Inventor · disambiguated record
Yoel Feler
Also filed as: FELER YOEL
35 granted patents·10 pending applications·149 citations·filing 2013–2025
96Inventor score
Top patents by PatentIndex Score
45 records- 0198US11604149B2Metrology methods and optical schemes for measurement of misregistration by using hatched target designsKLA CORP·Filed 2021·Granted Mar 14, 2023·9 cites·57 claims
- 0298US11164307B1Misregistration metrology by using fringe Moiré and optical Moiré effectsKLA CORP·Filed 2020·Granted Nov 2, 2021·18 cites·35 claims
- 0396US11073768B2Metrology target for scanning metrologyKLA CORP·Filed 2019·Granted Jul 27, 2021·19 cites·21 claims
- 0495US12105433B2Imaging overlay targets using moiré elements and rotational symmetry arrangementsKLA CORP·Filed 2022·Granted Oct 1, 2024·2 cites·6 claims
- 0595US9739702B2Symmetric target design in scatterometry overlay metrologyKLA TENCOR CORP·Filed 2014·Granted Aug 22, 2017·31 cites·46 claims
- 0692US11862524B2Overlay mark design for electron beam overlayKLA CORP·Filed 2021·Granted Jan 2, 2024·2 cites·20 claims
- 0792US10591406B2Symmetric target design in scatterometry overlay metrologyKLA TENCOR CORP·Filed 2016·Granted Mar 17, 2020·6 cites·20 claims
- 0891US9454072B2Method and system for providing a target design displaying high sensitivity to scanner focus changeKLA TENCOR CORP·Filed 2013·Granted Sep 27, 2016·12 cites·21 claims
- 0990US9581430B2Phase characterization of targetsKLA TENCOR CORP·Filed 2013·Granted Feb 28, 2017·15 cites·12 claims
- 1089US9934353B2Focus measurements using scatterometry metrologyKLA TENCOR CORP·Filed 2015·Granted Apr 3, 2018·5 cites·22 claims
- 1187US11137692B2Metrology targets and methods with oblique periodic structuresKLA TENCOR CORP·Filed 2018·Granted Oct 5, 2021·3 cites·22 claims
- 1284US10901325B2Determining the impacts of stochastic behavior on overlay metrology dataKLA TENCOR CORP·Filed 2018·Granted Jan 26, 2021·4 cites·28 claims
- 1384US2025021019A1Imaging overlay targets using moiré elements and rotational symmetry arrangementsKLA CORP·Filed 2024·Application pending·0 cites
- 1483US11182892B2Periodic semiconductor device misregistration metrology system and methodKLA CORP·Filed 2019·Granted Nov 23, 2021·3 cites·20 claims
- 1582US11614692B2Self-Moire grating design for use in metrologyKLA CORP·Filed 2020·Granted Mar 28, 2023·1 cites·20 claims
- 1681US10831108B2Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrologyKLA CORP·Filed 2016·Granted Nov 10, 2020·5 cites·77 claims
- 1781US9841689B1Approach for model calibration used for focus and dose measurementKLA TENCOR CORP·Filed 2015·Granted Dec 12, 2017·2 cites·17 claims
- 1880US12055859B2Overlay mark design for electron beam overlayKLA CORP·Filed 2023·Granted Aug 6, 2024·0 cites·15 claims
- 1980US12013634B2Reduction or elimination of pattern placement error in metrology measurementsKLA TENCOR CORP·Filed 2022·Granted Jun 18, 2024·0 cites·11 claims
- 2080US11256177B2Imaging overlay targets using Moiré elements and rotational symmetry arrangementsKLA CORP·Filed 2020·Granted Feb 22, 2022·1 cites·44 claims
- 2179US10824082B2Estimation of asymmetric aberrationsKLA TENCOR CORP·Filed 2018·Granted Nov 3, 2020·2 cites·20 claims
- 2276US12510831B2Robust and accurate overlay target design for CMPKLA CORP·Filed 2024·Granted Dec 30, 2025·0 cites·29 claims
- 2375US10340196B1Method and system for selection of metrology targets for use in focus and dose applicationsKLA TENCOR CORP·Filed 2014·Granted Jul 2, 2019·3 cites·31 claims
- 2475US2024035812A1Metrology target for one-dimensional measurement of periodic misregistrationKLA CORP·Filed 2023·Application pending·0 cites
- 2574US11537043B2Reduction or elimination of pattern placement error in metrology measurementsKLA TENCOR CORP·Filed 2021·Granted Dec 27, 2022·0 cites·10 claims
- 2674US10754261B2Reticle optimization algorithms and optimal target designKLA TENCOR CORP·Filed 2017·Granted Aug 25, 2020·1 cites·9 claims
- 2771US10197922B2Focus metrology and targets which utilize transformations based on aerial images of the targetsKLA TENCOR CORP·Filed 2016·Granted Feb 5, 2019·1 cites·20 claims
- 2870US2025314973A1METHODS FOR MEASUREMENT OF rAIMKLA CORP·Filed 2024·Application pending·0 cites
- 2967US12347706B2Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful thereinKLA TENCOR CORP·Filed 2022·Granted Jul 1, 2025·0 cites·14 claims
- 3067US10261014B2Near field metrologyKLA TENCOR CORP·Filed 2014·Granted Apr 16, 2019·2 cites·17 claims
- 3167US10242290B2Method, system, and user interface for metrology target characterizationKLA TENCOR CORP·Filed 2014·Granted Mar 26, 2019·2 cites·24 claims
- 3266US11686576B2Metrology target for one-dimensional measurement of periodic misregistrationKLA CORP·Filed 2020·Granted Jun 27, 2023·0 cites·46 claims
- 3365US2025172881A1Calibrated measurement of overlay error using small targetsKLA CORP·Filed 2025·Application pending·0 cites
- 3463US2024110780A1Mosaic overlay targetsKLA CORP·Filed 2023·Application pending·0 cites
- 3563US2024295827A1Calibrated measurement of overlay error using small targetsKLA CORP·Filed 2022·Application pending·0 cites
- 3662US11774863B2Induced displacements for improved overlay error metrologyKLA CORP·Filed 2021·Granted Oct 3, 2023·0 cites·20 claims
- 3758US12094100B2Measurement of stitching error using split targetsKLA CORP·Filed 2022·Granted Sep 17, 2024·0 cites·22 claims
- 3857US11862522B2Accuracy improvements in optical metrologyKLA TENCOR CORP·Filed 2021·Granted Jan 2, 2024·0 cites·9 claims
- 3957US2022357674A1Oblique illumination for overlay metrologyKLA CORP·Filed 2022·Application pending·0 cites
- 4056US11720031B2Overlay design for electron beam and scatterometry overlay measurementsKLA CORP·Filed 2021·Granted Aug 8, 2023·0 cites·12 claims
- 4156US2019250504A1Reduction or elimination of pattern placement error in metrology measurementsKLA TENCOR CORP·Filed 2018·Application pending·0 cites
- 4255US11302544B2Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful thereinKLA TENCOR CORP·Filed 2019·Granted Apr 12, 2022·0 cites·13 claims
- 4352US12204254B2Multi-layered moiré targets and methods for using the same in measuring misregistration of semiconductor devicesKLA CORP·Filed 2020·Granted Jan 21, 2025·0 cites·17 claims
- 4446US2023068016A1Systems and methods for rotational calibration of metrology toolsKLA CORP·Filed 2021·Application pending·0 cites
- 4543US2018047646A1Accuracy improvements in optical metrologyKLA TENCOR CORP·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →