Granted Jan 10, 2017·3 cites·11 claims
- 2275US10134558B2Scanning electron microscopeHITACHI HIGH TECH CORP·Filed 2015·Granted Nov 20, 2018·2 cites·8 claims
- 2375US7750296B2Scanning electron microscope and calibration of image distortionHITACHI HIGH TECH CORP·Filed 2007·Granted Jul 6, 2010·3 cites·9 claims
- 2475US6441383B1Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2001·Granted Aug 27, 2002·6 cites·1 claims
- 2575US6262428B1Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2000·Granted Jul 17, 2001·6 cites·3 claims
- 2674US7105842B2Method of charged particle beam lithography and equipment for charged particle beam lithographyCANON KK·Filed 2004·Granted Sep 12, 2006·10 cites·14 claims
- 2773US10692693B2System and method for measuring patternsHITACHI HIGH TECH CORP·Filed 2018·Granted Jun 23, 2020·1 cites·15 claims
- 2873US8742342B2Electron microscopeOKAI NOBUHIRO·Filed 2010·Granted Jun 3, 2014·3 cites·14 claims
- 2973US8735814B2Electron beam deviceSOHDA YASUNARI·Filed 2011·Granted May 27, 2014·3 cites·16 claims
- 3073US5396077AElectron beam lithography apparatus having electron optics correction systemHITACHI LTD·Filed 1994·Granted Mar 7, 1995·24 cites·5 claims
- 3172US7679056B2Metrology system of fine pattern for process control by charged particle beamHITACHI HIGH TECH CORP·Filed 2007·Granted Mar 16, 2010·4 cites·4 claims
- 3272US6809319B2Electron beam writing equipment and electron beam writing methodHITACHI HIGH TECH CORP·Filed 2003·Granted Oct 26, 2004·8 cites·12 claims
- 3371US8969801B2Scanning electron microscopeHITACHI HIGH TECH CORP·Filed 2012·Granted Mar 3, 2015·2 cites·18 claims
- 3471US6768118B2Electron beam monitoring sensor and electron beam monitoring methodHITACHI LTD·Filed 2003·Granted Jul 27, 2004·8 cites·11 claims
- 3570US6320198B1Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2000·Granted Nov 20, 2001·4 cites·1 claims
- 3669US5650631AElectron beam writing systemHITACHI LTD·Filed 1995·Granted Jul 22, 1997·22 cites·30 claims
- 3768US9644955B2Scanning electron beam device with focus adjustment based on acceleration voltage and dimension measurement method using sameHITACHI HIGH TECH CORP·Filed 2012·Granted May 9, 2017·2 cites·12 claims
- 3867US9261360B2Charged particle beam microscopeOKAI NOBUHIRO·Filed 2011·Granted Feb 16, 2016·2 cites·8 claims
- 3967US6511048B1Electron beam lithography apparatus and pattern forming methodHITACHI LTD·Filed 1998·Granted Jan 28, 2003·20 cites·15 claims
- 4066US9960006B2Charged-particle-beam deviceHITACHI HIGH TECH CORP·Filed 2015·Granted May 1, 2018·1 cites·14 claims
- 4166US9799483B2Charged particle beam device and detection method using said deviceHITACHI HIGH TECH CORP·Filed 2015·Granted Oct 24, 2017·1 cites·15 claims
- 4265US8268209B2Pattern forming method and its moldOGINO MASAHIKO·Filed 2007·Granted Sep 18, 2012·3 cites·7 claims
- 4365US8125518B2Scanning electron microscopeOKAI NOBUHIRO·Filed 2009·Granted Feb 28, 2012·1 cites·14 claims
- 4464US10446361B2Aberration correction method, aberration correction system, and charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Oct 15, 2019·1 cites·15 claims
- 4563US8064681B2Method and apparatus for inspecting reticleOKAI NOBUHIRO·Filed 2008·Granted Nov 22, 2011·5 cites·16 claims
- 4663US7041988B2Electron beam exposure apparatus and electron beam processing apparatusHITACHI LTD·Filed 2003·Granted May 9, 2006·8 cites·16 claims
- 4763US5831273ACharged particle beam lithography method and apparatus thereofHITACHI LTD·Filed 1997·Granted Nov 3, 1998·16 cites·18 claims
- 4861US8637820B2Scanning electron microscope and inspection method using sameSOHDA YASUNARI·Filed 2011·Granted Jan 28, 2014·1 cites·19 claims
- 4960US6838682B2Electron beam exposure equipment and electron beam exposure methodHITACHI HIGH TECH CORP·Filed 2003·Granted Jan 4, 2005·4 cites·20 claims
- 5058US9230775B2Charged particle instrumentOHASHI TAKEYOSHI·Filed 2012·Granted Jan 5, 2016·1 cites·14 claims
Showing the top 50 of 78 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →