Inventor · disambiguated record
Yasushi Takiguchi
Also filed as: TAKIGUCHI YASUSHI
30 granted patents·2 pending applications·110 citations·filing 2007–2024
95Inventor score
Top patents by PatentIndex Score
32 records- 0192US8337104B2Developing apparatus, developing method and storage mediumTAKIGUCHI YASUSHI·Filed 2011·Granted Dec 25, 2012·10 cites·11 claims
- 0290US11554389B2Substrate cleaning apparatus and substrate cleaning methodTOKYO ELECTRON LTD·Filed 2021·Granted Jan 17, 2023·2 cites·9 claims
- 0390US8578953B2Substrate cleaning apparatus, substrate cleaning method, and computer-readable storage mediumTAKIGUCHI YASUSHI·Filed 2007·Granted Nov 12, 2013·17 cites·21 claims
- 0487US10168618B2Liquid processing method and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Jan 1, 2019·5 cites·5 claims
- 0586USD610176SCoater cupTOKYO ELECTRON LTD·Filed 2009·Granted Feb 16, 2010·37 cites·1 claims
- 0684US9716002B2Substrate cleaning methodTOKYO ELECTRON LTD·Filed 2016·Granted Jul 25, 2017·3 cites·15 claims
- 0783US11059145B2Dressing apparatus and dressing method for substrate rear surface polishing memberTOKYO ELECTRON LTD·Filed 2018·Granted Jul 13, 2021·2 cites·18 claims
- 0882US7959988B2Coating film forming apparatus and methodTOKYO ELECTRON LTD·Filed 2007·Granted Jun 14, 2011·8 cites·12 claims
- 0981US9947556B2Substrate cleaning apparatus, substrate cleaning method, and storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Apr 17, 2018·5 cites·12 claims
- 1080US9195138B2Liquid processing apparatus, liquid processing method and storage mediumSASAGAWA NORIHIKO·Filed 2011·Granted Nov 24, 2015·7 cites·13 claims
- 1178US12230515B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2024·Granted Feb 18, 2025·0 cites·4 claims
- 1278US8333522B2Developing apparatus, developing method and storage mediumARIMA HIROSHI·Filed 2011·Granted Dec 18, 2012·5 cites·15 claims
- 1377US9869941B2Substrate cleaning method, substrate cleaning apparatus, and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted Jan 16, 2018·2 cites·6 claims
- 1473US10840079B2Substrate processing apparatus, substrate processing method and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Nov 17, 2020·2 cites·17 claims
- 1572US11139182B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Oct 5, 2021·1 cites·12 claims
- 1672US9570326B2Substrate cleaning method, substrate cleaning apparatus, and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Feb 14, 2017·2 cites·6 claims
- 1770US2021308828A1Dressing apparatus and dressing method for substrate rear surface polishing memberTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1868US11887869B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Jan 30, 2024·0 cites·4 claims
- 1968US9470979B2Developing treatment apparatus and developing treatment methodTOKYO ELECTRON LTD·Filed 2016·Granted Oct 18, 2016·1 cites·7 claims
- 2066US9568829B2Developing method, developing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Feb 14, 2017·1 cites·14 claims
- 2154US9575411B2Developing apparatus, developing method and storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Feb 21, 2017·0 cites·11 claims
- 2253US2014102474A1Substrate cleaning apparatus, substrate cleaning method, and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 2352US11031261B2Liquid processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jun 8, 2021·0 cites·9 claims
- 2452US10289004B2Developing apparatus, developing method and storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted May 14, 2019·0 cites·8 claims
- 2552US10014190B2Liquid processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Jul 3, 2018·0 cites·15 claims
- 2651US9304398B2Developing treatment apparatus and developing treatment methodTOKYO ELECTRON LTD·Filed 2013·Granted Apr 5, 2016·0 cites·11 claims
- 2750US11532487B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Dec 20, 2022·0 cites·12 claims
- 2850US10120285B2Developing method, developing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted Nov 6, 2018·0 cites·14 claims
- 2940US12491600B2Substrate warpage correction method, computer storage medium, and substrate warpage correction apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Dec 9, 2025·0 cites·20 claims
- 3040US10649334B2Liquid processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted May 12, 2020·0 cites·10 claims
- 3140US8262300B2Coating and developing apparatus, developing method and non-transitory mediumTAKIGUCHI YASUSHI·Filed 2011·Granted Sep 11, 2012·0 cites·11 claims
- 3234US8636915B2Liquid processing apparatus and liquid processing methodTAKIGUCHI YASUSHI·Filed 2011·Granted Jan 28, 2014·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →