Inventor · disambiguated record
Yen-Liang Wu
Also filed as: WU YEN-LIANG
33 granted patents·7 pending applications·113 citations·filing 2012–2020
96Inventor score
Files withUNITED MICROELECTRONICS CORP34WISTRON NEWEB CORP3ATHENA DATA TECH LTD1CHANG CHUNG-FU1HO YU-MIN1
Top patents by PatentIndex Score
40 records- 0196US10062764B1Semiconductor device having void between gate electrode and sidewall spacer and manufacturing method thereofUNITED MICROELECTRONICS CORP·Filed 2017·Granted Aug 28, 2018·19 cites·10 claims
- 0295US9166024B2FinFET structure with cavities and semiconductor compound portions extending laterally over sidewall spacersUNITED MICROELECTRONICS CORP·Filed 2013·Granted Oct 20, 2015·23 cites·2 claims
- 0389US9385191B2FINFET structureUNITED MICROELECTRONICS CORP·Filed 2014·Granted Jul 5, 2016·10 cites·5 claims
- 0488US10170573B1Semiconductor device and fabrication method thereofUNITED MICROELECTRONICS CORP·Filed 2017·Granted Jan 1, 2019·6 cites·10 claims
- 0587US9691901B2Semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2015·Granted Jun 27, 2017·6 cites·12 claims
- 0686US9899523B2Semiconductor structureUNITED MICROELECTRONICS CORP·Filed 2015·Granted Feb 20, 2018·5 cites·19 claims
- 0786US9786510B2Fin-shaped structure and manufacturing method thereofUNITED MICROELECTRONICS CORP·Filed 2014·Granted Oct 10, 2017·5 cites·6 claims
- 0886US9502530B2Method of manufacturing semiconductor devicesUNITED MICROELECTRONICS CORP·Filed 2015·Granted Nov 22, 2016·4 cites·6 claims
- 0981US9601600B2Processes for fabricating FinFET structures with semiconductor compound portions formed in cavities and extending over sidewall spacersUNITED MICROELECTRONICS CORP·Filed 2015·Granted Mar 21, 2017·3 cites·10 claims
- 1080US8772120B2Semiconductor processCHANG CHUNG-FU·Filed 2012·Granted Jul 8, 2014·5 cites·19 claims
- 1177US9224864B1Semiconductor device and method of fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2014·Granted Dec 29, 2015·4 cites·19 claims
- 1277US8985466B2Multi-function radio-frequency device, computer system and method of operating multi-function radio-frequency deviceWISTRON NEWEB CORP·Filed 2012·Granted Mar 24, 2015·5 cites·19 claims
- 1376US8753902B1Method of controlling etching process for forming epitaxial structureUNITED MICROELECTRONICS CORP·Filed 2013·Granted Jun 17, 2014·3 cites·13 claims
- 1473US11239082B2Method for fabricating semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2019·Granted Feb 1, 2022·1 cites·8 claims
- 1573US10050146B2Semiconductor device and method of forming the sameUNITED MICROELECTRONICS CORP·Filed 2014·Granted Aug 14, 2018·2 cites·5 claims
- 1673US9362382B1Method for forming semiconductor device with low sealing lossUNITED MICROELECTRONICS CORP·Filed 2014·Granted Jun 7, 2016·2 cites·15 claims
- 1768US9627538B2Fin field effect transistor and method of manufacturing the sameUNITED MICROELECTRONICS CORP·Filed 2014·Granted Apr 18, 2017·2 cites·21 claims
- 1868US8829575B2Semiconductor structure and process thereofUNITED MICROELECTRONICS CORP·Filed 2012·Granted Sep 9, 2014·2 cites·20 claims
- 1966US9214395B2Method of manufacturing semiconductor devicesUNITED MICROELECTRONICS CORP·Filed 2013·Granted Dec 15, 2015·1 cites·9 claims
- 2065US9634125B2Fin field effect transistor device and fabrication method thereofUNITED MICROELECTRONICS CORP·Filed 2016·Granted Apr 25, 2017·1 cites·12 claims
- 2165US9018066B2Method of fabricating semiconductor device structureUNITED MICROELECTRONICS CORP·Filed 2013·Granted Apr 28, 2015·1 cites·14 claims
- 2264US10930517B2Method of forming fin-shaped structureUNITED MICROELECTRONICS CORP·Filed 2019·Granted Feb 23, 2021·0 cites·7 claims
- 2358US10468493B2Method for manufacturing gate stack structureUNITED MICROELECTRONICS CORP·Filed 2018·Granted Nov 5, 2019·0 cites·9 claims
- 2458US10418251B2Method of forming fin-shaped structure having ladder-shaped cross-sectional profileUNITED MICROELECTRONICS CORP·Filed 2017·Granted Sep 17, 2019·0 cites·5 claims
- 2557USD973038SGate antennaATHENA DATA TECH LTD·Filed 2020·Granted Dec 20, 2022·3 cites·1 claims
- 2657US9461147B2Semiconductor structureUNITED MICROELECTRONICS CORP·Filed 2014·Granted Oct 4, 2016·0 cites·9 claims
- 2755US10529856B2Method of forming semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2018·Granted Jan 7, 2020·0 cites·19 claims
- 2855US10388749B2Manufacturing method of semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2018·Granted Aug 20, 2019·0 cites·8 claims
- 2954US10186594B2Semiconductor device having metal gateUNITED MICROELECTRONICS CORP·Filed 2017·Granted Jan 22, 2019·0 cites·6 claims
- 3053US9685541B2Method for forming semiconductor structureUNITED MICROELECTRONICS CORP·Filed 2016·Granted Jun 20, 2017·0 cites·11 claims
- 3152US10366896B2Semiconductor device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2017·Granted Jul 30, 2019·0 cites·7 claims
- 3249US9397190B2Fabrication method of semiconductor structureUNITED MICROELECTRONICS CORP·Filed 2014·Granted Jul 19, 2016·0 cites·20 claims
- 3346US2013194076A1Process Monitoring System and Related MethodHO YU-MIN·Filed 2012·Application pending·0 cites
- 3445US2015357436A1Semiconductor device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2014·Application pending·0 cites
- 3545US2016049496A1Mos transistor and semiconductor process for forming epitaxial structureUNITED MICROELECTRONICS CORP·Filed 2014·Application pending·0 cites
- 3644US10002966B1Field effect transistor and device thereofUNITED MICROELECTRONICS CORP·Filed 2017·Granted Jun 19, 2018·0 cites·18 claims
- 3743US2016049467A1Fin field effect transistor device and fabrication method thereofUNITED MICROELECTRONICS CORP·Filed 2014·Application pending·0 cites
- 3843US2015255563A1Method for manufacturing a semiconductor device having multi-layer hard maskUNITED MICROELECTRONICS CORP·Filed 2014·Application pending·0 cites
- 3937US2015002349A1Radio-Frequency Device and Wireless Communication Device for Enhancing Antenna IsolationWISTRON NEWEB CORP·Filed 2014·Application pending·0 cites
- 4029US2014292489A1Positioning system and positioning methodWISTRON NEWEB CORP·Filed 2013·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →