Inventor · disambiguated record
Yoshimitsu Kon
Also filed as: KON YOSHIMITSU
6 granted patents·8 pending applications·52 citations·filing 2005–2025
74Inventor score
Top patents by PatentIndex Score
14 records- 0194US8128831B2Plasma etching method and computer-readable storage mediumSATO MANABU·Filed 2006·Granted Mar 6, 2012·50 cites·16 claims
- 0266US12476079B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Granted Nov 18, 2025·0 cites·18 claims
- 0359US8216485B2Plasma etching method, plasma etching apparatus, control program and computer-readable storage mediumKON YOSHIMITSU·Filed 2008·Granted Jul 10, 2012·2 cites·12 claims
- 0458US2007284043A1Plasma processing apparatus and cleaning method thereofTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 0553US12394632B2Plasma processing method and plasma processing systemTOKYO ELECTRON LTD·Filed 2023·Granted Aug 19, 2025·0 cites·19 claims
- 0653US2024213031A1Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0753US2006000552A1Plasma processing apparatus and cleaning method thereofTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 0851US2024429027A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0946US11264248B2Etching method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Mar 1, 2022·0 cites·17 claims
- 1046US11121001B2Method of etching, device manufacturing method, and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Sep 14, 2021·0 cites·10 claims
- 1143US2025210307A1Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1241US2021082712A1Method of etching silicon oxide film and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1338US2020273712A1Deposition processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1438US2019198336A1Etching methodTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →