Inventor · disambiguated record
Ying Wu
Also filed as: WU YING · WU YING-YIH
47 granted patents·13 pending applications·383 citations·filing 2006–2025
98Inventor score
Top patents by PatentIndex Score
60 records- 0198US9761459B2Systems and methods for reverse pulsingLAM RES CORP·Filed 2015·Granted Sep 12, 2017·93 cites·17 claims
- 0298US9583357B1Systems and methods for reverse pulsingLAM RES CORP·Filed 2016·Granted Feb 28, 2017·98 cites·18 claims
- 0395US9991128B2Atomic layer etching in continuous plasmaLAM RES CORP·Filed 2017·Granted Jun 5, 2018·26 cites·19 claims
- 0494US10224183B1Multi-level parameter and frequency pulsing with a low angular spreadLAM RES CORP·Filed 2018·Granted Mar 5, 2019·12 cites·30 claims
- 0593US11728136B2RF pulsing within pulsing for semiconductor RF plasma processingLAM RES CORP·Filed 2022·Granted Aug 15, 2023·2 cites·20 claims
- 0693US10573494B2Multi-level parameter and frequency pulsing with a low angular spreadLAM RES CORP·Filed 2019·Granted Feb 25, 2020·8 cites·20 claims
- 0792US2025391638A1Rf pulsing within pulsing for semiconductor rf plasma processingLAM RES CORP·Filed 2025·Application pending·0 cites
- 0891US9966236B2Powered grid for plasma chamberLONG MAOLIN·Filed 2011·Granted May 8, 2018·13 cites·20 claims
- 0990US10580618B2Multi-level pulsing of DC and RF signalsLAM RES CORP·Filed 2019·Granted Mar 3, 2020·4 cites·25 claims
- 1090US10304660B1Multi-level pulsing of DC and RF signalsLAM RES CORP·Filed 2018·Granted May 28, 2019·5 cites·41 claims
- 1189US11462390B2Multi-level parameter and frequency pulsing with a low angular spreadLAM RES CORP·Filed 2020·Granted Oct 4, 2022·2 cites·23 claims
- 1288US9824896B2Methods and systems for advanced ion control for etching processesLAM RES CORP·Filed 2015·Granted Nov 21, 2017·4 cites·23 claims
- 1387US9293353B2Faraday shield having plasma density decoupling structure between TCP coil zonesLONG MAOLIN·Filed 2012·Granted Mar 22, 2016·8 cites·10 claims
- 1486US12283461B2Systems and methods for achieving peak ion energy enhancement with a low angular spreadLAM RES CORP·Filed 2024·Granted Apr 22, 2025·0 cites·20 claims
- 1586US10672590B2Frequency tuning for a matchless plasma sourceLAM RES CORP·Filed 2018·Granted Jun 2, 2020·3 cites·15 claims
- 1686US10395894B2Systems and methods for achieving peak ion energy enhancement with a low angular spreadLAM RES CORP·Filed 2017·Granted Aug 27, 2019·3 cites·28 claims
- 1786US8306184B2X-ray pixel beam array systems and methods for electronically shaping radiation fields and modulation radiation field intensity patterns for radiotherapyCHANG SHA X·Filed 2006·Granted Nov 6, 2012·79 cites·35 claims
- 1885US12437966B2Systems and methods for reverse pulsingLAM RES CORP·Filed 2023·Granted Oct 7, 2025·0 cites·7 claims
- 1985US10009028B2Frequency and match tuning in one state and frequency tuning in the other stateLAM RES CORP·Filed 2017·Granted Jun 26, 2018·4 cites·24 claims
- 2084US10679825B2Systems and methods for applying frequency and match tuning in a non-overlapping manner for processing substrateLAM RES CORP·Filed 2017·Granted Jun 9, 2020·3 cites·15 claims
- 2182US10943789B2Methods and systems for advanced ion control for etching processesLAM RES CORP·Filed 2017·Granted Mar 9, 2021·2 cites·16 claims
- 2281US12068131B2Multi-level parameter and frequency pulsing with a low angular spreadLAM RES CORP·Filed 2022·Granted Aug 20, 2024·0 cites·25 claims
- 2381US11915912B2Systems and methods for achieving peak ion energy enhancement with a low angular spreadLAM RES CORP·Filed 2022·Granted Feb 27, 2024·0 cites·20 claims
- 2481US2025232957A1Systems and methods for multi-level pulsing in rf plasma toolsLAM RES CORP·Filed 2025·Application pending·0 cites
- 2580US11342159B2RF pulsing within pulsing for semiconductor RF plasma processingLAM RES CORP·Filed 2018·Granted May 24, 2022·2 cites·33 claims
- 2680US2025226182A1Systems and methods for multi-level pulsing in rf plasma toolsLAM RES CORP·Filed 2025·Application pending·0 cites
- 2778US12424410B2RF pulsing within pulsing for semiconductor RF plasma processingLAM RES CORP·Filed 2023·Granted Sep 23, 2025·0 cites·20 claims
- 2878US11049693B2Systems and methods for achieving peak ion energy enhancement with a low angular spreadLAM RES CORP·Filed 2019·Granted Jun 29, 2021·1 cites·18 claims
- 2978US10340915B2Frequency and match tuning in one state and frequency tuning in the other stateLAM RES CORP·Filed 2018·Granted Jul 2, 2019·2 cites·27 claims
- 3078US2025125122A1Sensor data compression in a plasma toolLAM RES CORP·Filed 2024·Application pending·0 cites
- 3177US10879044B2Auxiliary circuit in RF matching network for frequency tuning assisted dual-level pulsingLAM RES CORP·Filed 2018·Granted Dec 29, 2020·2 cites·15 claims
- 3276US11569067B2Systems and methods for achieving peak ion energy enhancement with a low angular spreadLAM RES CORP·Filed 2021·Granted Jan 31, 2023·0 cites·21 claims
- 3376US9767991B2Methods and systems for independent control of radical density, ion density, and ion energy in pulsed plasma semiconductor device fabricationLAM RES CORP·Filed 2015·Granted Sep 19, 2017·2 cites·18 claims
- 3475US10242845B2Near-substrate supplemental plasma density generation with low bias voltage within inductively coupled plasma processing chamberLAM RES CORP·Filed 2017·Granted Mar 26, 2019·2 cites·15 claims
- 3575US2025253132A1Method and System for Automated Frequency Tuning of Radiofrequency (RF) Signal Generator for Multi-Level RF Power PulsingLAM RES CORP·Filed 2025·Application pending·0 cites
- 3673US12165872B2Methods and systems for advanced ion control for etching processesLAM RES CORP·Filed 2021·Granted Dec 10, 2024·0 cites·20 claims
- 3773US10431434B2Powered grid for plasma chamberLAM RES CORP·Filed 2018·Granted Oct 1, 2019·1 cites·26 claims
- 3872US12119232B2Etching isolation features and dense features within a substrateLAM RES CORP·Filed 2022·Granted Oct 15, 2024·0 cites·20 claims
- 3972US11728137B2Direct frequency tuning for matchless plasma source in substrate processing systemsLAM RES CORP·Filed 2019·Granted Aug 15, 2023·1 cites·16 claims
- 4071US12283463B2Systems and methods for multi-level pulsing in RF plasma toolsLAM RES CORP·Filed 2020·Granted Apr 22, 2025·0 cites·20 claims
- 4170US10755896B2Multi-level pulsing of DC and RF signalsLAM RES CORP·Filed 2020·Granted Aug 25, 2020·0 cites·21 claims
- 4269US12046450B2Synchronization of RF generatorsLAM RES CORP·Filed 2021·Granted Jul 23, 2024·0 cites·20 claims
- 4369US11011351B2Monoenergetic ion generation for controlled etchLAM RES CORP·Filed 2018·Granted May 18, 2021·1 cites·13 claims
- 4468US11437219B2Frequency tuning for a matchless plasma sourceLAM RES CORP·Filed 2020·Granted Sep 6, 2022·0 cites·22 claims
- 4565US12217940B2Sensor data compression in a plasma toolLAM RES CORP·Filed 2021·Granted Feb 4, 2025·0 cites·34 claims
- 4662US12300463B2Method and system for automated frequency tuning of radiofrequency (RF) signal generator for multi-level RF power pulsingLAM RES CORP·Filed 2020·Granted May 13, 2025·0 cites·19 claims
- 4761US11398387B2Etching isolation features and dense features within a substrateLAM RES CORP·Filed 2019·Granted Jul 26, 2022·0 cites·19 claims
- 4860US11798785B2Systems for reverse pulsingLAM RES CORP·Filed 2017·Granted Oct 24, 2023·0 cites·17 claims
- 4959US11049726B2Methods and systems for advanced ion control for etching processesLAM RES CORP·Filed 2017·Granted Jun 29, 2021·0 cites·23 claims
- 5058US2025323018A1Ion Energy Distribution Control Over Substrate Edge with Non-Sinusoidal Voltage SourceLAM RES CORP·Filed 2023·Application pending·0 cites
Showing the top 50 of 60 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →