Inventor · disambiguated record
Yamato Tonegawa
Also filed as: TONEGAWA YAMATO
19 granted patents·10 pending applications·133 citations·filing 2002–2025
92Inventor score
Top patents by PatentIndex Score
29 records- 0196US8034673B2Film formation method and apparatus for forming silicon-containing insulating film doped with metalTOKYO ELECTRON LTD·Filed 2009·Granted Oct 11, 2011·74 cites·17 claims
- 0289US7494943B2Method for using film formation apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Feb 24, 2009·10 cites·20 claims
- 0388US10388511B2Method of forming silicon nitride film, film forming apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Aug 20, 2019·6 cites·13 claims
- 0481US10535501B2Film forming apparatus, film forming method and non-transitory storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Jan 14, 2020·2 cites·11 claims
- 0580US8080109B2Film formation apparatus and method for using the sameOKADA MITSUHIRO·Filed 2008·Granted Dec 20, 2011·8 cites·15 claims
- 0679US11694890B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jul 4, 2023·2 cites·11 claims
- 0772US7179334B2System and method for performing semiconductor processing on substrate being processedTOKYO ELECTRON LTD·Filed 2002·Granted Feb 20, 2007·14 cites·11 claims
- 0868US12488991B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Dec 2, 2025·0 cites·14 claims
- 0967US7964516B2Film formation apparatus for semiconductor process and method for using sameTOKYO ELECTRON LTD·Filed 2009·Granted Jun 21, 2011·9 cites·16 claims
- 1067US7938080B2Method for using film formation apparatusTOKYO ELECTRON LTD·Filed 2008·Granted May 10, 2011·8 cites·5 claims
- 1167US2024175122A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1263US12469694B2Film forming methodTOKYO ELECTRON LTD·Filed 2023·Granted Nov 11, 2025·0 cites·9 claims
- 1360US2024175117A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1458US2025333838A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1558US2025357113A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1657US10573514B2Method of forming silicon-containing filmTOKYO ELECTRON LTD·Filed 2018·Granted Feb 25, 2020·0 cites·7 claims
- 1754US2013251896A1Method of protecting component of film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1853US10217630B2Method of forming silicon-containing filmTOKYO ELECTRON LTD·Filed 2017·Granted Feb 26, 2019·0 cites·11 claims
- 1952US11781219B2Processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Oct 10, 2023·0 cites·5 claims
- 2051US2023326742A1Deposition method and processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2150US12237167B2Deposition methodTOKYO ELECTRON LTD·Filed 2022·Granted Feb 25, 2025·0 cites·4 claims
- 2250US12060640B2Film forming method and systemTOKYO ELECTRON LTD·Filed 2020·Granted Aug 13, 2024·0 cites·8 claims
- 2350US11923177B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Mar 5, 2024·0 cites·13 claims
- 2448US8153451B2System and method for performing semiconductor processing on target substrateSAKAMOTO KOICHI·Filed 2007·Granted Apr 10, 2012·0 cites·14 claims
- 2548US2022238335A1Method for forming film and processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 2644US7959737B2Film formation apparatus and method for using the sameTOKYO ELECTRON LTD·Filed 2007·Granted Jun 14, 2011·0 cites·15 claims
- 2742US2015275368A1Film Forming Apparatus Using Gas NozzlesTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 2834US2014106577A1Method and apparatus of forming silicon nitride filmTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 2930US2015376789A1Vertical heat treatment apparatus and method of operating vertical heat treatment apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →