Inventor · disambiguated record
Yongfa Fan
Also filed as: FAN YONGFA
12 granted patents·6 pending applications·69 citations·filing 2008–2023
88Inventor score
Top patents by PatentIndex Score
18 records- 0192US8918743B1Edge-based full chip mask topography modelingSYNOPSYS INC·Filed 2013·Granted Dec 23, 2014·38 cites·25 claims
- 0289US7954071B2Assist feature placement based on a focus-sensitive cost-covariance fieldSYNOPSYS INC·Filed 2008·Granted May 31, 2011·12 cites·23 claims
- 0385US8355807B2Method and apparatus for using aerial image sensitivity to model mask errorsSYNOPSYS INC·Filed 2010·Granted Jan 15, 2013·5 cites·20 claims
- 0480US8812145B2Modeling mask errors using aerial image sensitivitySYNOPSYS INC·Filed 2013·Granted Aug 19, 2014·3 cites·15 claims
- 0576US11675274B2Etch bias characterization and method of using the sameASML NETHERLANDS BV·Filed 2018·Granted Jun 13, 2023·1 cites·20 claims
- 0676US8006203B2Bulk image modeling for optical proximity correctionSYNOPSYS INC·Filed 2008·Granted Aug 23, 2011·6 cites·54 claims
- 0775US12468232B2Etch bias characterization and method of using the sameASML NETHERLANDS BV·Filed 2023·Granted Nov 11, 2025·0 cites·20 claims
- 0869US8296688B2Evaluating the quality of an assist feature placement based on a focus-sensitive cost-covariance fieldBARNES LEVI D·Filed 2011·Granted Oct 23, 2012·2 cites·19 claims
- 0963US8161424B2Method and apparatus for modeling chemically amplified resistsFAN YONGFA·Filed 2009·Granted Apr 17, 2012·2 cites·21 claims
- 1061US2025355364A1Modelling of multi-level etch processesASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1158US12505524B2Method for training or using a process model for determining a pattern in a patterning processASML NETHERLANDS BV·Filed 2020·Granted Dec 23, 2025·0 cites·21 claims
- 1257US12339591B2Determining metrics for a portion of a pattern on a substrateASML NETHERLANDS BV·Filed 2021·Granted Jun 24, 2025·0 cites·20 claims
- 1355US2025021015A1Determining an etch effect based on an etch bias directionASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1454US2024420025A1Generating augmented data to train machine learning models to preserve physical trendsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1550US2024385530A1Etching systems, models, and manufacturing processesASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1645US8875066B2Performing image calculation based on spatial coherenceSYNOPSYS INC·Filed 2013·Granted Oct 28, 2014·0 cites·33 claims
- 1745US2022299881A1Methods for improving process based contour information of structure in imageASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 1837US2021294218A1Modeling post-exposure processesASML NETHERLANDS BV·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →