Inventor · disambiguated record
Yoshiro Kabe
Also filed as: KABE YOSHIRO
23 granted patents·17 pending applications·247 citations·filing 2004–2023
94Inventor score
Files withTOKYO ELECTRON LTD20KABE YOSHIRO6KAWASAKI HEAVY IND LTD6SKYWORKS SOLUTIONS INC4HORI MASARU1
Top patents by PatentIndex Score
40 records- 0197US11394364B2Acoustic wave device with anti-reflection layerSKYWORKS SOLUTIONS INC·Filed 2020·Granted Jul 19, 2022·11 cites·20 claims
- 0296US8119530B2Pattern forming method and semiconductor device manufacturing methodHORI MASARU·Filed 2007·Granted Feb 21, 2012·184 cites·20 claims
- 0395US11855603B2Methods of manufacturing acoustic wave device with anti-reflection layerSKYWORKS SOLUTIONS INC·Filed 2022·Granted Dec 26, 2023·3 cites·20 claims
- 0486US7524774B2Manufacturing method of semiconductor device, semiconductor manufacturing apparatus, plasma nitridation method, computer recording medium, and programTOKYO ELECTRON LTD·Filed 2006·Granted Apr 28, 2009·11 cites·11 claims
- 0585US10259030B2Spinning forming deviceKAWASAKI HEAVY IND LTD·Filed 2015·Granted Apr 16, 2019·2 cites·7 claims
- 0683US8372761B2Plasma oxidation processing method, plasma processing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2008·Granted Feb 12, 2013·9 cites·13 claims
- 0782US12255600B2Methods of manufacturing acoustic wave device with anti-reflection layerSKYWORKS SOLUTIONS INC·Filed 2023·Granted Mar 18, 2025·0 cites·20 claims
- 0878US7887637B2Method for cleaning treatment chamber in substrate treating apparatus and method for detecting endpoint of cleaningTOKYO ELECTRON LTD·Filed 2005·Granted Feb 15, 2011·7 cites·25 claims
- 0975US7910495B2Plasma oxidizing method, plasma processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted Mar 22, 2011·5 cites·12 claims
- 1072US10413999B2Methods of manufacturing axisymmetric body and axisymmetric productKAWASAKI HEAVY IND LTD·Filed 2015·Granted Sep 17, 2019·1 cites·7 claims
- 1171US8034179B2Method for insulating film formation, storage medium from which information is readable with computer, and processing systemTOKYO ELECTRON LTD·Filed 2009·Granted Oct 11, 2011·3 cites·17 claims
- 1268US11522515B2Acoustic wave device including interdigital electrodes covered by silicon oxynitride filmSKYWORKS SOLUTIONS INC·Filed 2018·Granted Dec 6, 2022·1 cites·19 claims
- 1368US8389420B2Method and apparatus for forming silicon oxide filmKABE YOSHIRO·Filed 2011·Granted Mar 5, 2013·2 cites·11 claims
- 1465US7989364B2Plasma oxidation processing methodUNIV NAGOYA NAT UNIV CORP·Filed 2007·Granted Aug 2, 2011·2 cites·14 claims
- 1559US8318267B2Method and apparatus for forming silicon oxide filmKABE YOSHIRO·Filed 2007·Granted Nov 27, 2012·1 cites·14 claims
- 1659US8105958B2Semiconductor device manufacturing method and plasma oxidation treatment methodKABE YOSHIRO·Filed 2005·Granted Jan 31, 2012·2 cites·18 claims
- 1753US2011024048A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1852US7981785B2Method for manufacturing semiconductor device and plasma oxidation methodTOKYO ELECTRON LTD·Filed 2004·Granted Jul 19, 2011·3 cites·7 claims
- 1952US2014283734A1Microwave heat treatment methodTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2052US2010291319A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2151US8026187B2Method of forming silicon oxide film and method of production of semiconductor memory device using this methodTOKYO ELECTRON LTD·Filed 2009·Granted Sep 27, 2011·0 cites·19 claims
- 2249US10882094B2Spinning forming methodKAWASAKI HEAVY IND LTD·Filed 2015·Granted Jan 5, 2021·0 cites·7 claims
- 2347US8043979B2Plasma oxidizing method, storage medium, and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Oct 25, 2011·0 cites·5 claims
- 2447US2011174776A1Plasma processing apparatus, plasma processing method and end point detection methodTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2546US8003484B2Method for forming silicon oxide film, plasma processing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted Aug 23, 2011·0 cites·21 claims
- 2644US10259029B2Spinning forming deviceKAWASAKI HEAVY IND LTD·Filed 2015·Granted Apr 16, 2019·0 cites·9 claims
- 2743US2010029093A1Plasma oxidizing method, plasma processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 2841US10632522B2Method of manufacturing preliminary formed body and axisymmetrical componentKAWASAKI HEAVY IND LTD·Filed 2015·Granted Apr 28, 2020·0 cites·12 claims
- 2941US2014041682A1Method for cleaning microwave processing apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3039US2014038430A1Method for processing objectTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3139US2014042153A1Microwave processing method and microwave processing apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3238US2015090708A1Microwave heating apparatus and processing methodTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3338US2013012033A1Silicon oxide film forming method and plasma oxidation apparatusTOKYO ELECTRON LTD·Filed 2011·Application pending·0 cites
- 3438US2017304885A1Spinning forming methodKAWASAKI HEAVY IND LTD·Filed 2015·Application pending·0 cites
- 3537US2011017586A1Method for forming silicon oxide film, storage medium, and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 3637US2012252209A1Plasma nitriding method, plasma nitriding apparatus and method of manufacturing semiconductor deviceKABE YOSHIRO·Filed 2012·Application pending·0 cites
- 3736US2018041186A1Surface acoustic wave elements with protective filmsSKYWORKS FILTER SOLUTIONS JAPAN CO LTD·Filed 2017·Application pending·0 cites
- 3834US2012248583A1Method for forming germanium oxide film and material for electronic deviceKABE YOSHIRO·Filed 2012·Application pending·0 cites
- 3934US2012094505A1Method for selective oxidation, device for selective oxidation, and computer-readable memory mediumNAKAMURA HIDEO·Filed 2010·Application pending·0 cites
- 4031US2012252226A1Plasma processing methodKABE YOSHIRO·Filed 2012·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Yoshiro Kabe files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →