Inventor · disambiguated record
Yoshikazu Furusawa
Also filed as: FURUSAWA YOSHIKAZU
15 granted patents·3 pending applications·410 citations·filing 1995–2022
91Inventor score
Files withTOKYO ELECTRON LTD12EISAI KAGAKU KK1FURUSAWA YOSHIKAZU1HASEBE KAZUHIDE1HONDA MOTOR CO LTD1
Top patents by PatentIndex Score
18 records- 0198US7648895B2Vertical CVD apparatus for forming silicon-germanium filmTOKYO ELECTRON LTD·Filed 2008·Granted Jan 19, 2010·337 cites·14 claims
- 0285US9540743B2Amorphous silicon crystallizing method, crystallized silicon film forming method, semiconductor device manufacturing method and film forming apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Jan 10, 2017·3 cites·8 claims
- 0380US9758865B2Silicon film forming method, thin film forming method and cross-sectional shape control methodTOKYO ELECTRON LTD·Filed 2014·Granted Sep 12, 2017·4 cites·29 claims
- 0473US7208428B2Method and apparatus for treating article to be treatedTOKYO ELECTRON LTD·Filed 2001·Granted Apr 24, 2007·17 cites·7 claims
- 0563USD588078SHeat dissipation deterrence link for semiconductor manufactureTOKYO ELECTRON LTD·Filed 2006·Granted Mar 10, 2009·13 cites·1 claims
- 0661US8518488B2Method for using apparatus configured to form germanium-containing filmFURUSAWA YOSHIKAZU·Filed 2010·Granted Aug 27, 2013·2 cites·11 claims
- 0760US7273818B2Film formation method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2004·Granted Sep 25, 2007·7 cites·16 claims
- 0859US2025057196A1Cell proliferation medium for producing cultured meatNH FOODS LTD·Filed 2022·Application pending·0 cites
- 0954US5547580APurification method of crude productEISAI KAGAKU KK·Filed 1995·Granted Aug 20, 1996·22 cites·13 claims
- 1053US7064084B2Oxide film forming methodTOKYO ELECTRON LTD·Filed 2002·Granted Jun 20, 2006·4 cites·6 claims
- 1151US11585649B2Shift drum angle detecting device for transmissionHONDA MOTOR CO LTD·Filed 2020·Granted Feb 21, 2023·0 cites·11 claims
- 1249US2005181586A1Vertical CVD apparatus for forming silicon-germanium filmFiled 2004·Application pending·0 cites
- 1347US10619247B2Substrate processing apparatus, injector, and substrate processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Apr 14, 2020·0 cites·6 claims
- 1447US9478423B2Method of vapor-diffusing impuritiesTOKYO ELECTRON LTD·Filed 2013·Granted Oct 25, 2016·0 cites·11 claims
- 1543US8906792B2Impurity diffusion method, substrate processing apparatus, and method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2013·Granted Dec 9, 2014·0 cites·14 claims
- 1641US10573518B2Film forming method and vertical thermal processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Feb 25, 2020·0 cites·7 claims
- 1740US2006021570A1Reduction in size of hemispherical grains of hemispherical grained filmHASEBE KAZUHIDE·Filed 2005·Application pending·0 cites
- 1831USD588079SHeat dissipation deterrence link for semiconductor manufactureTOKYO ELECTRON LTD·Filed 2006·Granted Mar 10, 2009·1 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →