Inventor · disambiguated record
Yi-Chia Lee
Also filed as: LEE YI-CHIA
37 granted patents·16 pending applications·47 citations·filing 2004–2025
95Inventor score
Files withVERSUM MAT US LLC32AIR PROD & CHEM8TAIWAN SEMICONDUCTOR MFG CO LTD4COMPAL ELECTRONICS INC2UNITED MICROELECTRONICS CORP2
Top patents by PatentIndex Score
53 records- 0194US12110435B2Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2022·Granted Oct 8, 2024·3 cites·18 claims
- 0293US9976111B2TiN hard mask and etch residual removalAIR PROD & CHEM·Filed 2016·Granted May 22, 2018·5 cites·30 claims
- 0389US10556792B2Wafer level integrated MEMS device enabled by silicon pillar and smart capTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Feb 11, 2020·3 cites·20 claims
- 0487US10961118B2Wafer level integrated MEMS device enabled by silicon pillar and smart capTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Mar 30, 2021·2 cites·20 claims
- 0584US9201308B2Water-rich stripping and cleaning formulation and method for using sameAIR PROD & CHEM·Filed 2013·Granted Dec 1, 2015·3 cites·20 claims
- 0681US11180697B2Etching solution having silicon oxide corrosion inhibitor and method of using the sameVERSUM MAT US LLC·Filed 2019·Granted Nov 23, 2021·2 cites·8 claims
- 0781US10934485B2Etching solution for selectively removing silicon over silicon-germanium alloy from a silicon-germanium/ silicon stack during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2018·Granted Mar 2, 2021·3 cites·19 claims
- 0879US10870799B2Etching solution for selectively removing tantalum nitride over titanium nitride during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2018·Granted Dec 22, 2020·2 cites·22 claims
- 0976US11035044B2Etching solution for tungsten and GST filmsVERSUM MAT US LLC·Filed 2018·Granted Jun 15, 2021·1 cites·25 claims
- 1073US10934484B2Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/ germanium stack during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2019·Granted Mar 2, 2021·1 cites·25 claims
- 1172US9472420B2Composition for titanium nitride hard mask and etch residue removalAIR PROD & CHEM·Filed 2014·Granted Oct 18, 2016·2 cites·21 claims
- 1270US11017995B2Composition for TiN hard mask removal and etch residue cleaningVERSUM MAT US LLC·Filed 2019·Granted May 25, 2021·1 cites·16 claims
- 1370US10879076B2Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/silicon stack during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2018·Granted Dec 29, 2020·1 cites·22 claims
- 1469US11499236B2Etching solution for tungsten word line recessVERSUM MAT US LLC·Filed 2019·Granted Nov 15, 2022·1 cites·23 claims
- 1569US10899608B2Wafer level integrated MEMS device enabled by silicon pillar and smart capTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jan 26, 2021·0 cites·20 claims
- 1669US10072237B2Photoresist cleaning composition used in photolithography and a method for treating substrate therewithAIR PROD & CHEM·Filed 2016·Granted Sep 11, 2018·1 cites·20 claims
- 1767US10400167B2Etching compositions and methods for using sameVERSUM MAT US LLC·Filed 2016·Granted Sep 3, 2019·1 cites·22 claims
- 1866US11175587B2Stripper solutions and methods of using stripper solutionsVERSUM MAT US LLC·Filed 2018·Granted Nov 16, 2021·1 cites·20 claims
- 1966US10301580B2Stripping compositions having high WN/W etching selectivityVERSUM MAT US LLC·Filed 2015·Granted May 28, 2019·1 cites·29 claims
- 2065US10073351B2Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivationAIR PROD & CHEM·Filed 2015·Granted Sep 11, 2018·1 cites·16 claims
- 2164US8889609B2Cleaning formulations and method of using the cleaning formulationsWU AIPING·Filed 2012·Granted Nov 18, 2014·1 cites·21 claims
- 2260US12298669B2Composition comprising three alkanolamines and a hydroxylamine for removing etch residuesVERSUM MAT US LLC·Filed 2020·Granted May 13, 2025·0 cites·11 claims
- 2360US2025085815A1Electronic device and control method thereofCOMPAL ELECTRONICS INC·Filed 2024·Application pending·0 cites
- 2459US12281251B2Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2020·Granted Apr 22, 2025·0 cites·23 claims
- 2559US7250332B2Method for fabricating a semiconductor device having improved hot carrier immunity abilityUNITED MICROELECTRONICS CORP·Filed 2004·Granted Jul 31, 2007·7 cites·14 claims
- 2659US2024420330A1Method and system for auxiliary medical diagnosis for gastritisUNIV NAT TAIWAN HOSPITAL·Filed 2024·Application pending·0 cites
- 2759US2025383503A1Photonic integrated circuit and methods of formationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2858US8357646B2Stripper for dry film removalAIR PROD & CHEM·Filed 2009·Granted Jan 22, 2013·1 cites·10 claims
- 2956US2025362858A1Electronic apparatus and data display method thereofCOMPAL ELECTRONICS INC·Filed 2025·Application pending·0 cites
- 3055US11946148B2Hafnium oxide corrosion inhibitorVERSUM MAT US LLC·Filed 2020·Granted Apr 2, 2024·0 cites·17 claims
- 3155US2025304856A1Formulated Alkaline Chemistry For Polysilicon ExhumeVERSUM MAT US LLC·Filed 2023·Application pending·0 cites
- 3254US12110436B2Co/Cu selective wet etchantVERSUM MAT US LLC·Filed 2020·Granted Oct 8, 2024·0 cites·21 claims
- 3353US11955341B2Etching solution and method for selectively removing silicon nitride during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2020·Granted Apr 9, 2024·0 cites·17 claims
- 3453US10711227B2TiN hard mask and etch residue removalVERSUM MAT US LLC·Filed 2018·Granted Jul 14, 2020·0 cites·24 claims
- 3553US2024392194A1Post-Dry Etching Photoresist And Metal Containing Residue Removal FormulationVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 3652US11091727B2Post etch residue cleaning compositions and methods of using the sameVERSUM MAT US LLC·Filed 2019·Granted Aug 17, 2021·0 cites·17 claims
- 3752US2024271040A1Etching Solution For Selectively Removing Silicon-Germanium Alloy From A Silicon-Germanium/ Silicon Stack During Manufacture Of A Semiconductor DeviceVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 3850US11929257B2Etching solution and method for aluminum nitrideVERSUM MAT US LLC·Filed 2020·Granted Mar 12, 2024·0 cites·21 claims
- 3950US11186771B2Etching solution for selectively removing silicon nitride during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2018·Granted Nov 30, 2021·0 cites·16 claims
- 4050US7306681B2Method of cleaning a semiconductor substrateUNITED MICROELECTRONICS CORP·Filed 2004·Granted Dec 11, 2007·3 cites·9 claims
- 4148US10954480B2Compositions and methods for preventing collapse of high aspect ratio structures during dryingVERSUM MAT US LLC·Filed 2018·Granted Mar 23, 2021·0 cites·24 claims
- 4248US8518865B2Water-rich stripping and cleaning formulation and method for using sameRAO MADHUKAR BHASKARA·Filed 2010·Granted Aug 27, 2013·0 cites·6 claims
- 4347US9536730B2Cleaning formulationsAIR PROD & CHEM·Filed 2013·Granted Jan 3, 2017·0 cites·21 claims
- 4447US2010235363A1Electronic device and method for displaying multimedia filesFOXCONN COMM TECHNOLOGY CORP·Filed 2009·Application pending·0 cites
- 4546US2022251480A1Compositions for removing etch residues, methods of using and use thereofVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 4645US2022298417A1Liquid Compositions For Selectively Removing Polysilicon Over P-Doped Silicon And Silicon-Germanium During Manufacture Of A Semiconductor DeviceVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 4744US2024010915A1Etching Solution For Titanium Nitride And Molybdenum Conductive Metal LinesVERSUM MAT US LLC·Filed 2021·Application pending·0 cites
- 4844US2022243150A1Cleaning Composition For Semiconductor SubstratesVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 4944US2024103377A1Etching Composition And Method For EUV Mask Protective StructureVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 5043US2009229629A1Stripper For Copper/Low k BEOL CleanAIR PROD & CHEM·Filed 2009·Application pending·0 cites
Showing the top 50 of 53 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →